The invention relates to the field of
optical thin film spectrum test, and in particular relates to a method for accurately calibrating the optical constant of the visible light waveband of an
optical thin film. Particularly, the invention provides an
optical coefficient measurement method of the visible light waveband of the thin film, and particularly relates to a method for accurately calibrating the optical constant of the visible light waveband of
silicon dioxide thin
film material; the method is simple and convenient, and is capable of unifying the physical meaning and mathematical meaning of the constant test of the
optical thin film. The method has wide application value in the aspect of accurately calibrating the optical constant of the thin film. Particularly, the invention relates to the accurate calibration of the optical constant of the thin
film material; on the basis of elliptic polarization spectrum inversion optical constant, the consequences of physical models of the thin film can be arranged by an
orthogonal method, the sequence of the application of the physical models of the thin film can be obtained by mathematical statistics, and finally the physical meaning and mathematical meaning of the final given optical constant
calculated result are unified.