An
electroless deposition solution of the invention for forming an alkali-
metal-free
coating on a substrate comprises a first-
metal ion source for producing first-
metal ions, a pH adjuster in the form of a
hydroxide for adjusting the pH of the solution, a
reducing agent, which reduces the first-metal ions into the first metal on the substrate, a complexing agent for keeping the first-metal ions in the solution, and a source of ions of a second element for generation of second-metal ions that improve the
corrosion resistance of the aforementioned
coating. The method of the invention consists of the following steps: preparing hydroxides of a metal such as Ni and Co by means of a complexing reaction, in which solutions of hydroxides of Ni and Co are obtained by displacing hydroxyl ions OH− beyond the external boundary of ligands of mono- or polydental complexants; preparing a complex composition based on a
tungsten oxide WO3 or a phosphorous
tungstic acid, such as H3[P(W3O10)4], as well as on the use of
tungsten compounds for improving anti-corrosive properties of the deposited films; mixing the aforementioned solutions of salts of Co, Ni, or W and maintaining under a temperatures within the range of 20° C. to 100° C.; and carrying out deposition from the obtained
mixed solution.