30results about How to "Adjust the refractive index" patented technology

The invention discloses an adjustable-refractivity silicon dioxide coated quantum dot nano composite luminescent material which is composed of SiO2 nanoparticles, wherein each SiO2 particle is a nano composite particle formed by coating SiO2 on a single quantum dot or a nano composite particle formed by coating SiO2 on multiple evenly-dispersed quantum dots. The invention also discloses a method for preparing the nano composite particles (each of which is formed by coating SiO2 on a single quantum dot or coating SiO2 on multiple quantum dots) by inverse microemulsion polymerization reaction. In practical use, the technological parameters, such as consumptions of TEOS (tetraethyl orthosilicate), surfactant, catalyst and quantum dots, reaction time and the like, can be adjusted to adjust the thickness of the SiO2 shell and the proportion of the quantum dot core in the SiO2 coated quantum dot nano composite particles, thereby adjusting the refractivity of the SiO2 coated quantum dot nano composite material. The refractivity of the nano composite luminescent material is adjustable within the range of 1.42-1.98.

The invention provides ultra violet curing coating, and a preparation method and an application thereof; the coating contains light trigger, compound with mercapto, monofunctional extractant or polyfunctional group allyl compound and aliphatic diisocyanate, contains or does not contain monofunctional extractant or polyfunctional group acrylic ester; the preparation method comprises the following steps: the substances are evenly mixed under normal temperature or heating condition, and then placed stationarily, to obtain the required ultra violet curing coating. The coating is simple to be prepared, has high transparency, high gloss and adjustable refraction index, can be applied to polymer optical fiber and optical devices, and can be used as ultra violet curing agent to be applied in polymer dispersion liquid crystal.

The invention relates to the field of chemical industry and new materials, in particular to aqueous nano zirconia particle paint and a method for preparing a paint film thereof. A preparation method of the aqueous nano zirconia particle paint comprises the steps of: with nano zirconia crystal particles as raw materials, modifying organic amino groups on nano particles with an amino silane coupling agent, dispersing the modified nano zirconia crystal particles in water, adjusting a pH value to acquire a transparent nano zirconia aqueous dispersion, and further adding aqueous double-functional groups or multi-functional groups of epoxy compound and a wetting agent to obtain the aqueous nano zirconia particle paint. The method for preparing the paint film of the aqueous nano zirconia particle paint comprises the steps of: coating the aqueous nano zirconia particle paint on the surface of a plastic substrate through dip coating, spin coating and spray finishing, and thermally treating at lower temperature to obtain an organic molecule-bridged nano zirconia particle film, wherein the thickness of the paint film can be adjusted through coating multiple times. The aqueous nano zirconia particle paint in the invention has simple and convenient preparation methods and good environmental-protection performance, and the acquired paint film has high zirconia content, good transparency, high refractive index and outstanding mechanical property and can be used as an optical paint film and a scratch-resistant paint film on the surface of the transparent plastic substrate.

The invention relates to low-refractive optical fiber coating resin. The low-refractive optical fiber coating resin is prepared from, by weight, 30-65% of prepolymer A, 0-40% of prepolymer B, 2-8% of a photoinitiator, 20-40% of an active diluent and 0.5-2% of a silane coupling agent, and the sum of the weight percentages of all the components is 100%. The low-refractive optical fiber coating resin is high in adhesive power, optical fiber is not likely to be broken when bent, and the low-refractive optical fiber coating resin is low in refractive rate and can enlarge the digital transmission aperture of the optical fiber.

The invention provides a method used for preparing erbium-doped hybridization SiO2 optical waveguide amplifier by direct writing of ultraviolet. The method of the invention is characterized by comprising the steps as follows: step 1: a thermal oxidation method is used for generating a lower wrapping layer on a single-crystal Si underlay; step 2: an organic/inorganic hybridized sol-gel method is used to prepare the erbium-doped photosensitive SiO2 material; step 3: the photosensitive hybridized SiO2 film is rotatablely coated on the lower wrapping layer and taken as a core layer; step 4: front baking and solidifying operations are carried out; step 5: the exposure is carried out by using the ultraviolet to pass through a mask; device patterns are directly copied to the core layer; step 6: developing and rear baking operations are carried out so as to obtain the bar-shaped erbium-doped waveguide amplifier.

The invention discloses a multilayer film thickness and optical characteristic detection method which comprises the steps: S1, sequentially depositing a film on a substrate to form a multilayer film,and classifying the film of the multilayer film into a diamond film and a diamond film; S2, measuring an ellipsometric spectrum of the multilayer film; S3, judging whether the film is a diamond film or a diamond-like film, if the film is the diamond film, executing the step S41, and if the film is the diamond-like film, executing the step S42; S41, calculating by adopting a Cauchy model to obtaina full-waveband film optical constant and a film thickness; S42, selecting a transparent area of a section of film, and calculating by adopting the Cauchy model to obtain the optical constant and thickness of the film within the waveband range; S5, adding a dielectric constant oscillator model to the absorption spectrum region of the diamond-like film, and adjusting the amplitude and width of theoscillator according to the ellipsometry; and S6, judging the difference between the experimental value and the fitting value by utilizing an evaluation function MSE so as to determine the structure of the multilayer film and the optical constant and the film thickness of each layer of film, wherein the optical constant comprises a refractive index and an extinction coefficient.

The invention discloses a display panel and electronic equipment. The display panel is provided with a display area and a blind hole area. The display panel comprises an array substrate and a color film substrate which are oppositely arranged; a liquid crystal layer is positioned between the array substrate and the color film substrate; the array substrate is provided with a plurality of pixel units, wherein the pixel units are located in the display area, and the vertical projections of the pixel units on the array substrate are not overlapped with the vertical projections of the blind hole area on the array substrate; and the blind hole area is provided with a driving electrode, and the driving electrode is used for controlling deflection of liquid crystal molecules in the blind hole area. The display panel is provided with the driving electrode in the blind area, and liquid crystal molecules in the blind hole area can be controlled to deflect through the driving electrode, so that the refractive index of the liquid crystal layer in the blind hole area is adjusted, and the optical path difference of the blind hole area is reduced or even eliminated.

The invention discloses a novel optical material for display and a preparation method of the novel optical material. The optical material is of a regular triangular prism structure and shows a core-shell structure in micromorphology. The core of the optical material is a surface copolymerized zirconium organic framework compound with the regular triangular prism structure; the framework height is100 to 200 nm, the side length of a bottom regular triangle is 50 to 100 nm, the shell is a copolymer of N imidazole containing double bonds and acrylate monomer and the thickness is 300 to 500 nm. The optical material is prepared by firstly preparing a copolymerizable zirconium organic framework compound with the regular triangular prism structure through N imidazole ligand containing double bonds and zirconium salt, and then carrying out free radical polymerization on the copolymerizable zirconium organic framework compound and the acrylate monomer, wherein a copolymer shell layer is formedby copolymerization of the N imidazole ligand containing the double bonds and the acrylate monomer. When the optical material has a better optical diffusion effect through an optical diffusion film prepared by ultraviolet curing; the visible light transmittance of the optical diffusion film is 92 to 95 percent and the haze is 85 to 88 percent; meanwhile, the optical material has good thermal stability and mechanical properties.

The invention discloses a preparation method of a colorful building integrated photovoltaics (BIPV) thin-film solar cell. The preparation method comprises the following steps: S1, ultra-clear float glass is taken as a glass substrate, dirt on the surface of the glass substrate is removed, and the surface of the glass substrate is activated; S2, a transparent conducting layer is deposited on the top face of the glass substrate through a grazing angle magnetron sputtering process, the transparent conducting layer serves as a colorful functional layer, and as for the colorful functional layer, acomposite film layer is composed of three or more layers of thin films; S3, a buffer layer is deposited on the top face of the colorful functional layer through the magnetron sputtering process; S4, an absorption layer is deposited on the top face of the buffer layer through the magnetron sputtering process, and a CdTe thin film is adopted as the absorption layer; S5, a back contact layer is deposited on the top face of the absorption layer through the magnetron sputtering process; and S6, a protective layer is deposited on the top face of the back contact layer through the magnetron sputtering process, an Au, Zn, Pt, Zr or Ti thin film is adopted as the protective layer, and the colorful BIPV thin-film solar cell is obtained. The cell structure can carry colors, and meanwhile the overallstructure and performance of the thin-film solar cell are guaranteed.

The invention relates to the field of organic light-emitting materials, in particular to a bismuth-containing compound, a preparation method and application. According to the bismuth-containing compound, different organic functional groups are introduced to bismuth to change electron distribution and molecular accumulation of the material and regulate and control the refractive index and thermal stability of the material, and the introduction of the different functional groups can change the solubility of the material, so that an organic light extraction layer material capable of being processed by a solution is realized. Meanwhile, the bismuth-based organic compound has strong fluorescence, can be used as a light extraction layer and can also be used as a light emitting layer of an OLED device, and various functional applications of one material are realized.

The invention relates to a color filter, an image sensor and an image pickup device. The light filtering module comprises a color light filter and a control assembly, the color filter comprises a first substrate, a metasurface structure, a dielectric layer and a second substrate, the metasurface structure is located on the first substrate, the metasurface structure comprises a plurality of microstructures arranged periodically, and the dielectric layer is located on the side, away from the first substrate, of the metasurface structure and covers the metasurface structure; the refractive index of the dielectric layer is different from that of the metasurface structure; the second substrate is located at one side of the dielectric layer away from the first substrate; the control assembly is configured to adjust the refractive index of the dielectric layer so as to adjust the wavelength of visible light passing through the color filter. According to the embodiment of the invention, the spectral line of the light passing through the color filter is narrower, the color is purer, when the filtering module is used for the image sensor, optical crosstalk can be avoided, and the frequency of the light passing through the filtering module can be adjustable and variable.

The invention relates to the technical field of coatings, in particular to a glass coating with high adhesive force and high light transmission and a preparation method thereof. The coating is prepared from the following raw materials in parts by weight: 40-50 parts of modified alkyd resin, 8-12 parts of water-based amino resin, 10-15 parts of fluorine-containing acrylate emulsion, 1-3 parts of ananti-reflection agent, 0.5-0.8 part of an antifoaming agent, 0.5-1 part of a thickener, 0.5-1 part of a leveling agent, 0.5-1 part of a wetting agent, 0.1-0.5 part of a film-forming agent, 0.1-0.5 part of a preservative and 30-50 part of deionized water. The coating prepared by the invention has excellent hydrophobic property, high adhesive force and good outdoor durability, and can keep the surface of the glass clean and light-transmitting for a long time; the preparation method is simple, easy to operate, green, environment-friendly and pollution-free, and can meet the requirements of different users.

The invention discloses a topological boundary state and harmonic frequency generation device based on lithium niobate voltage regulation and control. The lithium niobate is orderly arranged in a free space according to a specific interval period. Positive voltage and negative voltage are respectively applied to the left side and the right side of lithium niobate, and the refractive index of the lithium niobate material can be changed by utilizing an electro-optical modulation effect. Different from previous researches, the nonlinear optical effect is enhanced due to the fact that the topological structure has a strong local field at the boundary. Besides, topological boundary states generated by the structure are uniformly distributed in an arithmetic progression manner, which means that when the fundamental frequency light is in one boundary mode, the harmonic frequency light is also in a topological boundary state mode, so that all generated harmonic frequency light is immune to impurities or defects in the structure and has no backscattering, and the structure is protected by topology. The nonlinear optical effect based on the topology protection state provides a new way for generation of higher harmonics and generation of other nonlinear optical effects.

The invention discloses a refractive index tunable film structure and a preparation method thereof. The refractive index tunable film structure is formed by etching a periodic microstructure on the surface of a single-layer film, the structure of the refractive index tunable film structure sequentially comprises a compact film layer and a periodic microstructure film layer from bottom to top, therefractive index of the compact film layer is equal to the refractive index of a film material, and the refractive index of the periodic microstructure film layer is related to microstructure parameters. The surface microstructure is equivalent to a dielectric layer with the refraction coefficient changing continuously, the equivalent refraction coefficient of the dielectric layer is smaller thanthe refractive index of the thin film material, and the overall refractive index of the thin film can be regulated and controlled by regulating and controlling the equivalent refractive index of the dielectric layer. The preparation method comprises the following steps: (1) plating a film on the substrate surface; (2) cleaning a film surface, and spin-coating photoresist on the film surface; (3) exposing the sample by adopting double-beam interference; (4) developing to obtain a required mask pattern; (5) transferring the mask pattern to the film by adopting a reactive ion beam etching technology; and (6) cleaning residues generated by etching. The proportion of air in the film is controlled by regulating and controlling the height and the duty ratio of the nano microstructure in the film,so that the refractive index of the film material can be regulated and controlled. The method has an extremely wide refractive index regulation and control range (from the refractive index of the airlayer to the refractive index of the film material), and is simple in process and high in repeatability.

The invention relates to the field of ITO films, and particularly discloses a high-transmittance and low-resistance composite ITO film. The composite ITO film comprises a noble metal doped layer and an ITO film layer which are sequentially arranged on the surface of a substrate from inside to outside, and the noble metal doped layer is prepared by doping nano noble metal particles and nano metal particles. According to the technical scheme, the ITO film layer is arranged on the surface of the noble metal doped layer, high transmittance in a visible light region is obtained through the antireflection effect of the ITO film with the high refractive index, and on the basis, the noble metal doped layer is modified, so light scattering and photon absorption of the film are reduced, and the light transmission performance of the single-layer ITO thin film layer is improved; and the high-transmittance and low-resistance composite ITO film can be used in the aspects of displays, dimming films, electromagnetic shielding, infrared heat insulation and the like, and has excellent light transmittance, conductivity and infrared heat insulation performance.