Method for washing optical substrate before film coating

Abstract

The invention relates to a method for washing an optical substrate before film coating. According to the operating method, diethyl ether and ethyl alcohol are replaced by n-heptane which is used for preparing a mixed washing solution according to a certain proportion, and the mixed washing solution is dripped to optical washing dust-free cloth to wipe and wash optical quartz glass. The dirt removing situation of the substrate is observed through the irradiation of a high-light optical detecting lamp, and accordingly the purpose of cleaning the substrate is achieved. By means of the method for washing the optical substrate before film coating, the adhesive force of an optical thin film can be improved, the anti-laser-damaged threshold value of the thin film can be increased, and the service life of the optical thin film can be prolonged.

Description

technical field [0001] The invention relates to the field of optical cleaning, in particular to a cleaning method for a quartz glass substrate before coating. Background technique [0002] Laser thin film deposition is an important link in the preparation of optical components in laser systems, and its quality and performance are important factors that affect and ensure the performance of the entire system. With the development of high-energy and high-power laser systems, the acquisition and maintenance of clean surfaces of optical components has become more and more important. Laser inertial confinement sudden change devices, such as the Nova device in the United States, the National Ignition Facility (NIF) in the United States, and the Shenguang series devices in China, all contain a large number of laser devices and optical components. These high-power laser systems place higher demands on laser thin films, especially an increase in the damage threshold. Exploring how t...

AI Technical Summary

Problems solved by technology

Judging from the current usage situation, there is still a large gap between the damage threshold value of the laser thin film provided in China and the international level, and one of the reasons for this gap is that the research on the cleaning technology of the front surface of the substrate coating is not deep enough

At present, a mixture of ethanol and ether is mainly used for cleaning optical substrates. Using this mixture to clean is easy to form a fog film on the surface of the substrate, which affects the optical properties of the substrate after coating and the adhesion between the film layer and the substrate.