A photoresist stripping of the membrane, which is composed of the percentage of weight: Composite organic base 10% - 30%; polyether active agent 1% to 5%; broken film of 1% to 5% copper Corrosion Inhibitor 0.1% -1%; deionized water 60 percent to 70 percent above base is a complex organic chemical-XR-NH2 organic amines in at least two, X is H, OH or NH2, R-n - base; polyether active agent for ethylene oxide and ethylene oxide to block copolymer or inorganic in at least one copolymer; broken film for the long carbon chain aliphatic amines, copper corrosion inhibitor for benzo triazole and its derivatives in at least one. The present invention retreat film properties, and its high rate of retreat membrane, the membrane of the retreat, the use of low-cost, Wuxi migration, copper corrosion, do not contaminate pure tin, gold, silver surface membrane retire at the metal layers with superior protection and particularly suitable for flexible lines and fine lines, and other high-end PCB manufacturing, production safety and environmental protection are used.