45results about How to "High resistance to laser damage threshold" patented technology

The invention discloses a laser-irradiation-resistant diffuse reflection metal panel and a manufacturing method thereof. After a metal base plate is subjected to sand blasting so as to become a diffuse surface, a zinc film, a nickel film and a golden film are sequentially coated on the diffuse surface, the laser-resistant damage threshold of the metal panel can be improved effectively, and at the same time, the damage of a component on the optical path caused by mirror reflectors is avoided.

A preparation method of laser damage-resisting wide-band antireflecting film with ethyl emtasilicate as presoma includes mixing water, absolute alcohol, polyvinyl pyrrolidone and polyglycol in a certain proportion in the presence of ammonia water catalyst, reaction by sufficient stirring, ageing, and film plating. The present invention has the advantages of mild preparation condition, low cost and simple operation, and the prepared SiO2 film has antireflecting performance of 400-600 nm bandwidth and high laser damage resistance.

The invention relates to a reflecting mirror with high reliability for a laser gyro prepared through ion beam sputtering. The reflecting mirror is prepared by the following steps of: alternately plating a regularTiO2 / SiO2 film high reflective coating with 1 / 4 working wavelength on a nano-grade quartz base by adopting a double-ion-beam sputtering and depositing process, plating a layer of extremely thin air interface layer material HfO2 at the outermost layer, and carrying out postprocessing under the condition of 340 DEG C / 6h on a reflecting mirror film in the air after the plating is finished. The reflecting mirror provided by the invention has extremely low loss and dispersion, a high laser damage resistant threshold, heat stability within 340 DEG C and favorable plasma discharging environment resisting capacity and can keep stable optical property of over 15000Sec in an environment with the plasma energy of 200w. The reflecting mirror prepared by using the technology provided by the invention has stable working property in a gyro resonator, has high environment reliability and can meet the application requirement of a high-precision laser gyro.

The invention belongs to the field of thin film optics, and in particular relates to an evaporation method for improving a laser induced damage threshold of an oxide film, mainly aiming at the key factors, which comprise the absorption and defects in films, and causes the damage in laser-induced film. The ineffective evaporation materials are blocked and adsorbed by adding an isolation baffle between the evaporation source and the substrate, thereby reducing the pollution to the vicinity of the substrate and decreasing the probability for defects formation in the film; oxygen radicals, which have stronger oxidization capability than conventional molecular oxygen and ions oxygen, are introduced into the vacuum chamber to allow oxygen radicals to be incident on the surface of the substrate so that the deposition material is possibly sufficiently oxidized under high vacuum conditions, and the absorption of the film is reduced, thereby obtaining the oxide film having higher threshold. The method not only retains the unique beneficial properties of the electron beam thermal evaporation method for plating a laser film and but also improves the intrinsic absorption and the defect density of the film; and the preparation method has the characteristics of strong pertinence, high quality and simplicity and feasibility.

A light-induced stable nonlinear chalcogenide thin film and a preparation method thereof belong to optical thin films and nonlinear optical materials. The chemical composition of the film is Ge x As y S z Se 100‑x‑y‑z , wherein 10≤x≤14, 20≤y≤28, 16≤z≤50; its preparation adopts vacuum thermal evaporation method, and the vacuum degree is 10 ‑4 ~10 ‑6 torr, the evaporation rate is 3~20nm / min. The chalcogenide film prepared by the present invention has a refractive index of 2.20 to 2.56 at a wavelength of 1.55 μm, and the change of the film’s refractive index under thermal annealing and sub-band gap light is less than 10 ‑3 ; The optical band gap is 1.98~2.48ev; the loss of the film at 1.55μm wavelength is less than 0.2dB / cm; the third-order nonlinear refractive index at 1.55μm wavelength is 2.0~6.0x10 ‑14 cm 2 / W, no significant two-photon absorption; laser damage threshold greater than 200GW / cm 2 (5.3μm, 150fs, 1kHz). Advantages: 1. The light-induced refractive index change is extremely small, and the optical performance of the device is stable; 2. The anti-laser damage threshold of the film is high, which is conducive to the application of the device in the field of nonlinear optics; 3. The film composition and The refractive index is consistent with the bulk raw material used, and the consistency of film properties prepared in different batches is easy to control.