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Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density

There is disclosed a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as a hemisphere or dome. The reactor further includes an inductive antenna over the ceiling which may be conformal or nonconformal in shape with the ceiling. The ceiling may be a semiconductor material so that it can function as both a window for the inductive field of the antenna as well as an electrode which can be grounded, or to which RF power may be applied or which may be allowed to float electrically. The reactor includes various features which allow the radial distribution of the plasma ion density across the wafer surface to be adjusted to an optimum distribution for processing uniformity across the wafer surface.
Owner:APPLIED MATERIALS INC

Lighting device and lighting method

A lighting device comprising first and second groups of solid state light emitters, which emit light having peak wavelength in ranges of from 430 nm to 480 nm, and first and second groups of lumiphors which emit light having dominant wavelength in the range of from 555 nm to 585 nm. In some embodiments, if current is supplied to a power line, a combination of (1) light exiting the lighting device which was emitted by the first group of emitters, and (2) light exiting the lighting device which was emitted by the first group of lumiphors would have a correlated color temperature which differs by at least 50 K from a correlated color temperature which would be emitted by a combination of (3) light exiting the lighting device which was emitted by the second group of emitters, and (4) light exiting the lighting device which was emitted by the second group of lumiphors.
Owner:IDEAL IND LIGHTING LLC

Plasma reactor having an inductive antenna coupling power through a parallel plate electrode

A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into the chamber, an electrical terminal coupled to the semiconductor window electrode, an inductive antenna adjacent one side of the semiconductor window electrode opposite the base for coupling power into the interior of said chamber through the semiconductor window electrode.
Owner:APPLIED MATERIALS INC

Detection of analytes using electrochemistry

The present invention relates to diagnostic assays whereby the detection means is based on electrochemical reactions. This means that the label to be detected provides an electric signal. Preferred labels are enzymes giving such a signal. Provided is a flow cell whereby a solid phase is provided in a flow stream of the sample, in close proximity to a working electrode to detect any electrical signal. In a typical embodiment, a sample is mixed with molecule having specific binding affinity for an analyte of which the presence in the sample is to be detected, whereby said specific binding molecule is provided with a label. The conjugate of labelled specific binding molecule and analyte is then immobilized on the solid phase in the vicinity of the working electrode, the flow cell is rinsed with a solution and afterwards a substrate solution for the label (an enzyme) is provided upon which an electrical signal is generated and can be detected by the working electrode. The methods and devices of the present invention are particular useful for liquids which comprise many substances that may disturb measurement in conventional assays. The design of the flow cell allows for removal of said interfering substances before measurement. In a preferred embodiment at least part of the solid phase is provided in the form of magnetic beads. In this embodiment the solid phase can be mixed with the sample thereby creating a longer reaction time, a better sensitivity and a higher speed of the assay.
Owner:DSM NV

Enabling on-chip features via efuses

Systems and methods for enabling on-chip features via efuses. A system comprises an electronic fuse (Efuse) array (EFA) coupled to each features capability register (FCR) within an instantiated computational block. The EFA comprises a plurality of rows wherein programming an row comprises blowing one or more Efuses of the row. A valid row comprises programmed Efuses corresponding to one or more on-chip enabled features. The EFA is further configured to prevent enabling of disabled on-chip features from occurring subsequent to a predetermined point in time, such as the time of shipping the chip to the field for use by end-users, by establishing a particular default state for electronic fuses and rendering unusable any unprogrammed entries of the EFA. In one embodiment, some features correspond to on-chip hardware cryptographic acceleration. By preventing the ability to re-enable these features after shipping, it is possible to send semiconductor chips to foreign countries with only predetermined features enabled and no threat of disabled features being later enabled.
Owner:ORACLE INT CORP
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