Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of preparation method of anti-scratch hydrophobic anti-reflection film

An anti-reflection coating and hydrophobic technology, applied in the coating and other directions, can solve the problems of poor wear resistance of nano-particle anti-reflection coatings, unfavorable surface adhesion of anti-reflection coatings and glass substrates, and discontinuous microscopic morphology of thin films.

Active Publication Date: 2021-06-15
宁波纳诺特新材料科技有限公司
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

CN106277839A patent and CN103881419A patent disclose that in hollow SiO 2 Hydrophobic group-containing silane precursors were directly added to the sol to obtain hollow spheres modified with hydrophobic groups SiO 2 Nanoparticles, thus preparing a coating with obvious hydrophobic properties, but the hydrophobically modified hollow sphere SiO 2 Only weak van der Waals force can be formed between nanoparticles and glass substrates, so the adhesion to the substrate is not as good as that of SiO, which is rich in hydroxyl groups on the surface. 2 The chemical bonding force formed between the nanoparticles and the substrate through the condensation of hydroxyl groups, which will lead to hydrophobically modified SiO 2 Nanoparticle anti-reflection coatings have poor wear resistance
At the same time, the addition of silane precursors with hydrophobic groups will also affect the hollow SiO 2 The connection between the particles leads to an increase in roughness, which not only affects the wear resistance, but also changes the anti-reflection properties to a certain extent
Only using hydrophobic groups on hollow sphere SiO 2 The technical solution of nanoparticle modification is not conducive to the adhesion of anti-reflection coatings and glass substrate surfaces, and at the same time affects the SiO 2 The connection between particles leads to the discontinuity of the microscopic morphology of the film, which cannot meet the requirements of high optical transmittance, strong mechanical stability and long-term moisture resistance of the anti-reflection film.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of preparation method of anti-scratch hydrophobic anti-reflection film
  • A kind of preparation method of anti-scratch hydrophobic anti-reflection film
  • A kind of preparation method of anti-scratch hydrophobic anti-reflection film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] The preparation method of the scratch-resistant hydrophobic anti-reflection film of embodiment 1 comprises the following steps:

[0035] (1) Using tetraethyl orthosilicate as the precursor silicon source I to prepare hollow spheres of SiO 2 Nanoparticle solution, obtain solution I, the preparation process of this solution I is:

[0036]① Add ammonia monohydrate to water to obtain an aqueous solution of ammonia monohydrate, then disperse polyacrylic acid into the aqueous solution of ammonia monohydrate to obtain a mixed solution I-1;

[0037] ②Add mixed solution I-1 and precursor silicon source I to ethanol in sequence to obtain mixed solution I-2;

[0038] ③ Stir the mixed solution I-2, and reflux for 24 hours after aging for 18 hours to remove the ammonia water in the solution to obtain the solution I;

[0039] The molar ratio of ammonia monohydrate, water, polyacrylic acid, precursor silicon source I, and ethanol used successively in the preparation process of the a...

Embodiment 2

[0046] The preparation method of the scratch-resistant hydrophobic anti-reflection film of embodiment 2 comprises the following steps:

[0047] (1) Using tetraethyl orthosilicate as the precursor silicon source I to prepare hollow spheres of SiO 2 Nanoparticle solution, obtain solution I, the preparation process of this solution I is:

[0048] ① Add ammonia monohydrate to water to obtain an aqueous solution of ammonia monohydrate, then disperse polyacrylic acid into the aqueous solution of ammonia monohydrate to obtain a mixed solution I-1;

[0049] ②Add mixed solution I-1 and precursor silicon source I to ethanol in sequence to obtain mixed solution I-2;

[0050] ③ Stir the mixed solution I-2, reflux for 48 hours after aging for 12 hours, remove the ammonia water in the solution, and obtain the solution I;

[0051] The molar ratio of ammonia monohydrate, water, polyacrylic acid, precursor silicon source I, and ethanol used successively in the preparation process of the abov...

Embodiment 3

[0058] The preparation method of the scratch-resistant hydrophobic anti-reflection film of embodiment 3 comprises the following steps:

[0059] (1) Using tetraethyl orthosilicate as the precursor silicon source I to prepare hollow spheres of SiO 2 Nanoparticle solution, obtain solution I, the preparation process of this solution I is:

[0060] ① Add ammonia monohydrate to water to obtain an aqueous solution of ammonia monohydrate, then disperse polyacrylic acid into the aqueous solution of ammonia monohydrate to obtain a mixed solution I-1;

[0061] ②Add mixed solution I-1 and precursor silicon source I to ethanol in sequence to obtain mixed solution I-2;

[0062] ③ Stir the mixed solution I-2, reflux for 36 hours after aging for 24 hours, remove the ammonia water in the solution, and obtain the solution I;

[0063] The molar ratio of ammonia monohydrate, water, polyacrylic acid, precursor silicon source I, and ethanol used successively in the preparation process of the abov...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
water contact angleaaaaaaaaaa
particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for preparing a scratch-resistant hydrophobic anti-reflection film. The hydrophobic anti-reflection film is prepared by coating a transparent substrate with a hybrid sol, and the hybrid sol is made of hydrophobically modified hollow spheres SiO 2 Nanoparticles are cross-linked and hybridized with hydrophilic inorganic nano-binders. The method of the present invention simultaneously treats the hydrophobically modified hollow sphere SiO 2 The cross-linking between the nanoparticles and the substrate can avoid the disadvantage of no chemical bonding between the hydrophobic anti-reflection film and the substrate prepared by the traditional method, and effectively improve the wear resistance of the anti-reflection film. Hollow spheres of SiO on the hydrophobic antireflection film 2 Nanoparticles have a closed pore structure and hydrophobic properties that form a double protective barrier against moisture and pollutants. The scratch-resistant hydrophobic anti-reflection film has high optical transmittance, strong mechanical stability and long-term moisture-proof and anti-fouling properties.

Description

technical field [0001] The invention belongs to the technical field of antireflection film preparation, and in particular relates to a preparation method of a scratch-resistant hydrophobic antireflection film. Background technique [0002] The outdoor application of anti-reflection film not only requires high optical transmittance, but also needs to consider the mechanical stability of anti-reflection film. Traditional SiO 2 AR coatings are usually prepared by the sol-gel method. Preparation of SiO by Sol-Gel Method 2 Anti-reflection coatings usually have the advantages of high light transmittance, high resistance to laser damage threshold, and low cost, and are widely used in high-energy laser systems and solar power generation systems. And this traditional SiO 2 Anti-reflective coating made of solid SiO 2 Nanoparticles are loosely packed, there are a large number of open pores between the particles, and the surface of the particles is rich in hydroxyl groups, which ma...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/25C08J7/06
CPCC03C17/25C03C2217/213C03C2217/45C03C2217/478C08J7/06
Inventor 不公告发明人
Owner 宁波纳诺特新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products