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Method for raising refractive index of hafnium oxide film

A technology of refractive index and film layer, which is applied in the field of electron beam evaporation coating, can solve the problems affecting the anti-laser damage threshold of thin-film components, and achieve the effect of improving the anti-laser damage threshold, increasing the band gap of the film layer, and increasing the refractive index

Inactive Publication Date: 2016-04-20
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] In summary, the above-mentioned means of increasing the refractive index of the film layer may affect the laser damage resistance threshold of thin film components, and the laser damage resistance threshold is one of the most concerned properties in evaluating thin film components for high-power lasers

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  • Method for raising refractive index of hafnium oxide film
  • Method for raising refractive index of hafnium oxide film

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Embodiment Construction

[0021] The present invention will be further described in conjunction with embodiment and accompanying drawing below.

[0022] see first figure 1 , figure 1 Improve HfO for the present invention 2 Schematic diagram of the structure of the computer-controlled electron beam evaporation coating machine coating device used in the method of film layer refractive index. As can be seen from the figure, the coating device used in the present invention includes an optical film thickness monitoring system composed of light source emission system 18, monitoring sheet system 14, signal receiving system 19 and lock-in amplifier 12, and a computer 30 with control program , The baffle switch control circuit 20. The lock-in amplifier 12 is connected to the first serial port 29 of the computer 30 with the control program through the RS232 serial port 34 that comes with it, and the 2nd pin and the 3rd pin of the computer parallel port 31 pass through the shielded wire through the baffle swit...

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Abstract

The invention provides a method for raising the refractive index of a hafnium oxide film. The HfO2 film is manufactured through electron beam evaporation plating, and the method is characterized in that HfO2 film materials of a first evaporation source are evaporated, SiO2 film materials of a second evaporation source are evaporated at the same time, and the proportion of the deposition rate UpsilonH of the HfO2 film materials to the deposition rate UpsilonL of the SiO2 film materials is greater than 4: 1. By means of the method, the refractive index of the film can be raised, and it is avoided that the laser damage resistance threshold value of the film declines due to negative factors such as film absorption and defect density raising. A certain proportion of SiO2 is mixed into the HfO2 film, the band gaps of the film are increased, and thereby the laser damage resistance threshold value of the film can be raised to a certain degree.

Description

technical field [0001] The invention is related to the electron beam evaporation coating technology, and relates to a method for increasing hafnium oxide (HfO 2 ) method of the refractive index of the film layer. Background technique [0002] HfO 2 It is currently the most commonly used high-refractive index coating material for the preparation of thin-film components for high-power lasers (nanosecond pulses), because it has a relatively high laser damage threshold, excellent thermal and chemical stability, and UV to infrared Large optically clear areas. Among many deposition technologies, electron beam evaporation technology is currently the most commonly used preparation method for large-scale thin-film components in large-scale high-power laser devices at home and abroad. However, the thin film prepared by electron beam evaporation coating technology is porous, so that the refractive index of the film layer is lower than that of the bulk material. The reflectivity and...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/30C23C14/08C23C14/10C23C14/54
CPCC23C14/30C23C14/083C23C14/10C23C14/542
Inventor 朱美萍邢焕彬柴英杰孙建易葵邵建达
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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