The invention discloses a
photoinitiator containing asymmetric
hexa-
aryl diimidazole and a preparation method thereof. The invention mainly solves the problems that a
photoinitiator containing symmetric
hexa-
aryl diimidazole is not sensitive to long-wave
ultraviolet light and visible light during a photo-curing process; and the residual
photoinitiator is migrated to the surface of
photoresist material after photo-curing to form an atomization phenomenon, thereby impacting the quality, and production, use environment and the like of a
photoresist product, and restricting the application of the photoinitiator in the field of microelectronic material. The preparation method adopts the main raw materials of 3, 4-dialkoxy
benzaldehyde,
benzaldehyde, and the
benzaldehyde having the
substituent of
fluorine or
chlorine atoms. The photoinitiator containing asymmetric
hexa-
aryl diimidazole is obtained through a plurality of synthesis steps such as
benzoin synthesis, benzyl synthesis, and the like. The alkoxy and
fluorine or
chlorine atoms with higher activity are introduced into the asymmetric hexa-aryl diimidazole to improve the
solubility of the photoinitiator. In addition, the photoinitiator has good absorption of
ultraviolet light and visible light, reconditions and improves the production and application environment of the
photoresist product, and reduces the emission of pollutants.