31results about How to "Fully deposited" patented technology

The invention discloses a method for preparing a high-temperature wear-resistant coating on a continuous casting crystallizer copper alloy plate surface, which comprises the following step: spraying metal ceramic powder on a pretreated copper alloy plate surface by a plasma spraying process to form a metal ceramic coating of which the thickness is 0.5mm, wherein the metal ceramic powder is Cr3C2-NiCr powder of which the particle size is 325-500 meshes; the Cr3C2-NiCr powder comprises 70-80 wt% of Cr3C2 and the balance of NiCr alloy powder; and the Ni / Cr mass ratio in the NiCr alloy powder is 80:20. The coating prepared by the method disclosed by the invention has the advantages of high bonding strength, favorable thermal shock resistance and long thermal-fatigue life, can satisfy the working requirements for crystallizer copper alloy plates, and obviously prolongs the service life of the crystallizer copper alloy plate.

The invention relates to a planet-like coating jig for evaporation coating inside a large-size coating machine cavity, and in particular relates to a planet-like coating jig capable of rotating and revoluting and achieving a uniform product coating effect in the large-size coating machine cavity, and a use method of the planet-like coating jig. The planet-like coating jig capable of rotating and revoluting and is mounted at the upper part inside the coating machine cavity and mainly comprises a jig body, a revolution system and a rotation system, wherein the jig body comprises three jig discs; the jig discs are umbrella-shaped, connecting columns are arranged at the sharp ends of the middle of the umbrella-shaped jig discs. The principle of planet movement is adopted, according to the regulation of rotation and revolution of a planet, the jig discs are enabled to rotate independently and revolute as a whole inside the coating machine cavity, the purpose that a protecting membrane layer is uniformly deposited on the surface of a product when a film is coated is achieved, and moreover not only is a main body part of a coated product uniformly coated, but also an optimal coating effect can be achieved for edges and corners of the coated product, and the uniformity of overall coating is achieved.

The invention relates to a combined type helium gas filtering sampling device for a gas cooled reactor and an installation method of the device. The combined type helium gas filtering sampling device is characterized by comprising a sleeve, at least two filter assemblies which are spaced along the axial direction and are fixed on the inner wall of the sleeve, and at least one molecular sieve assembly fixed between the two adjacent filter assemblies. The filtering sampling device provided by the invention adopts a sandwich combined type structure with the filter assemblies-the molecular sieve-the filter assembly, can fully filter fission product particles and graphite dust with different types and sizes carried by helium from a vapor generator, and can fulfill the purposes of multistage filtering, full deposition and adsorption of the fission product particles and graphite dust.

The invention provides a method for preparing a graphene or ultrathin carbon film by a PVD (physical vapor deposition) technique, which comprises the following steps: putting a substrate on a substrate rack in a deposition chamber, and carrying out glow cleaning on the substrate surface; introducing an acetylene-argon gas mixture into the gas mixture at 70-100 DEG C in an argon environment under the conditions of vacuum degree 0.5-1 Pa and the substrate voltage bias -200V; opening an anode layer ion source to ionize the gas mixture, wherein the voltage of the anode layer ion source is 300-500V in the ionization process, the acetylene is ionized to generate carbonous cations, and the cations bombards the substrate under the action of an electric field and deposits on the substrate; and after the deposition is finished, annealing under vacuum conditions for 1-2 hours, thereby preparing the graphene or ultrathin carbon film on the substrate surface after the annealing is finished. The method provided by the invention can satisfy the large-scale preparation of uniform-thickness graphene or ultrathin carbon films, and has important industrial application prospects.

The invention discloses a penetrating addition agent which comprises the following compositions in weight portion: 0.00018 to 0.0006 portion of laurocapam, 0.5 to 25 portions of myristyl lycine, 0.1 to 12 portions of dipropylene glycol methyl ether, 0.01 to 5 portions of N- methyl pyrrolidone, 0.05 to 2.5 portions of tri n butyl phosphate, 5 to 60 portions of diethylene glycol or butyl ether, 1 to 20 portions of phenylcarbinol and 1 to 3 portions of lignin sulfonic acid ammonium salt. The invention also discloses an application of the penetrating addition agent to the dyeing process and to the retting hemp process. The penetrating addition agent in the dyeing process ensures that the color yield and homochromatic properties of the double-component fiber are good, the leveling property is good and the 'white core' phenomenon is avoided.

The invention relates to a device for preparing a fully deposited silicon carbide coating by chemical vapor deposition, and belongs to the technical field of silicon carbide coating preparation. According to the main technical scheme, the device for preparing the fully deposited silicon carbide coating by the chemical vapor deposition includes a cavity, a support ring, gas flow interfering bodiesand supporting members. An air inlet device is arranged at the top of the cavity, and an air outlet device is arranged at the bottom of the cavity. The outer side wall of the support ring is connectedto the inner wall of the cavity, and the cavity is divided into an upper cavity and a lower cavity which communicate with each other in the middle. One ends of the gas flow interfering bodies are disposed on the support ring and arranged in the direction from the support ring to the top of the cavity, and the number of gas flow interfering bodies is greater than or equal to three. The supportingmembers are disposed at the bottom of the cavity for supporting a sample of a coating to be deposited and the sample is located in the lower cavity. The device for preparing the fully deposited silicon carbide coating by the chemical vapor deposition is capable of obtaining the fully deposited silicon carbide coating on the surface of the sample.

The invention discloses a flowing type high-temperature high-pressure solubility online measuring device and a measuring method thereof. The system comprises a feeding system, a balance kettle, a sampling system and a pressure control system. A Hastelloy C276 material is adopted as the balance kettle body so that the balance kettle body can resist a high temperature of 823K and a high pressure of35MPa, and a stable phase balance state can be obtained in a relatively large temperature and pressure range; the reasonable feeding system ensures that reagents entering the balance kettle are consistent in composition and are uniformly mixed; a precise temperature and pressure control system and a mechanical stirring device ensure that a fluid phase in the balance kettle is fully balanced; the reasonable sampling system ensures that the phase balance of the flow system is not influenced in the sampling process, the high-voltage conductivity detection pool can detect the conductivity of the sample on line, and the solubility data of the fluid is further obtained.

A preparation method of a cobalt-based anti-cavitation coating of plastic deposition based on work hardening comprises the steps that an oxidization film on the surface of a metal matrix is removed, oil dirt and residual impurities on the surface are removed through cleaning, and after the metal matrix is dried in air, the matrix is fixed to a workbench; (2) powder is placed in a vacuum drying boxto be dried, and after being dried, the powder is cooled to room temperature to be placed in a powder feeder; (3) the carrier gas kind, the carrier gas pressure, the preheating temperature and the powder feeding rotating speed are set in a cold spraying panel; (4) laser power is set in a laser control panel; (5) a mechanical arm is started, the spraying coating lap-joint rate and the scanning speed are input, the mechanical arm is adjusted, so that a cold spraying nozzle is perpendicular to the surface of the matrix, and the angle of a laser head is adjusted, so that laser spots coincide withspraying powder spots; (6) equipment is started, and supersonic-speed laser deposition experimenting is carried out in the matrix; and (7) after processing is completed, the coating on the surface ofthe metal matrix is subjected to aftertreatment, and the surface of the coating is leveled.

The invention relates to a device for preparing a fully deposited silicon carbide coating by chemical vapor deposition, and belongs to the technical field of silicon carbide coating preparation. According to the main technical scheme, the device for preparing the fully deposited silicon carbide coating by the chemical vapor deposition includes a cavity, a support ring, gas flow interfering bodiesand supporting members. An air inlet device is arranged at the top of the cavity, and an air outlet device is arranged at the bottom of the cavity. The outer side wall of the support ring is connectedto the inner wall of the cavity, and the cavity is divided into an upper cavity and a lower cavity which communicate with each other in the middle. One ends of the gas flow interfering bodies are disposed on the support ring and arranged in the direction from the support ring to the top of the cavity, and the number of gas flow interfering bodies is greater than or equal to three. The supportingmembers are disposed at the bottom of the cavity for supporting a sample of a coating to be deposited and the sample is located in the lower cavity. The device for preparing the fully deposited silicon carbide coating by the chemical vapor deposition is capable of obtaining the fully deposited silicon carbide coating on the surface of the sample.

The invention discloses a carbon-based micro-nano photo-thermal coating layer and a preparation method thereof, and belongs to the field of solar photo-thermal conversion, wherein the carbon-based micro-nano photo-thermal coating layer comprises a film-coated substrate, and the surface of the substrate is sequentially spin-coated with RTV-1 and deposited with candle ash; the carbon-based micro-nano photo-thermal coating layer is characterized in that metal aluminum is used as an infrared reflecting layer of the film-coated substrate, and has the function of reducing the infrared emissivity of the coating layer; the RTV-1 layer is a deposition layer and has the function of enhancing the binding force of a carbon nanoparticle coating layer; and the carbon-based micro-nano layer is a candle ash deposition layer and has the functions of absorbing solar radiation and improving the absorption performance of the surface. The prepared carbon-based micro-nano photo-thermal coating layer has high absorptivity and low emissivity, the photo-thermal conversion efficiency of a flat plate type heat collector can be greatly improved, preparation is simple, and the actual cost is relatively low when the method is applied.

The invention discloses a method and device for treating solid combustion exhaust gas. The method for treating the solid combustion exhaust gas includes the steps of removing at least major amount ofSOX and possibly other pollutants, pre-removing of NOX and removing of NOX and / or other reaction products. The device for treating the solid combustion exhaust gas includes a moving bed reactor for removing SOX, NOX and possibly other pollutants in the solid combustion exhaust gas, a NH3 supply unit and a regeneration unit for an adsorbent; and after air cooled by the adsorbent in the regenerationunit flows out of a cooling section of the regeneration unit, the air can be introduced into a dilution fan in the NH3 supply unit. According to the method and device for treating the solid combustion exhaust gas, simple and convenient production of NH3 can be realized, recycle of gas during the regeneration of the adsorbent is realized, and the gas during regeneration of the adsorbent can be used in the NH3 supply unit.

The invention discloses a double-tube electrolytic dephosphorization device, which comprises a water inlet, a water outlet, a filter pipe and at least two metal sleeves which are vertically arranged and are sequentially connected in series. Each metal sleeve comprises a water inlet tee joint, a water outlet tee joint, a metal outer pipe, a metal inner pipe, a concentric reducer and a precipitationpipe. Ports of the water inlet tee joint are respectively communicated with the water inlet, the bottom end of the metal outer pipe and the top end of the precipitation pipe; ports of the water outlet tee joint are respectively connected with the top end of the metal outer pipe, the bottom end of the concentric reducer and the water inlet tee joint of the next metal sleeve; the top end of the metal inner pipe is sleeved in the concentric reducer, and the bottom end of the metal inner pipe is arranged at the bottom end of the precipitation pipe; a filter element is arranged in the filter pipe;the water outlet is arranged at the top end of the filter pipe; the metal outer pipe is connected with a power anode; and the metal inner pipe is connected with a power cathode. The device has the advantages of simple and feasible structure, low manufacturing cost, convenience in use and maintenance and good electrolysis effect.

The invention discloses a total dose irradiation resistant SOI device and a preparation method thereof, and belongs to the field of radiation protection materials. The problems that an existing high-low Z alternate laminated coating process is complex, multiple times of coating and drying are needed, consumed time is long, and the protection capacity is limited are solved. And the technical problem that flexibility cannot be realized is solved. The preparation method comprises the following steps: etching an MAX-phase ceramic matrix to obtain a Ti3C2Tx material with a layered structure, depositing high-Z metal into the Mxene layered structure through an atomic layer deposition technology to obtain a composite material, mixing the composite material with a resin matrix, and coating the mixture on the surface of an SOI device to obtain a radiation protection coating. The material disclosed by the invention can be used in the fields of radiation-proof clothes in life, medical treatment and protection required in nuclear reaction.

The invention relates to a polycrystalline silicon reduction furnace with 48 pairs of rods, especially to a reduction furnace for manufacturing polysilicon by electrochemical reaction. The polycrystalline silicon reduction furnace provided by the invention comprises a furnace body (1) and a chassis (2) and is characterized in that the furnace body (1) is equipped with a cooling water jacket; the chassis (2) is provided with a water-cooled structure; and 48 pairs of electrodes, namely 96 electrodes, are uniformly arranged on four circles of the chassis (2), wherein the outermost circle of the chassis (2) is provided with 18 pairs of electrodes (4); the second circle is equipped with 14 pairs of electrodes (4); the third circle is provided with 10 pairs of electrodes (4); the innermost circle is provided with 6 pairs of electrodes (4); and anode and cathode of the electrodes (4) are arranged one by one at intervals on the chassis (2). The polycrystalline silicon reduction furnace provided by the invention has a reasonable internal structure layout. The output of a single polycrystalline silicon reduction furnace is raised in comparison with that of a present reduction furnace. The invention can be used to greatly reduce the relative production power consumption of polysilicon per kilogram and relatively decrease the comprehensive energy consumption and production cost of polysilicon.

The invention discloses a water treatment deposition filter which comprises filter pipes and a slag depositing tank and is characterized in that each filter pipe is a arc-shaped pipe of which the two ends are high and the middle is low; the arc-shaped pipes of which the two ends are high and the middle is low are connected and arranged from bottom to top, and two adjacent arc-shaped pipes of which the two ends are high and the middle is low are respectively arranged on a layered structure formed between an upper layer and a lower layer; a water inlet is formed at one end of a arc-shaped pipe at the undermost layer, and the other end of the arc-shaped pipe at the undermost layer is connected with a arc-shaped pipe at the last second layer; the arc-shaped pipe at the last second layer is connected with a arc-shaped pipe at the last third layer; the outlet of a arc-shaped pipe at the uppermost layer is directly used as a water outlet, or the outlet of the arc-shaped pipe at the uppermostlayer is connected with a water outlet pipe of which the water outlet port is used as the water outlet; deposition supporting pipes which are arranged at the middle concave parts of each layer of arc-shaped pipes of which the two ends are high and the middle is low are connected and communicated into the slag depositing tank positioned at the lower part of the arc-shaped pipe at the undermost layer; and a deposited slag discharging valve is arranged at the lower part of the slag depositing tank. The water treatment deposition filter has simple structure and better filtering effect by testing,and achieves the drinking water quality standard.

The invention relates to a semiconductor structure and a preparation method thereof. According to the preparation method of the semiconductor structure, the passivation area of metal in a groove is accurately controlled through ion implantation, then the forming rate of the metal in the groove is reduced, and the forming rate of the metal in the passivation layer is controlled to be slower than that of the metal in the seed layer, so sufficient deposition of the metal in the groove can be promoted, and when the groove with a high depth-to-width ratio is filled, the defects of gaps, holes and the like can be avoided. Meanwhile, a reaction area can be directly defined through ion implantation, the forming area of the metal passivation layer can be accurately controlled, and the control capacity of the technological process is enhanced; and moreover, the metal passivation layer can be used as a barrier layer without adding a removal step, so that the preparation process is simplified.

The invention discloses an efficient and energy-saving reducing furnace chassis. The efficient and energy-saving reducing furnace chassis comprises a chassis, wherein a central feeding hole is formedin the chassis, n electrode ring layers and n-1 feeding ring layers are arranged on the chassis, and n is an positive integer more than or equal to 4; the electrode ring layers and the feeding ring layers are arranged at intervals by taking the central feeding hole as a round center; each feeding ring layer is provided with at least four feeding holes; the nth electrode ring layer is provided with4n pairs of electrodes according to the counting of the electrode ring layers from inside to outside; each two adjacent electrodes of the same electrode ring layer are arranged in an equal interval manner; and a discharging ring layer is arranged outside the nth electrode ring layer and is provided with at least two discharging holes, and the two discharging holes are formed in the discharging ring layer in an equal interval manner. By redesigning the layout of the electrodes and feeding holes on and in the reducing furnace chassis, the temperature field and gas field for reaction in a reducing furnace are improved, and meanwhile, the raw material conversion rate is increased, and the production cost is lowered. The invention further provides a polycrystalline silicon reducing furnace including the efficient and energy-saving reducing furnace chassis.

The invention relates to a dehydrating device and a dehydrating method. The dehydrating device comprises a tank body (5), wherein one side of the bottom of the tank body (5) is provided with a bottom settling tank (1); the side wall of the bottom settling tank is provided with a water outlet (2); and a floater baffle plate (4) is arranged in the tank body (5) and at the front end opposite to the bottom settling tank (1). The bottom settling tank is arranged at the bottom of the tank body, so slurry or ore pulp can be more fully settled, and the water content of a solid material can be effectively reduced. The floater baffle plate is arranged, so the whole device can more effectively prevent floating wastes from being settled, and water brought by the floating wastes is greatly reduced; meanwhile, the device has a simple structure, the using method is simple, and energy and manpower are saved because a water pump is not required to be used.

The invention belongs to the technical field of industrial wastewater treatment, and particularly relates to a recycling treatment process of electroplating rinse water. The method at least comprises the following steps: (1) electro-deposition: filling electroplating rinse water into a liquid storage barrel, then sucking the electroplating rinse water into an electro-deposition tank of an electro-deposition device, and adsorbing metal cations in the electroplating rinse water to a cathode in an electro-deposition manner; and (2) circulation: discharging the electroplating rinse water subjected to the first electrodeposition to a liquid storage barrel, sucking the electroplating rinse water into an electrodeposition tank of the electrodeposition device again, and adsorbing residual metal ions in the electroplating rinse water to a cathode in an electrodeposition mode again. The method can greatly reduce the cation content in the electroplating rinse water, realizes water recovery, can obtain an electrodeposited metal layer at the cathode, and realizes metal recycling.

The invention discloses a natural gas flow measuring device for a water-containing natural gas transmission pipeline; the natural gas flow measuring device is provided with a measuring pipe, a first differential pressure transmitter, a flow totalizer and a second differential pressure transmitter, wherein the measuring pipe is provided with a Pitotbar flow sensor; a top pressure guide pipe and a bottom pressure guide pipe which are communicated with the interior of the measuring pipe are symmetrically arranged on the top wall and the bottom wall of the measuring pipe, and are connected with the input end of the second differential pressure transmitter; the signal output end of the second differential pressure transmitter is connected with the signal input end of the flow totalizer; an airinlet hole and an air outlet hole at two ends of the measuring pipe are respectively connected with pipeline joints which can be in butt joint with the water-containing natural gas transmission pipeline; the inner diameter of each pipeline joint is equal to that of the water-containing natural gas transmission pipeline, and the inner diameter of the measuring pipe is larger than that of each pipeline joints. After the device is applied, the flow of natural gas in the water-containing natural gas transmission pipeline can be relatively accurately measured.

The invention discloses a preparation method of a high-temperature resistant microencapsulation turmeric essential oil biological bacteriostatic agent, which comprises the following steps of: dissolving gelatin and peach gum in a wall material to obtain a wall material solution; adding turmeric essential oil into the wall material solution, and emulsifying and dispersing at high speed to obtain emulsion; and stirring the emulsion in a constant temperature waterbath, regulating a pH value by using acetic acid, performing complex coacervation reaction, and forming microcapsule suspension liquid; cooling, regulating the pH value by using NaOH solution, adding glutamine transaminase, solidifying, leaching, drying, and thus obtaining turmeric essential oil microcapsule. The wall material is available, and the turmeric essential oil microcapsule has stable quality, is low in cost, and is safe to eat. The turmeric essential oil microcapsule has characteristic of controlling releasing in high-temperature and high-humidity environments, and turmeric essential oil has an effect of resisting bacteria in a high-temperature environment.

The invention discloses a treatment method for aluminum-containing waste salt, and relates to the technical field of sewage treatment. The treatment method comprises the steps that the aluminum-containing waste salt is added into a warm aqueous solution to be fully mixed or dissolved, and a solid-liquid mixed solution is obtained; solid-liquid separation is carried out on the solid-liquid mixed solution, and insoluble solid and an aluminum-containing waste salt solution are obtained; the aluminum-containing waste salt solution is placed in an electrolytic cell for performing electrolysis, different corresponding electrolysis parameters are selected according to different pHs of cathode liquor and anode liquor, pure aluminum ions are electrodeposited on the anode and the cathode, and residual liquid is left; an electrodeposited pure aluminum ion product is recovered; and at least a part of residual liquid is recycled into the aluminum-containing waste salt solution. The treatment methodhas the advantage of high deposition efficiency, and realizes effective treatment of recycling of the aluminum-containing waste salt.

The invention relates to the technical field of evaporation processes, in particular to a crucible for a point evaporation source. The crucible comprises a crucible body which is hollow inside. An opening is formed in the top end of the crucible body, and a flow guiding part is arranged on the side wall where the opening is located. The flow guiding part is arranged on the side wall where the opening of the crucible body is located, the spraying angle of evaporation objects in the crucible body can be adjusted through the included angle formed between the flow guiding part and the horizontal plane, the evaporation objects are fully deposited on a substrate, and the situation that cleaning troubles and waste of the evaporation objects are caused by the fact that the wall of a cavity is plated with the evaporation objects is avoided.

The invention discloses a water treatment deposition filter which comprises filter pipes and a slag depositing tank and is characterized in that each filter pipe is a arc-shaped pipe of which the two ends are high and the middle is low; the arc-shaped pipes of which the two ends are high and the middle is low are connected and arranged from bottom to top, and two adjacent arc-shaped pipes of which the two ends are high and the middle is low are respectively arranged on a layered structure formed between an upper layer and a lower layer; a water inlet is formed at one end of a arc-shaped pipe at the undermost layer, and the other end of the arc-shaped pipe at the undermost layer is connected with a arc-shaped pipe at the last second layer; the arc-shaped pipe at the last second layer is connected with a arc-shaped pipe at the last third layer; the outlet of a arc-shaped pipe at the uppermost layer is directly used as a water outlet, or the outlet of the arc-shaped pipe at the uppermost layer is connected with a water outlet pipe of which the water outlet port is used as the water outlet; deposition supporting pipes which are arranged at the middle concave parts of each layer of arc-shaped pipes of which the two ends are high and the middle is low are connected and communicated into the slag depositing tank positioned at the lower part of the arc-shaped pipe at the undermost layer; and a deposited slag discharging valve is arranged at the lower part of the slag depositing tank. The water treatment deposition filter has simple structure and better filtering effect by testing, and achieves the drinking water quality standard.