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Coating method capable of improving laser induced damage threshold of high-reflectivity film

A laser damage threshold and high-reflection film technology, which is applied in sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of inconspicuous effect and low efficiency, and achieve the reduction of defect density and intrinsic absorption , Threshold enhancement, high activity effect

Active Publication Date: 2012-10-24
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Many of the above methods are either inefficient during the coating process, or the effect of post-processing is not obvious, and cannot solve key problems with high quality and efficiency.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Using quartz glass as the substrate, first put it into the cleaning solution and ultrasonically clean it for 7 minutes, then wash it with deionized water, take it out and dry it with high-purity nitrogen, and then put it on the workpiece rack in the coating equipment; use electron beam evaporation HfO 2 / SiO 2 High reflective film, the equipment is Japan Optochi OTFC-1300 coating machine, the configuration ion source is 17cm radio frequency ion source. The substrate temperature is 150 degrees, and the temperature is kept constant for 80 minutes. The background vacuum is 2×10 -3 Pa. Before the coating starts, when the substrate is cleaned with an ion source, the flow of oxygen ions is 50 sccm, the flow of argon ions is 10 sccm, the voltage is 300V, and the current is 600mA; the high and low refractive index materials used for coating are metal Hf and SiO 2 ring, the evaporation rates are 0.3nm / s and 2nm / s, respectively. The vacuum chamber is filled with high-purity ...

Embodiment 2

[0029] Using quartz glass as the substrate, first put it into the cleaning solution and ultrasonically clean it for 7 minutes, then wash it with deionized water, take it out and dry it with high-purity nitrogen, and then put it on the workpiece rack in the coating equipment; use electron beam evaporation HfO 2 / SiO 2 High reflective film, the equipment is Japan Optochi OTFC-1300 coating machine, the configuration ion source is 17cm radio frequency ion source. The substrate temperature is 150 degrees, and the temperature is kept constant for 80 minutes. The background vacuum is 2×10 -3 Pa. High and low refractive index materials use HfO respectively when coating 2 Particles and SiO 2 ring, with evaporation rates of 1 nm / s and 2 nm / s, respectively. Before the coating starts, when the substrate is cleaned with an ion source, the flow rate of oxygen ions is 50 sccm, the flow rate of argon ions is 10 sccm, the voltage is 300V, and the current is 600mA; 2 When the oxygen flow...

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PUM

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Abstract

The invention relates to a coating method capable of improving a laser induced damage threshold of a high-reflectivity film and belongs to the field of film optics. The coating method mainly aims at two key factors of absorption and defects influencing a laser induced damage threshold of a high-reflectivity laser film, and after electron beam evaporation coating of each film layer is finished, utilizes high-energy ion beams to bombard the film layer. The coating method retains unique and beneficial performances of a laser film coated by electron beam thermal evaporation, improves intrinsic absorption and defect density of a film, greatly improves a laser induced damage threshold of a high-reflectivity film, and has the characteristics of strong pertinence, high coating quality, simpleness and good feasibility.

Description

technical field [0001] The invention relates to an optical thin film, in particular to a plating method for improving the laser damage threshold of a high reflection thin film. Background technique [0002] In the field of laser systems, high damage threshold laser thin films are one of the key components in strong laser systems and one of the key factors in the design of large laser devices. Their damage threshold and damage characteristics are important bottlenecks that limit the further development of high-power laser technology and affect laser One of the important factors of system stability and service life. A large number of studies on the damage mechanism of thin films have shown that for thin films used in nanosecond laser systems, the main factors that determine the damage threshold are the size of the film absorption and the number of nodular defects. The electron beam evaporation method is generally considered to be the preferred preparation method for obtaining...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/30C23C14/02C23C14/18C23C14/08
Inventor 焦宏飞王利张艳云鲍刚华程鑫彬王占山
Owner TONGJI UNIV
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