Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

952results about How to "Uniform surface" patented technology

Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density

There is disclosed a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as a hemisphere or dome. The reactor further includes an inductive antenna over the ceiling which may be conformal or nonconformal in shape with the ceiling. The ceiling may be a semiconductor material so that it can function as both a window for the inductive field of the antenna as well as an electrode which can be grounded, or to which RF power may be applied or which may be allowed to float electrically. The reactor includes various features which allow the radial distribution of the plasma ion density across the wafer surface to be adjusted to an optimum distribution for processing uniformity across the wafer surface.
Owner:APPLIED MATERIALS INC

Plasma reactor having an inductive antenna coupling power through a parallel plate electrode

A plasma reactor for processing a workpiece includes a reactor enclosure defining a processing chamber, a base within the chamber for supporting the workpiece during processing thereof, a semiconductor window electrode overlying the base, a gas inlet system for admitting a plasma precursor gas into the chamber, an electrical terminal coupled to the semiconductor window electrode, an inductive antenna adjacent one side of the semiconductor window electrode opposite the base for coupling power into the interior of said chamber through the semiconductor window electrode.
Owner:APPLIED MATERIALS INC

Method for preparing graphite alkyne film

The invention discloses a method for preparing a graphite alkyne film. The method comprises that: a copper sheet or any one substrate the surface of which is covered with a copper film layer is used as a substrate; 6-alkynyl-benzene is subjected to coupling reaction in a solvent under the catalytic action of the copper to obtain the graphite alkyne film on the surface of the substrate. The method for preparing the graphite alkyne film, which is provided by the invention, has simple and convenient process, and can carry out large-scale preparation of the graphite alkyne film on the surface of the copper sheet or the substrate any surface of which is covered with the copper. The electrical conductivity of the graphite alkyne film is 2.516*10-4S / m. The film has uniform surface, can exist stably in the air, is a semiconductor with similar performances with silicon, and has potential application prospect in the fields of catalysis, electron, semiconductor, energy, material and the like.
Owner:INST OF CHEM CHINESE ACAD OF SCI

Water-based copper and aluminum wiredrawing oil composite and preparation method thereof

The invention relates to an oil-based lubricating composite and a preparation method thereof, in particular to a water-based copper and aluminum wiredrawing oil composite and a preparation method thereof. The water-based copper and aluminum wiredrawing oil composite comprises base oil, an emulsifier, an auxiliary emulsifier, a defoaming agent, a rust-proof agent, an antiseptic and an antiwear agent. The preparation method comprises the following steps of: configuring the water-based copper and aluminum wiredrawing oil composite into 3 percent to 45 percent water-based emulsion according to weight percentage; and spraying the water-based emulsion into a wiredrawing die cavity in the copper and aluminum wiredrawing process. The water-based copper and aluminum wiredrawing oil composite has the advantages of excellent lubricating property, great optimal light stability and storage stability, low cost, good cooling effect, fast heat transfer, little temperature increase in the using process, difficult combustion and easy cleaning and ensures the safety of the service environment; and in addition, a copper wire and an aluminum wire drawn by the method have the advantages of uniform wireshape, bright surfaces, difficult corrosion, good ultraviolet and storage stability and good stability.
Owner:PETROCHINA KARAMAY PETROCHEMICAL CO LTD

III-V nitride semiconductor substrate and its production method

A self-supported III-V nitride semiconductor substrate having a substantially uniform carrier concentration distribution in a surface layer existing from a top surface to a depth of at least 10 μm is produced by growing a III-V nitride semiconductor crystal while forming a plurality of projections on a crystal growth interface at the initial or intermediate stage of crystal growth; conducting the crystal growth until recesses between the projections are buried, so that the crystal growth interface becomes flat; and continuing the crystal growth to a thickness of 10 μm or more while keeping the crystal growth interface flat.
Owner:SUMITOMO CHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products