The invention discloses a device and a method for growing a high-temperature
oxide crystal by an improved heat exchange method with a
seed crystal arranged on the top, which are characterized in that a kyropoulos method, a
Czochralski method (CZ), a heat exchange method (HEM), a
temperature gradient method (TGT), a Bridgman-Stockbarger method and a kyropoulos method (KY method) are combined together; according to the special high-temperature vacuum
crystal furnace, gas flows in from the center of the top of a
hearth from top to bottom, absolute uniform and symmetrical flow out from the center of the bottom is ensured through flow planning, and gradients of all parts in different growth stages are achieved by adjusting the gas flow in different stages and the pumping speed of a
vacuum pump. The method comprises the following steps: charging a furnace, vacuumizing, introducing flowing protective gas, heating and melting materials, washing seed crystals, changing the gas inlet and outlet proportion, carrying out real-time gradient adjustment, seeding by a pulling method, carrying out a hole shrinkage process, increasing the shouldering process of a heat exchange method for increasing the gas flow, controlling a
crystal growth interface (adjusting a convex interface to be slightly convex or close to a
flat interface), and carrying out equal-
diameter growth by combining HEM heat exchange with a KY technology (namely carrying out equal-
diameter growth by combining HEM heat exchange with a KY technology). A weighing
diameter control technology is optimized; amp is ended through a KY method; and removing the
crucible, and performing in-situ annealing by gradually increasing the pressure of the protective gas. According to the invention, the existing method is combined to produce the large-size high-temperature
oxide crystal.