5147 results about "ALLYL SUCROSE" patented technology

The invention relates to a phase transition temperature adjusting cup, which comprises a cup body outer casing, a cup body inner casing and a top cover, and the composite phase transition material is filled between the inner casing and the outer casing. The composite phase transition material comprises phase transition material, a nucleating agent, heat conduction filling material and a thickening agent. The phase transition material is selected from one or more of sodium acetate trihydrate, sodium thiosulfate pentahydrate, twelve disodium hydrogen phosphate, sodium sulfate decahydrate and decahydrate. <{EN4}>The nucleating agent is selected from one or more of borax, sodium phosphate dibasic anhydrous, diatomaceous earth, silica, sodium silicate, eight water strontium hydroxide, hexahydrate chloride strontium. <{EN5}>The heat conduction filling material is selected from one or more of graphite, carbon nanotube, expanded graphite, carbon fiber, graphene, three-dimensional graphite foam, silicon carbide, copper powder. <{EN6}>The thickening agent is selected from one of polyacrylic acid emulsion or carboxymethylcellulose sodium. <{EN7}>Compared with existing temperature adjusting cups, the phase transition temperature adjusting cup of the present invention has the advantages of rapid cooling, simple structure convenient operation, 3-4 hours of comfort temperature zone, and not being restricted from external environment.

A CMP method for polishing a phase change alloy on a substrate surface including positioning the substrate comprising a phase change alloy material on a platen containing a polishing pad and delivering a polishing slurry to the polishing pad. The polishing slurry includes colloidal particles with a particle size less than 60 nm, in an amount between 0.2% to about 10% by weight of slurry, a pH adjustor, a chelating agent, an oxidizing agent in an amount less than 1% by weight of slurry, and polyacrylic acid. The substrate on the platen is polished to remove a portion of the phase change alloy. A rinsing solution for rinsing the substrate on the platen includes deionized water and at least one component in the deionized water where the component selected from the group consisting of polyethylene imine, polyethylene glycol, polyacrylic amide, alcohol ethoxylates, polyacrylic acid, an azole containing compound, benzo-triazole, and combinations thereof.