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263 results about "Porous anodic aluminum oxide" patented technology

Method of manufacturing porous anodized alumina film

PCT No. PCT / JP97 / 02965 Sec. 371 Date Nov. 2, 1998 Sec. 102(e) Date Nov. 2, 1998 PCT Filed Aug. 26, 1997 PCT Pub. No. WO98 / 09005 PCT Pub. Date Mar. 5, 1998A plurality of recesses having the same interval and array as those of pores of an alumina film, which are to be formed in anodizing, are formed on a smooth surface of an aluminum plate in advance, and then, the aluminum plate is anodized. With this process, the roundness of the pores of the porous anodized alumina film and the uniformity of pore size are improved, and the pores are regularly arrayed at a predetermined interval. The recesses are formed by pressing a substrate having a plurality of projections on its surface against the aluminum plate surface to be anodized.
Owner:NIPPON TELEGRAPH & TELEPHONE CORP

Thick porous anodic alumina films and nanowire arrays grown on a solid substrate

The presently disclosed invention provides for the fabrication of porous anodic alumina (PAA) films on a wide variety of substrates. The substrate comprises a wafer layer and may further include an adhesion layer deposited on the wafer layer. An anodic alumina template is formed on the substrate. When a rigid substrate such as Si is used, the resulting anodic alumina film is more tractable, easily grown on extensive areas in a uniform manner, and manipulated without danger of cracking. The substrate can be manipulated to obtain free-standing alumina templates of high optical quality and substantially flat surfaces PAA films can also be grown this way on patterned and non-planar surfaces. Furthermore, under certain conditions the resulting PAA is missing the barrier layer (partially or completely) and the bottom of the pores can be readily accessed electrically. The resultant film can be used as a template for forming an array of nanowires wherein the nanowires are deposited electrochemically into the pores of the template. By patterning the electrically conducting adhesion layer, pores in different areas of the template can be addressed independently, and can be filled electrochemically by different materials. Single-stage and multi-stage nanowire-based thermoelectric devices, consisting of both n-type and p-type nanowires, can be assembled on a silicon substrate by this method.
Owner:MASSACHUSETTS INST OF TECH

Strong anodic oxidation method for preparing porous pellumina

The invention relates to an intensive anodic oxidation process to prepare porous anodic alumina film. An aluminum sheet is as an anode; a platinum sheet as a cathode; argon as shielded gas; mixed solution of perchloric acid with absolute alcohol as electrochemical polishing compound for the aluminum sheet; mixed solution of oxalic acid, absolute alcohol and deionized water as electrolyte; and mixed solution of phosphoric acid, chromic acid and deionized water as alumina film corrodent. Through aluminum sheet annealing, purging, electrochemical polishing, mild anodic oxidation, corrosion on aluminum sheet oxide film, intensive anodic oxidation and stripping oxide film, and finally, pale yellow, high purity and ordered porous-structured nanometer-leveled alumina film is achieved; The alumina film pore is in circular shape sized in 30 to 35nm, pore distance in 80 to100nm and pore depth in 162.4 micrometers; growth rate of the alumina film is 54 micrometers / h, which is 27 times higher than 2 micrometers / h of growth rate of anodic oxidation aluminum film prepared through mild anodic oxidation process.
Owner:TAIYUAN UNIV OF TECH

Silver nanometer column array erected on orifice of porous alumina template and preparation method and application thereof

The invention discloses a silver nanometer column array erected on the orifice of a porous alumina template and a preparation method and application thereof. The silver nanometer column array is characterized in that silver nanometer columns with the heights of 30-200 nanometers and the diameters of 30-60 nanometers are sequentially hexagonally arrayed on the periphery of the orifice of the porous anodic alumina template with taper holes; and silver nanometer particles with the particle size of 5-40 nanometers are attached to the walls of the taper holes. The preparation method comprises the following steps of: firstly placing an aluminum sheet into an oxalic acid solution, and carrying out anodization at direct-current voltage for at least 2 hours; then placing into a phosphorus-chromium acid mixed solution, and soaking for at least 3 hours to obtain an intermediate product; then firstly placing the intermediate product into the oxalic acid solution, carrying out the anodization at the direct-current voltage for at least 20 seconds, then placing the intermediate product into a phosphorus acid solution, and soaking for at least 1 minute; repeating the process for at least 10 times to obtain the alumina template with the holes in the shape of the taper holes; and then placing the alumina template into an ion sputter for silver sputtering so as to prepare a target product. The silver nanometer column array disclosed by the invention can be used as an active base of surface-enhanced Raman scattering; and the content of rhodamine or tetrachlorobiphenyl which is attached to the silver nanometer column array is measured by using a laser Raman spectrometer.
Owner:HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI

Thick porous anodic alumina films and nanowire arrays grown on a solid substrate

The presently disclosed invention provides for the fabrication of porous anodic alumina (PAA) films on a wide variety of substrates. The substrate comprises a wafer layer and may further include an adhesion layer deposited on the wafer layer. An anodic alumina template is formed on the substrate. When a rigid substrate such as Si is used, the resulting anodic alumina film is more tractable, easily grown on extensive areas in a uniform manner, and manipulated without danger of cracking. The substrate can be manipulated to obtain free-standing alumina templates of high optical quality and substantially flat surfaces PAA films can also be grown this way on patterned and non-planar surfaces. Furthermore, under certain conditions the resulting PAA is missing the barrier layer (partially or completely) and the bottom of the pores can be readily accessed electrically. The resultant film can be used as a template for forming an array of nanowires wherein the nanowires are deposited electrochemically into the pores of the template. By patterning the electrically conducting adhesion layer, pores in different areas of the template can be addressed independently, and can be filled electrochemically by different materials. Single-stage and multi-stage nanowire-based thermoelectric devices, consisting of both n-type and p-type nanowires, can be assembled on a silicon substrate by this method
Owner:MASSACHUSETTS INST OF TECH

Method for preparing highly ordered porous anodic alumina films in superhigh speed

The invention discloses a method for preparing highly ordered porous anodic alumina films in superhigh speed, relating to the application fields including the surface treating field of nonferrous metal and the preparation and application field of new materials in nanometer structures. Aluminum materials are used as anodes without high-temperature annealing or chemical polishing, a mixed solution containing oxalic acid, aluminum sulfate and ethylene glycol is used as an improved oxalic acid electrolyte system, the primary electrolysis is performed in the common technology, the secondary electrolysis is performed at the electrolyte temperature of 25 to 65 DEG C and under the direct-current electrolytic voltage of 30 to 50V after an oxide layer formed by the primary electrolysis is removed, and then the superhigh-speed growing method of porous anodic alumina films is directly realized; the growing speed is from 20 to 200 mum/h and is 10 to 50 times higher than that of the common technology for preparing the highly ordered porous anodic alumina films. The method does not need complicated thermal annealing and polishing, low-temperature requirements or high voltage and only needs a common water bath to stably prepare the highly ordered porous anodic alumina films in superhigh speed in a very wide temperature range.
Owner:JIANGSU POLYTECHNIC UNIVERSITY

Method for producing antireflection film of subwavelength structure

InactiveCN101398618AOvercome sizeOvercoming time-consuming disadvantagesPhotomechanical coating apparatusChemical industryUltraviolet lights
A preparation method of an anti-reflecting film with a sub-wavelength structure in the field of chemical industry comprises the following steps: step 1: a silicon chip is washed, heated and cooled to the room temperature; step 2: a porous anodic aluminum oxide template is washed and a release agent is coated on the porous anodic aluminum oxide template by vaporization; step 3: the silicon chip is slowly rotated to evenly spread a photoresist on the surface of the silicon chip, and then rotated at a high speed to remove the excessive photoresist and obtain the thinner and even photoresist; step 4: the porous anodic aluminum oxide template on the surface of which the release agent is coated by vaporization is aligned with the silicon substrate rotatably coated with the photoresist with even thickness, and then the porous anodic aluminum oxide template is pressed into the photoresist layer, and the photoresist is exposed and solidified with an ultraviolet light source; and step 5: after solidification, the porous anodic aluminum oxide template is scaled off, and the obtained photoresist is the anti-reflecting film. The anti-reflecting film prepared by the method has good antireflecting effect on broad band light.
Owner:SHANGHAI JIAO TONG UNIV

Tapered super-surface structure based photovoltaic photoelectric detector and preparation method thereof

ActiveCN106409938ARealize broadband photodetectionAvoid narrow-band absorption disadvantagesFinal product manufactureSemiconductor devicesMicro nanoOptoelectronics
The invention discloses a tapered super-surface structure based photovoltaic photoelectric detector and a preparation method thereof. The photoelectric detector comprises a metal substrate whose surface includes a 3D nanometer cone array structure, a semiconductor file layer whose forbidden band width is greater than incident photon energy, and a metal film layer; and the metal substrate, the semiconductor film layer and the metal film layer are arranged successively from bottom to top. The preparation method comprises that a porous anodised aluminum film is prepared on the aluminum substrate, the anodised aluminum film in the surface of the aluminum substrate is removed, and the semiconductor film layer and the metal film layer are prepared then. The metal substrate, the semiconductor film layer and the metal film layer for the super-surface structure, the thickness of the metal film layer, the material thickness of the semiconductor layer or a structural parameter of a nanometer cone is controlled to regulate and control the frequency range of super-absorption. The photoelectric detector is simple in preparation technology, convenience is provided for large-area preparation, complex micro nano processing is not needed, and high-effeminacy broadband wide-angle photoelectric detection can be realized.
Owner:SOUTHEAST UNIV

Preparation method for silicon-carbon composite nano tube array

InactiveCN103618072APipe diameter controllableControllable managementCell electrodesSecondary cellsCarbon compositesGas phase
The invention belongs to the field of lithium ion batteries and discloses a preparation method for a silicon-carbon composite nano tube array. The preparation method for the silicon-carbon composite nano tube array is characterized by comprising the following steps: raising the temperature of a porous-anode aluminum oxide template under inert gas; introducing acetylene gas; generating a carbon nano tube array on the surface of the template by high-temperature gas-phase decomposition of acetylene; vacuumizing and introducing the inert gas, hydrogen and silane after the temperature is raised; decomposing silane to obtain a coaxial carbon nano tube and silicon nano tube array in the template; and removing silicon oxide on the surface of the template by using a hydrofluoric acid aqueous solution and drying to obtain the silicon-carbon composite nano tube array. According to the preparation method for the silicon-carbon composite nano tube array, the silicon-carbon composite nano tube array with controllable pipe diameter, pipe length and wall thickness, and uniform size can be obtained by two-step chemical vapor deposition and hydrofluoric acid corrosion; in a whole production process, complicated equipment is not used and process steps are simple, so that large-scale industrial production is facilitated; the stability of the silicon-carbon composite nano tube array is good.
Owner:山东玉皇盛世化工股份有限公司

Fabricating method of soft template with nanometer structure

The invention relates to a fabricating method of a soft template with a nanometer structure, which is characterized in that the soft template is duplicated by a porous anodic aluminum oxide template. The pore diameter of porous anodic aluminum oxide is usually 10-500 nm, holes of the porous anodic aluminum oxide are straight and are evenly distributed, the porous anodic aluminum oxide template can be used as a mother template and can be duplicated to form the soft template with high resolution and high duplication accuracy, therefore, the fabricating cost and the fabricating period of the template are reduced. The invention has the remarkable characteristics of low fabricating cost of the template, short period and simple process, and can realize large-area impression because the duplicated soft template can be repeatedly used.
Owner:SHANGHAI NANOTECH PROMOTION CENT +1

Impressing hard template in nanostructure

The invention relates to an impressing hard template in a nanostructure, which belongs to the field of nano manufacturing and is characterized in that a porous template with a hard material substrate is prepared by the porous AAO (anodic aluminum oxide) membrane technology and can be directly used as an impressing (from top to bottom) template after the hard substrate is added and the surface modification treatment is carried out. A porous AAO membrane can self-organize and grow into an ordered six-site symmetrical porous structure, and steep holes are uniformly distributed. When the porous AAO membrane is used as the template, various nanostructures and devices with optical, electrical and magnetic properties can be prepared by a processing method of directional assembling from bottom to top such as thermal evaporation, sputtering, deposition and electrochemical assembling. As the hard material substrate is added and the surface modification treatment is carried out, the AAO template technology is transplanted into the field of top-to-bottom surface micro-structure processing. Compared with the present technical method of the common electron beam direct writing, the manufacturing method for the impressing hard template with a nano-grade high-density structure not only has the obvious characteristics of low cost, short period and simple processing, but also can be widely used in the processing as well as researching of the nano-grade high-density surface nanostructure and particularly has broad prospects in the fields of semiconductor lighting and high-density storage. Meanwhile, as the hard substrate is increased, the shortcomings of the present brittle and fragile AAO template are overcome, thereby being more beneficial for duplication of the soft template.
Owner:SHANGHAI NANOTECH PROMOTION CENT +1

Method for preparing indium/tellurium porous nanowire array

The invention discloses a method for preparing an indium / tellurium porous nanowire array, and belongs to the technical field of preparation of porous materials and nano materials. The method is characterized by comprising the following steps: preparing a porous anode alumina template (PAA) by using a two-step anodization method, preparing an electrolytic deposition solution consisting of a high-purity In salt or compound, a salt or compound of Te, a pH conditioning agent, an additive and deionized water, and performing electrochemical deposition on In and Te elements in pore canals of the alumina template by adopting a pulse electrochemical deposition technology, using the electrolytic deposition solution containing the In and Te elements and taking metal-sprayed PAA template as an anode and graphite as a cathode under certain deposition parameters and conditions, so as to finally obtain a one-dimensional ordered In / Te porous nanowire array. The method has the effects and benefits that the preparation is simple, the cost is low, and components and structures are easy to regulate and control; the array has a significant potential application prospect in fields of energy, catalysis, adsorption, thermoelectricity, optics, electrics and the like, and particularly has great values in application of sensors.
Owner:DALIAN UNIV OF TECH

Method for preparing ordered macroporous anodic alumina film by two-step anodic oxidation

InactiveCN103243370AAperture continuously adjustableArranged in orderSurface reaction electrolytic coatingIce waterPhosphoric acid
The invention relates to a method for preparing an ordered macroporous anodic alumina film by two-step anodic oxidation. The method comprises the following steps of: carrying out hard anodizing on aluminum which is subjected to high temperature annealing, ultrasound deoiling and electrochemical polishing treatments in modified oxalic acid electrolyte, so as to obtain a porous anodic alumina film; removing an irregular porous alumina layer which is formed after first anodic oxidation by using a mixed solution of chromic acid and phosphoric acid; then carrying out second anodic oxidation, namely carrying out mild anodic oxidation on the aluminum sheet with the alumina film removed in the modified phosphate electrolyte in a constant voltage manner, wherein the voltage in the second anodic oxidation is completely the same as the voltage in the first anodic oxidation; and finally chambering the test sample subjected to anodic oxidation in a phosphoric acid solution to obtain the ordered macroporous anodic alumina film. The preparation method is carried out under an ice-water bath condition without the requirement on a very low temperature or a high voltage; the cost of used raw materials is low; and equipment is simple and is convenient to operate and easy to control, and therefore the method has a bright application prospect in the modern industry and high and new technology field.
Owner:DONGHUA UNIV
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