An aspect of the present invention is a process for modifying a substrate in areas that are exposed to actinic
radiation, having the steps: (a) providing on the substrate functional groups adapted for conversion to
oxygen-containing photoproducts upon
exposure to actinic
radiation; (b) exposing at least a portion of the substrate to the actinic
radiation, converting the functional groups in an exposed region of the substrate to the photoproducts; (c) contacting the photoproducts with a primary or secondary amine in the presence of
hydrogen ions, forming
imine groups; and (d) contacting the
imine groups with a
reducing agent, forming amine groups on the substrate in the exposed region. Another aspect of the present invention is a process for modifying a substrate in areas that are unexposed to actinic radiation, having the steps: (a) providing on the substrate
aryl functional groups adapted for conversion to
oxygen-containing photoproducts upon
exposure to actinic radiation; (b) exposing a portion of the substrate to the actinic radiation, converting the
aryl functional groups in an exposed region of the substrate to the photoproducts, and not converting the
aryl functional groups in an unexposed region of the substrate to the photoproducts; (c) contacting the aryl functional groups in the unexposed region of the substrate with a compound adapted for
physisorption to the aryl functional groups, preferentially physisorbing the compound onto the substrate in the unexposed regions.