68results about How to "Improve surface passivation effect" patented technology

The invention discloses a PID-resistant solar cell manufacturing method. The method includes the steps that under the room temperature, ultraviolet light penetrates through compressed air or oxygen with the thickness ranging from 0.2 cm to 1 cm and irradiates the diffusion surface of a silicon wafer, and then an oxidation film with the thickness ranging from 0.5 nm to 1 nm is grown. The silicon oxide layer can meet the requirement for PID resistance under the condition that the silicon oxide layer is extremely thin, and therefore the problem that due to the fact that the silicon oxide layer is too thick, the reflection reduction effect is lowered is solved. The solar cell product perfectly solves the contradictory problem between PID resistance and the light utilization ratio. Meanwhile, the oxide layer manufactured through the method has a good surface passivation effect, and the photoelectric conversion efficiency of the solar cell piece can be improved. The PID-resistant solar cell manufacturing method is simple in process and high in film forming speed, the film thickness can be automatically controlled, the thickness of the formed film can be controlled without special means, the practicability of the whole process is greatly improved, and an effective path is provided for large-scale industrial production.