506 results about "Diffusion methods" patented technology

The invention discloses a manufacturing method of a crystalline silicon solar cell. The manufacturing method includes the following steps that: surface treatment is performed on a cleaned silicon wafer, so that a concavo-convex texturized surface can be obtained; a PN junction is formed on the silicon wafer through adopting a diffusion method; the silicon wafer periphery of the formed PN junction is etched, so that a redundant diffusion layer can be removed, and a film body is deposited on the front surface and the back surface of the silicon wafer respectively, and local film body portions are removed through adopting an etching method, so that dot-shaped or stripe-shaped structures which uniformly expose the silicon wafer can be formed on the film bodies; a front surface conductive paste and a back surface conductive paste are printed on the front surface and the back surface of the silicon wafer respectively; and sintering is performed, so that the solar cell can be obtained. According to the manufacturing method of the invention, the etching method is adopted for the film bodies on the solar cell, so that the local film body portions are removed through etching, and the non-burn-through conductive pastes are printed on the locally-etched film bodies, and therefore, direct electric contact between local metal and silicon can be realized, and the film bodies will not be damaged in high-temperature sintering of the conductive pastes as much as possible, and the open-circuit voltage of the solar cell can be increased, and the contact resistance of the solar cell can be reduced, and therefore, the conversion efficiency of the solar cell can be improved.