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An Evaporation Method for Improving the Anti-laser Damage Threshold of Oxide Thin Films

An oxide film, damage threshold technology, applied in vacuum evaporation coating, optics, optical components, etc., can solve the problems of nodule formation, contamination of film, lower film threshold, etc., to reduce extinction coefficient, reduce intrinsic absorption, The effect of the simple structure of the baffle

Active Publication Date: 2015-12-02
润坤(上海)光学科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The film materials deposited on these components are very loose, and will absorb a large amount of moisture and dust particles in the atmospheric state, and will be released again under high vacuum; these components are very close to the substrate in the deposition area, so that these moisture or particles can easily Contaminated film, forming defects such as nodules, lowering the threshold of the film

Method used

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  • An Evaporation Method for Improving the Anti-laser Damage Threshold of Oxide Thin Films
  • An Evaporation Method for Improving the Anti-laser Damage Threshold of Oxide Thin Films

Examples

Experimental program
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Effect test

Embodiment 1

[0032] Using quartz glass as the substrate, first put it into the cleaning solution and ultrasonically clean it for 7 minutes, then wash it with deionized water, take it out and blow it dry with high-purity nitrogen, and then put it on the workpiece rack in the coating equipment; control the inside of the coating machine The background vacuum of the vacuum chamber is 1×10 -4 Pa; heat the substrate to 220 degrees and keep the temperature constant for 100 minutes, then use electron beam thermal evaporation to plate metal Hf, the evaporation rate is 0.015nm / s; introduce oxygen free radical gas at an angle of 80 degrees, and the flow rate is 4.5×10 15 Atomic number / (cm 2 s) After the coating is finished, take out the coated sample after the vacuum chamber is cooled to room temperature.

[0033] Compared with the film prepared by traditional evaporation, it was found that the extinction coefficient of the film evaporated by this method at 355nm was 2.6×10 -4 Reduced to 1×10 -5 A...

Embodiment 2

[0035] Using quartz glass as the substrate, first put it into the cleaning solution and ultrasonically clean it for 7 minutes, then wash it with deionized water, take it out and blow it dry with high-purity nitrogen, and then put it on the workpiece rack in the coating equipment; control the inside of the coating machine The background vacuum of the vacuum chamber is 1×10 -4 Pa; after heating the substrate to 200 degrees and keeping the temperature constant for 90 minutes, the hafnium dioxide was plated by electron beam thermal evaporation, the evaporation rate was 0.02nm / s; the oxygen free radical gas was introduced at an angle of 80 degrees, and the flow rate was 4.0×10 15 Atomic number / (cm 2 s); after the coating is completed, take out the coated sample after the vacuum chamber is cooled to room temperature.

[0036] Compared with the film prepared by traditional evaporation, it is found that the extinction coefficient of the film deposited by this method at 355nm is 2×10 ...

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Abstract

The invention belongs to the field of thin film optics, and in particular relates to an evaporation method for improving a laser induced damage threshold of an oxide film, mainly aiming at the key factors, which comprise the absorption and defects in films, and causes the damage in laser-induced film. The ineffective evaporation materials are blocked and adsorbed by adding an isolation baffle between the evaporation source and the substrate, thereby reducing the pollution to the vicinity of the substrate and decreasing the probability for defects formation in the film; oxygen radicals, which have stronger oxidization capability than conventional molecular oxygen and ions oxygen, are introduced into the vacuum chamber to allow oxygen radicals to be incident on the surface of the substrate so that the deposition material is possibly sufficiently oxidized under high vacuum conditions, and the absorption of the film is reduced, thereby obtaining the oxide film having higher threshold. The method not only retains the unique beneficial properties of the electron beam thermal evaporation method for plating a laser film and but also improves the intrinsic absorption and the defect density of the film; and the preparation method has the characteristics of strong pertinence, high quality and simplicity and feasibility.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and in particular relates to an evaporation method for improving the laser damage resistance threshold of an oxide film. Background technique [0002] A variety of optical glass parts are the basis of the high-power laser system, and their damage threshold and damage characteristics are important bottlenecks that limit the further development of high-power laser technology, and are one of the important factors that affect the stability and service life of the laser system. The laser damage resistance of optical glass parts is closely related to the film on it. The research on the damage mechanism of nanosecond pulses in thin films shows that the absorption and defects of thin films are the main factors causing damage. [0003] The absorption of the thin film is mainly caused by insufficient oxidation of the film material during substrate deposition. The process factors that affect ab...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/30C23C14/08G02B1/10G02B1/14
Inventor 王占山程鑫彬焦宏飞鲍刚华宋智
Owner 润坤(上海)光学科技有限公司
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