53results about How to "Simple removal process" patented technology

The invention provides a wafer grinding method. The wafer grinding method includes the steps that a wafer is provided and comprises a functional face and a back face opposite to the functional face; after a protective layer is formed on the functional face of the wafer, the protective layer is covered with a layer of protective adhesive tape; then, the wafer is placed on a grinding device, the back face of the wafer is ground so that the portion, with the partial thickness, of the wafer can be removed; and the protective adhesive tape is removed, and then the protective layer is removed. Before grinding, the protective layer is formed on the functional face of the wafer, and then the protective layer is covered with one layer of protective adhesive tape. In the grinding process of the protective adhesive tape, the structure on the functional face of the wafer can be effectively protected against damage in the grinding process, the protective adhesive tape is pasted on the protective layer, the situation that the protective adhesive tape makes contact with the functional face of the wafer can be effectively avoided, and therefore in the process of tearing off the adhesive tape after the grinding technology, the protective adhesive tape can remove defects of parts on the surface of the functional face of the part of the wafer, and structural damage on the functional face of the wafer is reduced.

The invention provides a removing method for a photo resist image in the forming process of a double inlaying structure; the forming process of the double inlaying structure comprises the following steps: a semiconductor substrate with a preformed semiconductor device is provided; a metal interconnecting line layer with a surface which is provided with a dielectric layer is formed on the substrate; connecting holes are etched in the dielectric layer; a sacrificial layer and a hard mask layer are deposited; a bottom anti-reflecting layer and a photo-resist layer are coated and patterned to formthe photo resist image; oxy plasma incinerates and removes the bottom anti-reflecting layer and the photo-resist layer. The removing method of the invention can simplify the removing process and prevent the dielectric layer with a low dielectric constant from being damaged.

The invention relates to a method for removing heavy metals in stainless steel pickling wastewater. In this method, an anion exchange membrane and a cation exchange membrane are combined to form a double-membrane three-chamber electrodialysis cell, the middle chamber is between the anion and yang membranes, the anode chamber is on the one side of the anion membrane, and the cathode chamber is on the one side of the cation membrane. Add stainless steel pickling wastewater to the intermediate chamber, add dilute nitric acid to the anode chamber, and add complexing agent to the cathode chamber. With stainless steel as the cathode and graphite as the anode, direct current is applied. Under the action of an electric field, the selective permeability of the ion exchange membrane to anions and cations is used, so that the heavy metal ions in the wastewater are enriched in the cathode chamber in the form of metal complex anions, and the acid radical anions are enriched in the anode chamber. The method has the characteristics of simple operation and easy control of process parameters. It can not only remove heavy metal ions in stainless steel pickling wastewater, but also enrich and recover heavy metal ions.

The invention discloses a high-temperature cycle removal method for carbon dioxide based on a rotary fixed bed. The fixed bed rotor filled with calcium-based absorbent rotates to the high-temperature flue gas side channel, and CO2 in the flue gas is removed by the calcium-based absorbent filler and forms CaCO3, after removing CO2, the flue gas is discharged, and CaO is converted into CaCO3 through carbonation reaction; the fixed bed rotor continues to carry the packing that has been converted into CaCO3 to rotate to the fuel gas side channel, and the fuel gas and pure oxygen are passed into this area for combustion and The released heat provides heat for the decomposition of CaCO3, releasing high-concentration CO2, and then CO2 is discharged from the reaction zone and is stored or used for other purposes, and CaCO3 is decomposed and regenerated into CaO; the fixed-bed rotor after the regeneration of the internal filler re-rotates to capture the flue gas The CO2 in the flue gas is separated, and the rotor and the filled absorbent packing are used to periodically pass through the flue gas side and the fuel gas side to complete the CO2 cycle removal and enrichment in the flue gas.

The invention provides a method for preparing leuprorelin. The method comprises the following steps: (1) taking Fmoc-Pro-CTC-OH and CTC (Carbon Tetrachloride) resin as starting raw materials and treating to obtain Fmoc-Pro-CTC-OH resin; (2) sequentially connecting the Fmoc-Pro-CTC-OH resin with an amino acid with a protecting group by adopting a gradual coupling manner of a Fmoc / tBu solid-phase method to synthesize side chain wholly-protected leuprorelin precursor peptide-resin; (3) taking a 20 percent trifluoroethanol / DCM (Dichloromethane) solution as a cutting reagent and cutting the side chain wholly-protected leuprorelin precursor peptide-resin, so as to obtain a side chain wholly-protected leuprorelin precursor peptide; (4) carrying out ethyl amination on the side chain wholly-protected leuprorelin precursor peptide to obtain side chain wholly-protected leuprorelin; (5) carrying out side chain cutting on the side chain wholly-protected leuprorelin to obtain a leuprorelin crude peptide; (6) carrying out CM purification and HPLC (High Performance Liquid Chromatography) purification, concentration, dissolving and freeze-drying on the leuprorelin crude peptide to obtain a high-purity leuprorelin crude drug. The method provided by the invention has the advantages of simplicity in operation, short period, low cost, high product yield and small environment pollution and is very suitable for industrial production.