174results about How to "Good resistance stability" patented technology

A method for forming a stamper used in the manufacture of CDs, DVDs, and other types of optical disks comprises forming a substrate by rolling. A layer of material is deposited (e.g. by plating) onto the substrate. Thereafter, a resist layer is formed on the layer of material and patterned. Because the substrate is formed by rolling, it is relatively inexpensive to form the substrate to a desired thickness. Because the layer of material is formed by deposition (e.g. plating), it is relatively inexpensive to ensure that the layer has a very smooth surface (i.e. without necessitating a great deal of polishing).

A slotted channel with a supplemental flange as a building member has at least one supplemental flange extending from at least one slot in the member web or primary flanges yielding a building member with increased strength, both compressive (longitudinally) and in shear (transverse). The slotted member presents a reduced area through which heat or sound may be conducted and slots in which insulation is received, both increasing resistance to heat and sound transfer.

The photoresist resin composition comprises a polymer containing an acid-responsive compound unit of the following formula (e.g. an adamantane skeleton) and a photoactive acid precursor. R<1 >may be an alkyl group having a tertiary carbon atom in the 1-position and the Z ring is a bridged-ring hydrocarbon ring comprising 2 to 4 rings. wherein R<1 >and R<2 >are the same or different from each other and each represents a hydrogen atom, an alkyl group or a cycloalkyl group; R<3 >represents a hydrogen atom or a methyl group; R<4 >represents a hydrogen atom, a halogen atom, an alkyl group, an oxygen-containing group, an amino group or an N-substituted amino group; the Z ring represents a monocyclic or polycyclic alicyclic hydrocarbon ring; n represents an integer of not less than 1; with proviso that R<4 >does not concurrently represent a hydrogen atom, and may be different over n occurrences; in formula (1), R<1 >and R<2 >may, jointly and together with the adjacent carbon atom, form an alicyclic hydrocarbon ring. The above photoresist resin composition is high in etching resistance, can be solubilized by irradiation, and is capable of providing a finer line pattern.

The invention discloses a manufacturing method of an electrothermal film. The manufacturing method comprises the following steps of A, preparing an electrothermal film treatment solution which comprises tin tetrachloride, titanium trichloride, antimony trichloride, calcium chloride, chromic oxide, manganese dioxide, nickel sesquioxide, isopropanol, alcohol and water, B, masking a substrate, C, heating the substrate to be 400-700 DEG C and then spraying the electrothermal film treatment solution on the substrate by a spray gun to form a semifinished electrothermal film, D, annealing the semifinished electrothermal film, and E, coating silver oxide paste on the surfaces of the two ends of the annealed semifinished electrothermal film, loading the semifinished electrothermal film into an electrode oven, baking and fusing the semifinished electrothermal film to form a whole, and obtaining the finished electrothermal film. The manufacturing method has the advantages that the stability of the electrothermal film is improved by adding antimony; the temperature resistance of the electrothermal film is improved by adding titanium; the infrared emitting ability of the electrothermal film is improved by adding nickel and manganese; and an adhesive force between the electrothermal film treatment solution and the substrate is increased by adding isopropanol.

A photomask blank has a chemically amplified negative resist film comprising (A) a polymer comprising recurring units of specific structure and recurring units having fluorine, (B) a base resin adapted to reduce its solubility in alkaline developer under the action of acid, (C) an acid generator, and (D) a basic compound. The resist film is improved in receptivity to antistatic film.

A surface mount resistor includes a resistance body, a first protective layer, a heat-transfer layer, a second protective layer and two electrode layers. The resistance body has a first end portion, a second end portion and a central portion between the first end portion and the second end portion. The first protective layer is disposed on the central portion of the resistance body, and the first end portion and the second end portion are exposed. The heat-transfer layer is plated on at least part of the resistance body. The second protective layer is disposed on at least part of the heat-transfer layer. The electrode layers are respectively arranged on the first end portion and the second end portion, and electrically connected with the heat-transfer layer.

The invention relates to a low-temperature PTC conducting composition, a PTC over-current protection device and a manufacturing method of the PTC over-current protection device. The low-temperature PTC conducting composition comprises, by weight, 40%-55% of organic polymer, 40%-55% of conducting carbon black and 1%-10% of voltage-resistant reinforcing filler. The PTC over-current protection device comprises the low-temperature PTC conducting composition. The PTC over-current protection device has an operating temperature lower than 80 DEG C, high PTC strength and good resistance stability, thereby being capable of achieving good over-current and over-temperature protection for circuits in a low-temperature environment.

The invention discloses an automatic resistance adjusting device for a resistance strain gauge and a resistance adjusting method. The device comprises a vertically arranged rack, wherein a Z-axis moving device is mounted on the rack, and a resistance measuring and adjusting device and a CCD (charge coupled device) image acquisition device are fixed on the Z-axis moving device; the automatic resistance adjusting device for the resistance strain gauge further comprises an X-axis moving device, a Y-axis moving device and a gas-liquid combined valve; a product clamping table is mounted on the X-axis moving device; and the resistance measuring and adjusting device is provided with a detecting unit. The adjusting process is controlled by controlling parameters such as current or voltage loaded on the resistance strain gauge, voltage loading time, a resistance adjusting liquid amount and the like, the equipment control accuracy is high, and the operation is easy; the device has a great advantage in the aspects of realizing mass and mechanical operation; and meanwhile, a product whose resistance is adjusted with an electrochemical resistance adjusting method doesn't produce internal stress in a sensitive grid area, so that the stability, the uniformity and the accuracy of the resistance of the product can be improved greatly.