The invention relates to an impressing hard template in a
nanostructure, which belongs to the field of
nano manufacturing and is characterized in that a porous template with a hard material substrate is prepared by the porous AAO (
anodic aluminum oxide)
membrane technology and can be directly used as an impressing (from top to bottom) template after the
hard substrate is added and the
surface modification treatment is carried out. A porous AAO membrane can self-organize and grow into an ordered six-site symmetrical porous structure, and steep holes are uniformly distributed. When the porous AAO membrane is used as the template, various nanostructures and devices with optical, electrical and magnetic properties can be prepared by a
processing method of directional assembling from bottom to top such as thermal
evaporation,
sputtering, deposition and electrochemical assembling. As the hard material substrate is added and the
surface modification treatment is carried out, the AAO template technology is transplanted into the field of top-to-bottom surface micro-structure
processing. Compared with the present technical method of the common
electron beam
direct writing, the manufacturing method for the impressing hard template with a nano-grade high-density structure not only has the obvious characteristics of low cost, short period and simple
processing, but also can be widely used in the processing as well as researching of the nano-grade high-density surface
nanostructure and particularly has broad prospects in the fields of
semiconductor lighting and high-density storage. Meanwhile, as the
hard substrate is increased, the shortcomings of the present brittle and fragile AAO template are overcome, thereby being more beneficial for duplication of the soft template.