33results about How to "Fully polymerized" patented technology

The invention discloses a red mud and coal ash geopolymer material formula, and belongs to the field of comprehensive utilization of waste and preparation of inorganic nonmetal materials. Red mud and coal ash are adopted as basic raw materials, a sodium hydroxide solution is adopted as an exciting agent, and a red mud and coal ash geopolymer material is prepared. The mass ratio of the red mud to the coal ash to the sodium hydroxide solution is 1:1:(0.8-1). The polymer materials of different strengths can be obtained by adding sodium hydroxide solutions of different concentrations. Maintenance is performed at the temperature of 50-80 DEG C for 24-36 h, the polymerization reaction is more sufficient, the geopolymer material of the high strength can be obtained, the highest strength can reach 32 MPa or more in 28 d, and the red mud and coal ash geopolymer material formula can be widely used for a constructional engineering material. According to the geopolymer material, the red mud and the coal ash are utilized, the preparation method is simple, no large number of resources need to be consumed, the consumption of the red mud is large, the purpose of recycling the red mud can be achieved, energy and land are saved, and environment pollution caused by the red mud is eliminated.

The invention discloses a preparation method of a high-concentration polyaluminium-silicon sulfate flocculant. The method includes two steps of preparation of stable high-concentration sodium metaaluminate and polymerization reaction. The preparation of stable high-concentration sodium metaaluminate is to add sodium gluconate into sodium hydroxide solution at 100-120°C, and add Aluminum hydroxide, stabilizer and initiator ammonium persulfate; the polymerization reaction is to dissolve sodium carbonate in a small amount of water, add sodium silicate to dissolve, and then add sodium metaaluminate to obtain an alkaline intermediate product; the aluminum sulfate solution is lower than In a water bath at 30°C, disperse at a high speed, slowly add the basic intermediate product, mix evenly, stir and mature at 55-60°C to obtain a high-concentration polyaluminum-silicon sulfate flocculant. The flocculant product prepared in the present invention can be stable for half a year at normal temperature without gelling, the alumina content can reach 8.21-10.84%, the basicity is 65.90-72.93%, the degree of polymerization is high, and the proportion of active ingredients is high.

The subject of the present invention is to provide an imprint of a film that is in the form of a transparent and uniform varnish that does not peel off in a cross-cut test for evaluating the adhesion of a coating film, and that has a release force of 0.5 g / cm or less. Material. Means for solving the problem of the present invention relates to an imprint material comprising: (A) component: a compound having at least one oxyalkylene unit having 2, 3, or 4 carbon atoms and having at least 2 polymerizable groups , (B) component: photopolymerization initiator, (C) component: the solvent which swells or dissolves the surface part of a film base material, and (D) component: organosilicon compound.

The invention discloses an organic coagulant and a preparation method thereof, and belongs to the technical field of wastewater treatment. The preparation method comprises the following steps: takingorganic amine and epoxy chloropropane as the primary raw materials to synthesize an intermediate namely epoxy chloropropane-organic amine; and then modifying the intermediate by a modifier to promotethe intermediate to carry out copolymerization reactions with quaternary ammonium salt monomers under the action of an initiator to obtain the organic coagulant. The prepared organic coagulant has a good coagulating effect, and the secondary pollution and post treatment load are both reduced.

The invention provides a preparation method of a coating type dye polarization component, wherein the coating type dye polarization component comprises a substrate; a polarization alignment film is arranged on the substrate; the preparation method comprises the following steps: heating a reaction vessel to a reaction temperature according to a hot bath method, maintaining the reaction temperature in the reaction vessel; placing a reaction monomer in the reaction vessel, stirring and fully dissolving, then standing for a first time interval; placing a dye in the reaction vessel, stirring and fully dissolving, then standing for the first time interval to obtain a polarization film solution; coating the polarization film solution on the polarization alignment film of the substrate by using a spin-coating method to obtain a polarization film; curing the polarization film through ultraviolet irradiation to obtain the coating type dye polarization component. The invention further provides a liquid crystal panel. The solution of the invention can improve a polarization degree of a polarizer and improve a contrast ratio of the liquid crystal panel.

The invention provides a low-solid high-viscosity polyvinyl acetate emulsion which comprises raw materials, namely vinyl acetate and acrylic acid as monomer mixtures, on the basis of formula optimization, a preparation that the monomer mixtures are added at different steps is implemented, and in addition, the monomer mixtures are stirred and dropped at the same time when the monomer mixtures are added at a second step, so that due to reasonable cooperation of the formula components and the preparation method, a sufficient polymerization reaction can be achieved, the viscosity of the polyvinylacetate emulsion can be greatly increased without starch for thickening, and meanwhile high adhesion strength can be achieved.

The invention belongs to the technical field of semiconductor chip manufacturing, and specifically relates to a method for curing photosensitive resin BCB, comprising the following steps: 1) coating a photosensitive BCB glue on the surface of an epitaxial wafer, and forming a photosensitive BCB glue on the surface of the epitaxial wafer by photolithography 2) Treat the photosensitive BCB adhesive on the surface of the epitaxial wafer by plasma reactive etching; 3) Put the etched epitaxial wafer into the annealing furnace, and pass H 2 and Ar mixed gas protection, using a multi-stage temperature rise and heat preservation method from 50°C to 275°C, and kept at 275°C for 2h; 4) Then increase the amount of H 2 and Ar mixed gas flow rate, quickly lower the temperature of the annealing furnace to room temperature, stop feeding H 2 and Ar mixed gas to complete the curing. The curing method of the photosensitive resin BCB provided by the invention adopts the mode of multi-stage temperature rise and heat preservation, so that the polymerization reaction of BCB is more sufficient; and when annealing, H 2 Mixed gas with Ar replaces traditional N 2 As a protective gas, it reduces the possibility of oxidative aging and improves the quality of BCB.