A kind of preparation method of anti-scratch hydrophobic anti-reflection film
An anti-reflection coating and hydrophobic technology, applied in the coating and other directions, can solve the problems of poor wear resistance of nano-particle anti-reflection coatings, unfavorable surface adhesion of anti-reflection coatings and glass substrates, and discontinuous microscopic morphology of thin films.
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Embodiment 1
[0034] The preparation method of the scratch-resistant hydrophobic anti-reflection film of embodiment 1 comprises the following steps:
[0035] (1) Using tetraethyl orthosilicate as the precursor silicon source I to prepare hollow spheres of SiO 2 Nanoparticle solution, obtain solution I, the preparation process of this solution I is:
[0036]① Add ammonia monohydrate to water to obtain an aqueous solution of ammonia monohydrate, then disperse polyacrylic acid into the aqueous solution of ammonia monohydrate to obtain a mixed solution I-1;
[0037] ②Add mixed solution I-1 and precursor silicon source I to ethanol in sequence to obtain mixed solution I-2;
[0038] ③ Stir the mixed solution I-2, and reflux for 24 hours after aging for 18 hours to remove the ammonia water in the solution to obtain the solution I;
[0039] The molar ratio of ammonia monohydrate, water, polyacrylic acid, precursor silicon source I, and ethanol used successively in the preparation process of the a...
Embodiment 2
[0046] The preparation method of the scratch-resistant hydrophobic anti-reflection film of embodiment 2 comprises the following steps:
[0047] (1) Using tetraethyl orthosilicate as the precursor silicon source I to prepare hollow spheres of SiO 2 Nanoparticle solution, obtain solution I, the preparation process of this solution I is:
[0048] ① Add ammonia monohydrate to water to obtain an aqueous solution of ammonia monohydrate, then disperse polyacrylic acid into the aqueous solution of ammonia monohydrate to obtain a mixed solution I-1;
[0049] ②Add mixed solution I-1 and precursor silicon source I to ethanol in sequence to obtain mixed solution I-2;
[0050] ③ Stir the mixed solution I-2, reflux for 48 hours after aging for 12 hours, remove the ammonia water in the solution, and obtain the solution I;
[0051] The molar ratio of ammonia monohydrate, water, polyacrylic acid, precursor silicon source I, and ethanol used successively in the preparation process of the abov...
Embodiment 3
[0058] The preparation method of the scratch-resistant hydrophobic anti-reflection film of embodiment 3 comprises the following steps:
[0059] (1) Using tetraethyl orthosilicate as the precursor silicon source I to prepare hollow spheres of SiO 2 Nanoparticle solution, obtain solution I, the preparation process of this solution I is:
[0060] ① Add ammonia monohydrate to water to obtain an aqueous solution of ammonia monohydrate, then disperse polyacrylic acid into the aqueous solution of ammonia monohydrate to obtain a mixed solution I-1;
[0061] ②Add mixed solution I-1 and precursor silicon source I to ethanol in sequence to obtain mixed solution I-2;
[0062] ③ Stir the mixed solution I-2, reflux for 36 hours after aging for 24 hours, remove the ammonia water in the solution, and obtain the solution I;
[0063] The molar ratio of ammonia monohydrate, water, polyacrylic acid, precursor silicon source I, and ethanol used successively in the preparation process of the abov...
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