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Preparation method for efficient solar cell

A solar cell, high-efficiency technology, applied in the field of solar cells, can solve the problem of high cost, achieve the effect of reducing cost consumption, saving cost consumption, and reducing process complexity

Active Publication Date: 2016-04-27
TRINA SOLAR CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It simply uses back polishing technology, and the back polishing uses HNO 3 / HF / H 2 SO 4 Mixed solution, higher cost

Method used

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  • Preparation method for efficient solar cell
  • Preparation method for efficient solar cell
  • Preparation method for efficient solar cell

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] After the raw silicon wafer is cleaned and textured, it is diffused with low square resistance on one side in the atmosphere of phosphorus oxychloride, and the square resistance after diffusion is controlled at 50Ω / ◇; the diffusion side of the silicon wafer is put into the alkali tank chain back polishing machine At the feeding end, the speed of 1.5m / min passes through the alkali tank equipped with 60°C and 20% KOH aqueous solution by mass percentage, and the backside is polished in the KOH aqueous solution for 8.0min. After the backside polishing is completed, the silicon wafer is equipped with pure Wash the residual alkali in the pure water tank of water, dry the upper and lower surfaces of the silicon wafer through the drying section, and take out the silicon wafer from the feeding end smoothly.

[0034] Make a selective emitter:

[0035] a. Put the back-polished silicon wafer into the INK printing machine to print ink on the electrode grid area of ​​the silicon wafe...

Embodiment 2

[0043] After the raw silicon wafer is cleaned and textured, it is diffused in a phosphorus oxychloride atmosphere with low square resistance on one side, and the square resistance after diffusion is controlled at 55Ω / ◇; the diffusion side of the silicon wafer is put into the alkali tank chain back polishing machine At the feeding end, at a rate of 2.2m / min, the backside polishing is carried out in the KOH solution for 5.5min through an alkali tank filled with 80°C and 10% KOH solution by mass percentage concentration. After the backside polishing is completed, the silicon wafer is filled with pure water Wash the residual alkali in the pure water tank, dry the upper and lower surfaces of the silicon wafer through the drying section, and take out the silicon wafer from the feeding end smoothly.

[0044] Make a selective emitter:

[0045] a. Put the back-polished silicon wafer into the INK printing machine to print ink on the electrode grid area of ​​the silicon wafer as a mask, ...

Embodiment 3

[0054] After the raw silicon wafer is cleaned and textured, it is diffused with low square resistance on one side in the atmosphere of phosphorus oxychloride, and the square resistance after diffusion is controlled at 52Ω / ◇; the diffusion side of the silicon wafer is put into the alkali tank chain back polishing machine At the feeding end, at a speed of 1.8m / min, the backside polishing in NaOH aqueous solution was carried out for 6.67min through an alkali tank equipped with 70°C and 35% NaOH aqueous solution by mass percent concentration. Wash the residual alkali in the pure water tank, dry the upper and lower surfaces of the silicon wafer through the drying section, and take out the silicon wafer from the feeding end smoothly.

[0055] Make a selective emitter:

[0056] a. Put the back-polished silicon wafer into the INK printing machine to print ink on the electrode grid area of ​​the silicon wafer as a mask, and dry it.

[0057] b. Put the diffusion surface of the silicon ...

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Abstract

The invention discloses a preparation method for an efficient solar cell. The preparation method comprises the steps of performing texturing, diffusing and polishing on a raw material silicon wafer, and manufacturing a selective emitting electrode, plating an anti-reflection film, performing silk-screen printing, and sintering to obtain the efficient solar cell. According to the preparation method, the step of polishing is performed before the step of manufacturing the selective emitting electrode; a selective emitting electrode preparing technology and a back polishing technology are combined, so that a large amount of cost consumption for HNO3 and HF can be saved; the preparation method is simple and easy to implement; compared with an IBC cell, a heterojunction cell, and other efficient solar cells, the efficient solar cell prepared by the invention can reduce complexity of process, and the large-scale production can be realized; and in addition, the Uoc, Isc and Eff of the solar cell prepared by the preparation method are greatly improved.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a method for preparing high-efficiency solar cells. Background technique [0002] With the rapid development of the photovoltaic industry, crystalline silicon solar cells have developed rapidly due to their high cost performance. At present, in the field of crystalline silicon solar cells, the selective emitter technology or the back polishing technology are simply used to prepare solar cells. Square resistance diffusion (generally, the temperature is 800°C-850°C, and the diffusion square resistance is 70Ω / ◇-100Ω / ◇), printing back silver and aluminum paste on the back, drying, sintering and anti-reflection coating to obtain high-efficiency solar cells. Chinese patent application CN201410694985.2 discloses a method for preparing polycrystalline silicon solar cells made of RIE texturing, which includes the following steps: (1) removing the damaged layer on the front surface of the polyc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0352H01L21/02
CPCH01L21/02016H01L21/02024H01L31/035272H01L31/1804Y02E10/547Y02P70/50
Inventor 肖斌宋慧娟
Owner TRINA SOLAR CO LTD
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