54results about How to "Small side erosion" patented technology

The invention relates to a method for the etching cutting of a glass substrate. An etching cutting solution used by the method includes about 10.1-20wt% of hydrofluoric acid, about 5-20wt% of glycollic acid, about 0-30wt% of nitric acid and about 30-84.9wt% of water, the weight percentage content of each of the above components is based on the total weight of the etching cutting solution, and the etching cutting solution basically contains no ammonium fluoride. The invention also relates to a glass substrate. The glass substrate is obtained through the method. Compared with glass substrates obtained after the etching cutting through a solution only containing hydrofluoric acid, the cut glass substrate in the invention has the advantages of less lateral etching and large corner angle.

The invention discloses a method for etching a flat surface of a metal product and a curved surface connected with the flat surface. According to the method, a concavo-convex continuous microstructure is formed in the surface of the metal product by controlling the size of mask blocks and mask gap on the flat surface and the curved surface of the metal product and controlling related process parameters such as etching time, etching pressure and the like in an etching process; the depth of each pit is gradually reduced from the center of the flat surface to the edge of the curved surface; the section of the pit is shaped like a trough arc of sine wave; each projection does not have an obvious edge; the adaption part of the projection is in smooth transition; the section of the projection is similar to a quadrangular shape; the whole structure is in gentle transition; the microstructure takes on gradual transition connection of from existence to null and has good visual and tactile effects; and the requirements on higher anti-skid performance and attractive appearance can be met.

The invention discloses a manufacturing method of a fine circuit board free of a corrosion resistant layer. The method comprises the processes of laminating, base copper reduction, drilling, depositing copper preplating, pattern electroplating, stripping and flash rusting and subsequent processes. According to the manufacturing method, the fine circuit board is manufactured by combining a thin copper foil with a flash rusting technology; the manufacturing method can be used for manufacturing an ultrafine circuit; and the manufacturing accuracy of the circuit is improved.

The invention relates to a two-liquid acid etching liquid oxidant used for all kinds of copper chloride etching systems. The two-liquid acid etching liquid oxidant contains the following components by weight percent: 35-37 percent of sodium chlorate, 6-8 percent of sodium chloride, 0.15-0.25 percent of additive and 55-58 percent of water. The invention has the advantages that the amount of dissolved copper is large, the side etching is small, no sediment is produced during use and the stability is high.

The invention relates to a cyclic regeneration technology for etching waste solution, in particular to a system for cyclic regeneration of the etching waste solution and recovery processing of copper. The etching waste solution generated by an etching machine and ammonia board-washing waste solution pass through an etching waste solution inlet in the system and respectively enter into a primary extraction cylinder and a secondary extraction cylinder; extracting agent in an extracting agent circulation cylinder passes through an extracting agent inlet and enters into the primary extraction cylinder and the secondary extraction cylinder; copper ions in the etching waste solution are extracted and separated by the extracting agent; the etching waste solution becomes regenerated etching solution and ammonia wash solution, passes through a regenerated solution outlet and enters into the etching solution regeneration system for respective composition preparation, and then an etching procedure and an ammonia board-washing procedure are performed. During the whole process of the system, closed cycle is realized; no waste water and waste gas are exhausted; the copper, the regenerated etching solution and the ammonia wash solution can be recovered high efficiently; the sewage discharge rate of the etching procedure is greatly reduced; the environmental protection pressure is reduced; moreover, the processing and running cost is reduced because three circulating systems can be operated continuously.

The invention discloses an addition process manufacturing process of a fine circuit board, which comprises the following steps of immersing a base material into a micro-etching solution, and carrying out micro-etching treatment on the base material under the assistance of ultrasonic oscillation, placing the base material in a chemical copper plating solution for chemical copper plating, and acquiring a copper-clad base material, drilling a via hole in the copper-clad base material, depositing a conductive carbon layer on the via hole of the copper-clad base material, pasting a photosensitive dry film on the copper-clad base material, performing exposure and development treatment on the photosensitive dry film to obtain a groove of a fine circuit, forming a copper layer in the groove in an electroplating mode, and removing the dry film, and placing the copper-clad base material in a flash etching solution to be subjected to flash etching treatment. According to the process, the conductive carbon layer is adopted to realize the conduction between the conducting hole and the circuit, the copper circuit is directly formed by matching the pattern electroplating process with the flash etching process, the process is simple, the production cost is low, the production efficiency is high, the binding force between the copper circuit of the manufactured circuit board and the base material is high, and the product yield is high.

The invention provides a light-cured colorized composition for manufacturing liquid crystal display color filters. The light-cured colorized composition is characterized in that an alkali-soluble side group contained in alkali-soluble resin is at least one of the following (I), (II), (III), and (IV), wherein R is a non-aromatic group. In addition, at least one hydrogen abstracting photoinitiator is contained. -R-S-CH2-COOH (I).

The invention discloses an etching method based on a nickel-phosphorus alloy buried resistance copper foil, comprising the steps of: providing a nickel-phosphorus alloy buried resistance plate, laminating a film on the nickel-phosphorus alloy buried resistance plate, and forming a circuit pattern by exposure and development; etching away a copper layer and a nickel-phosphorus alloy buried resistance layer on the non-circuit pattern portion of the nickel-phosphorus alloy buried resistance plate by an acid etching process, and forming a circuit by retreating the film, wherein the time for etching the nickel-phosphorus alloy buried resistance layer is twice to three times the time for etching copper foil of the same thickness; according to the amount of side etching of the first board, compensating the circuit pattern and then executing mass production; applying a film to the nickel-phosphorus alloy buried resistance plate, and opening a window in the circuit at a joint corresponding to the nickel-phosphorus alloy buried resistance layer; etching away the copper layer at the window by an alkaline etching process, and then retreating the film. The method of the invention simplifies thecorresponding production process, improves the production efficiency, and prevents the copper layer in the circuit pattern from being seriously laterally eroded.

The invention discloses a copper etching solution. The copper etching solution comprises the following components in parts by weight: 1.0-8.0 parts of organic acid; 0.1 to 4.0 parts of an amine compound containing a carboxylic acid group; 0.001 to 1.0 part of an amide type surface active agent; 0.3 to 3.0 parts of an organic phosphine compound; 1-10 parts of hydrogen peroxide; and 70.0 to 99.0 parts of water. In a certain concentration range, the copper layer on the wafer can be effectively removed by compounding the organic acid, the amine compound containing the carboxylic acid group, the amide type surface active agent, the organic phosphine compound, the hydrogen peroxide and the water. In especial, due to the introduction of the amine compound containing the carboxylic acid group and the amide type surface active agent, the synergistic effect of the amine compound containing the carboxylic acid group and the amide type surface active agent not only reduces the corrosion of metal, but also reduces lateral erosion and controls CD-loss within 300nm, so that effective technical support is provided for manufacturing wafer-level packaging narrow-pitch bumps and fine lines.

The invention relates to an etching solution for processing an N-type silicon microchannel array by a photon-assisted electrochemical etching method, which belongs to the technical field of silicon micro-processing. In the prior art, the etching solution for processing an N-type silicon microchannel array by a photon-assisted electrochemical etching method is made by adding ethanol or p-octyl polyethylene glycol phenyl ether, which is used as a surfacetant, into hydrofluoric acid electrolyte, and the etching solution can result in severe lateral erosion in the etching process. The etching solution of the invention is prepared from hydrofluoric acid and ethanol water solution, wherein the concentration of the hydrofluoric acid is 1-10 wt%, and the concentration of the ethanol is5-10 wt%. In addition, an anionic surfactant is added, and the amount of the anionic surfactant is 0.1-1% of the hydrofluoric acid and ethanol water solution by volume. The invention is used for processing N-type macro-pore silicon microchannel arrays.

The invention provides application of a carbamate compound in a magnesium alloy etching additive. The carbamate compound achieves the effects of uniform corrosion inhibition and reducing of lateral corrosion on the magnesium alloy etching additive. The carbamate compound mainly comprises carbamate, 1,6-hexamethylenedicarbamate, isophorone dicarbamate, phenyl carbamate, toluene dicarbamate, 1,2-hexamethylene dicarbamate, 1,4-hexamethylene dicarbamate, and 4,4-diphenylmethane dicarbamate. The carbamate compound is matched with a corresponding surfactant, a defoaming agent, a solvent, deionized water and the like to form the additive for magnesium alloy etching, and the compound has the advantages that the use amount is small, and an etching process window is wide; meanwhile, the compound contains amino groups and ester groups, the composition of the additive is greatly simplified, the service life of the additive is prolonged, and the compound has obvious social and economic benefits.