266 results about "Inorganic fluorine compounds" patented technology

Techniques for forming shallow junctions are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for forming shallow junctions. The method may comprise generating an ion beam comprising molecular ions based on one or more materials selected from a group consisting of: digermane (Ge₂H₆), germanium nitride (Ge₃N₄), germanium-fluorine compounds (GF_n, wherein n=1, 2, or 3), and other germanium-containing compounds. The method may also comprise causing the ion beam to impact a semiconductor wafer.

A magnet comprising grains of a ferromagnetic material whose main component is iron and a fluorine compound layer or an oxy-fluorine compound layer of fluoride compound particles of alkali metals, alkaline earth metals and rare earth elements, present on the surface of the ferromagnetic material grains, wherein an amount of iron atoms in the fluorine compound particles is 1 to 50 atomic %.

A surface treatment agent, which contains: (A) a hydrolyzable metal alkoxide or a hydrolyzate thereof, (B) a fluorocompound containing a perfluoroalkyl group and a functional group reactive with the hydrolyzable metal alkoxide (A), and (C) an adhesion improvement agent, can provide a film having transparency and durability while maintaining excellent soil releasability and low refractive index.

The invention discloses an aqueous glass frosting powder chemical composition containing a mixed material of an inorganic fluorine compound capable of generating fluorine ions in water, a solid acid compound capable of dissolving in water, an assistant and a filling agent, wherein the mixed material is doped with at least one surfactant; the adding amount of the inorganic fluorine compound is 20 to 90 percent of the total weight percentage of the frosting powder; the adding amount of the solid acid compound is 10 to 60 percent of the total weight percentage of the frosting powder; the adding amount of the filling agent is 1 to 30 percent of the total weight percentage of the frosting powder; the adding amount of the surfactant is 0.1 to 10 percent of the total weight percentage of the frosting powder; and during use, the water is 20 to 100 percent of the total weight percentage of the frosting powder to prepare frosting powder liquid. The technical scheme can avoid acid pollution of the production environment and natural environment because of the inevitable strong acid medium such as sulphuric acid and hydrochloric acid when frosting a glass product by using the prior glass frosting liquid.

The invention discloses a process method for producing fluorine compounds and silicon compounds by cleanly utilizing fluosilicic acid. The process method comprises the following steps of: preparing fluosilicic acid as a phosphorus chemical by-product into an anhydrous aluminum fluoride product, a sodium fluoride product and a cryolite product, and combining with other industrial waste silicon slags and aluminum slags to prepare a 4A zeolite product. The process method comprehensively utilizes the fluosilicic acid and has high resource recovery rate, wherein the recovery rate of the fluorine element reaches higher than 90 percent. Waste silicon dioxide slags generated in the process can be recycled to produce white carbon black and the 4A zeolite, and a mother liquor, a cleaning solution and waste gas which are generated in the production process are all recycled, thereby the environmental pollution is reduced, and the purposes of zero emission and no pollution are truly achieved, thus the method completely meets the requirement for clean production. The invention has the advantages of advanced production process, good product quality and high value, wherein the fluorine content of the aluminum fluoride is high and between 63-65 percent; the quality index of the obtained white carbon black meets the requirement on the standard of the chemical industry; and the quality of the 4A zeolite product meets the requirements on the national standard and the standard of European and American developed countries.

Disclosed is a semiconductor manufacturing process, in which a fluorine radical-containing plasma is used to etch a hard mask and a layer therebeneath; and a treatment is carried out using a gas reactive to fluorine radicals for reacting with residual fluorine radicals to form a fluorine-containing compound and remove it. Thus, precipitates formed by the reaction of fluorine radicals and titanium components existing in the hard mask to cause a process defect can be avoided.

A fluoropolyether adhesive composition comprising (A) a linear polyfluoro compound having at least two alkenyl groups and a perfluoropolyether structure in its main chain, (B) a fluorinated organohydrogensiloxane containing at least two SiH groups, but not alkoxy and epoxy groups, (C) a platinum group metal-based catalyst, (D) an organosilicon compound having at least one silicon-bonded alkoxy group, and (E) a hydrolytic catalyst can be cured to metal and plastic substrates through addition reaction.

Gas-diffusion electrodes containing modified carbon products are described wherein the modified carbon product is a carbon product having attached at least one organic group. The modified carbon product can be used for at least one component of the electrodes such as the active layer and/or the blocking layer. Methods to extend the service life of electrodes as well as methods to reduce the amount of fluorine containing compounds are also described.

This method for processing an electrolyte solution that contains a fluorine compound and an organic solvent comprises: a cleaning step wherein a used battery containing the electrolyte solution is cleaned with a cleaning solvent, thereby extracting the electrolyte solution; a post-cleaning liquid recovery step wherein a post-cleaning liquid obtained in the cleaning step is recovered; a gasification step wherein a volatile component contained in the recovered post-cleaning liquid is gasified at a reduced pressure; a calcium fluoride recovery step wherein a fluorine component contained in a gas that is obtained in the gasification step is recovered in the form of calcium fluoride by causing the fluorine component to react with calcium; and an organic solvent component recovery step wherein the organic solvent component contained in the gas that is obtained in the gasification step is recovered.