The invention relates to a double-workpiece-platform same-
phase rotation exchange method based on parallel mechanisms, and a device of the method, belonging to a technology of
semiconductor manufacturing equipment. The device comprises two workpiece platforms, a rotary transfer platform and the two parallel anti-rotation mechanisms; in the rotating exchange process of the two workpiece platforms,the two workpiece platforms are caught and blocked by the rotary transfer platform which rotates around the center of a
base station, so that the exchange between an
exposure station and a pretreatment
station can be realized; and the rotation of the two workpiece platforms can be controlled by the parallel anti-rotation mechanisms, so that the two workpiece platforms can be ensured to have the same phase in the exchange process. The invention solves the problems that the existing scheme for exchanging the platforms in a linear way is high in
impact torque and more in platform exchange beats,the existing scheme for exchanging the platforms in a rotating way is reverse in phases of the two workpiece platforms, cables are wound, a target of a
laser interferometer is lost, and the like; a smaller
mass balance
system is adopted, so that the balance time is better shortened, the
system is simplified, the cost is reduced, the platform exchange beats are reduced, the time for exchanging theplatforms can be reduced, and the yield of a photoetching
machine is effectively improved.