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168results about How to "Improve material quality" patented technology

Thin Interdigitated backside contact solar cell and manufacturing process thereof

A design and manufacturing method for an interdigitated backside contact photovoltaic (PV) solar cell less than 100 μm thick are disclosed. A porous silicon layer is formed on a wafer substrate. Portions of the PV cell are then formed using diffusion, epitaxy and autodoping from the substrate. All backside processing of the solar cell (junctions, passivation layer, metal contacts to the N+ and P+ regions) is performed while the thin epitaxial layer is attached to the porous layer and substrate. After backside processing, the wafer is clamped and exfoliated. The front of the PV cell is completed from the region of the wafer near the exfoliation fracture layer, with subsequent removal of the porous layer, texturing, passivation and deposition of an antireflective coating. During manufacturing, the cell is always supported by either the bulk wafer or a wafer chuck, with no processing of bare thin PV cells.
Owner:CRYSTAL SOLAR INC

Surface inspecting method and device

A light source section outputs optical flux having two types of wavelength, which are a short wavelength and a long wavelength, while the intensity is made variable. The optical flux is made incident to a detected surface of a body to be detected at a predetermined incident angle simultaneously or alternatively. Based on a type of optical flux outputted from the light source section and an output from a first light intensity detecting section, at least the intensity of the optical flux having a long wavelength outputted from the light source section is adjusted. The output from the first light intensity detecting section in irradiating the optical flux having a short wavelength is compared with the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength. A signal that appears only in the output from the first light intensity detecting section in irradiating the optical flux having a long wavelength is identified as a detected signal from an internal subject. The intensity of optical flux having a long wavelength is adjusted. A disappearance level near a point where the detected signal from the internal subject disappears is calculated. The first intensity of optical flux having a long wavelength is set to level higher than the disappearance level. Based on the output from the first light intensity detecting section obtained by the optical flux having a long wavelength of the first intensity, a subject inside the body to be detected is measured.
Owner:KK TOPCON

Method for fabricating a semi-polar nitride semiconductor

A method for fabricating a semi-polar nitride semiconductor is disclosed, comprising following steps: firstly, a (001) substrate tilted at 7 degrees and having a plurality of V-like grooves is provided, and tilted surfaces of the V-like groove are a (111) surface at 61.7 degrees and a ( 111) surface at 47.7 degrees; next, a surface of said substrate is cleaned by using a deoxidized solution, and then a buffer layer is formed on said substrate to cover said V-like grooves; then, said buffer layer is covered with an oxide layer except for said buffer layer formed on said (111) surface at 61.7 degrees; and finally, said semi-polar nitride semiconductor is formed on said buffer layer having (111) surface at 61.7 degrees to enhance the quality of said semi-polar nitride semiconductor.
Owner:NAT CENT UNIV

Controlling doping of synthetic diamond material

A method of manufacturing synthetic CVD diamond material, the method comprising: providing a microwave plasma reactor comprising: a plasma chamber; one or more substrates disposed in the plasma chamber providing a growth surface area over which the synthetic CVD diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom, injecting process gases into the plasma chamber; feeding microwaves from the microwave generator into the plasma chamber through the microwave coupling configuration to form a plasma above the growth surface area; and growing synthetic CVD diamond material over the growth surface area, wherein the process gases comprise at least one dopant in gaseous form, selected from a one or more of boron, silicon, sulphur, phosphorous, lithium and beryllium at a concentration equal to or greater than 0.01 ppm and/or nitrogen at a concentration equal to or greater than 0.3 ppm, wherein the gas flow system includes a gas inlet comprising one or more gas inlet nozzles disposed opposite the growth surface area and configured to inject process gases towards the growth surface area, and wherein the process gases are injected towards the growth surface area at a total gas flow rate equal to or greater than 500 standard cm3 per minute and/or wherein the process gases are injected into the plasma chamber through the or each gas inlet nozzle with a Reynolds number a Reynolds number in a range 1 to 100.
Owner:ELEMENT SIX LTD

Method for optimizing tension system for rolling of ultra thin steel strip of cold continuous rolling mill

The invention discloses a method for optimizing a tension system for rolling of an ultra thin steel strip of a cold continuous rolling mill, and relates to control equipment or method special for metal rolling mills or machining products of the metal rolling mills, in particular to optimization of a comprehensively-controlled tension system in the rolling process of ultra thin materials of the cold continuous rolling mill. The cold continuous rolling mill is used for controlling existing equipment parameter and technological parameter data of equipment; according to inlet tensile stress, outlet tensile stress, deformation resistance, the rolling speed, the width of a strip material, the inlet thickness, the output thickness and the working roller diameter of all racks, slipping factors, hot slip indexes, vibration coefficients, rolling force and rolling power of all the racks under the current working condition are calculated; through program control of a computer, optimization control over the tension system is achieved; the depressing capacity, the rolling efficiency and outlet strip shapes and tensile stress distribution of all the racks are considered while the rolling stability, slippage, heat slippage and vibration are considered; and the tail rack output strip shape which represents the strip quality is obviously reduced, and the strip quality is obviously improved than that of a traditional method.
Owner:BAOSHAN IRON & STEEL CO LTD

Method for improving antistatic capability of gallium nitride based light emitting diode

The invention discloses a method for improving antistatic capability of a gallium nitride based light emitting diode. The method comprises the following steps: selecting a substrate; growing a gallium nitride nucleating layer on the substrate; growing an involuntary doped gallium nitride layer on the gallium nitride nucleating layer; growing an aluminum gallium nitride/ gallium nitride superlattice insertion layer on the involuntary doped gallium nitride layer; growing an N-type doped gallium nitride layer on the aluminum gallium nitride/ gallium nitride superlattice insertion layer; growing an indium gallium aluminum nitride multiple quantum-well light-emitting layer on the N-type doped gallium nitride layer; growing a P-type doped indium gallium aluminum nitride layer on the indium gallium aluminum nitride multiple quantum-well light-emitting layer; and growing a P-type doped gallium nitride layer on the P-type doped indium gallium aluminum nitride layer. By utilizing the method provided by the invention, the stress caused by lattice mismatch in an epitaxial layer can be modulated, simultaneously the dislocation in the epitaxial layer of the GaN (gallium nitride) can be deflected and combined, thus the density of threading dislocation in the epitaxial layer developed subsequently is reduced, the material quality is improved, and the antistatic capability of the light emitting diode is improved.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Foam ceramic light-weight plate and preparation method thereof

The invention discloses a foam ceramic light-weight plate, which is mainly prepared from the following raw materials in percentage by weight: 70 to 96 percent of ceramic tile polished waste slag, 0 to10 percent of clay, 0 to 20 percent of feldspar, 0.01 to 0.6 percent of foaming agents and 0.1 to 4 percent of stabilizing agents, wherein the stabilizing agents are manganese dioxide. Correspondingly, the invention also provides a preparation method of the foam ceramic light-weight plate. By using the foam ceramic light-weight plate and the preparation method, air holes are identical from top tobottom at the same cross section of the foam ceramic light-weight plate; the bubble uniformity is high; a tunnel kiln can be used for firing; a roller kiln can also be used for firing.
Owner:KEDA INDUSTRIAL GROUP CO LTD

Quantum dot optoelectronic device having an sb-containing overgrown layer

InactiveUS20080258132A1Improve quality and carrier confinementEnhance it optical characteristic and thermal stabilityNanoinformaticsSemiconductor devicesQuantum dotCharge carrier
A quantum dot optoelectronic device has an overgrown layer containing antimony (Sb). The optical characteristics and thermal stability of the optoelectronic device are thus greatly enhanced due to the improved crystal quality and carrier confinement of the quantum dot structure.
Owner:NAT CENT UNIV
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