The invention discloses a manufacturing method of a
crystalline silicon solar cell. The manufacturing method includes the following steps that: surface treatment is performed on a cleaned
silicon wafer, so that a concavo-convex texturized surface can be obtained; a PN junction is formed on the
silicon wafer through adopting a
diffusion method; the
silicon wafer periphery of the formed PN junction is etched, so that a redundant
diffusion layer can be removed, and a film body is deposited on the front surface and the back surface of the silicon wafer respectively, and local film body portions are removed through adopting an
etching method, so that dot-shaped or stripe-shaped structures which uniformly
expose the silicon wafer can be formed on the film bodies; a front surface
conductive paste and a back surface
conductive paste are printed on the front surface and the back surface of the silicon wafer respectively; and
sintering is performed, so that the
solar cell can be obtained. According to the manufacturing method of the invention, the
etching method is adopted for the film bodies on the
solar cell, so that the local film body portions are removed through
etching, and the non-burn-through conductive pastes are printed on the locally-etched film bodies, and therefore, direct
electric contact between local
metal and silicon can be realized, and the film bodies will not be damaged in high-temperature
sintering of the conductive pastes as much as possible, and the open-circuit
voltage of the solar
cell can be increased, and the
contact resistance of the solar
cell can be reduced, and therefore, the conversion efficiency of the solar
cell can be improved.