963 results about "TM compound" patented technology

An organic phosphate compound having at least one radically polymerizable double bond, at least one phosphate residue having one or two hydroxyl groups, and at least one hydrocarbon group having 4 or more carbon atoms in a molecule, wherein a 10% by weight methanol solution of the organic phosphate compound has an electric conductivity at 25° C. of 0.5 mS / cm or less, and / or the organic phosphate compound has a light transmittance at 455 nm of 90% or more; a process for preparing the organic phosphate compound; a dental polymerizable composition comprising (a) the organic phosphate compound and (b) a polymerizable monomer capable of copolymerizing with the organic phosphate compound.

A radiation curable inkjet fluid includes a radiation curable composition including at least 25 wt % of a vinylether acrylate and at least 15 wt % of a polymerizable compound including at least three acrylate groups, each wt % being based upon the total weight of the radiation curable composition; and a photoinitiator including a tertiary amine group and 0 to 3 wt % of isopropylthioxanthone based upon the total weight of the radiation curable inkjet fluid. Also, an inkjet printing method using the radiation curable inkjet fluid.

A catalyst element for accelerating crystallization is added to an amorphous silicon film containing an impurity element for threshold voltage control, and a heat treatment is then performed to obtain a crystalline silicon film. Thereafter, the catalyst element is gettered by performing a heat treatment in an atmosphere containing a halogen element. In this step, a chemical equilibrium state is established for the impurity element for threshold voltage control by mixing a compound gas containing the impurity element into the atmosphere, thereby preventing the impurity element from escaping into the vapor phase.

A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.

The invention provides a method of producing a reactive silicon group-containing polyether oligomer which comprises reacting (a) a polyether oligomer having main chain of a polyether and, in each molecule, at least one unsaturated group represented by the general formula (1):(in the formula, R1 is a hydrocarbon group containing not more than 10 carbon atoms and R2 is a divalent organic group containing 1 to 20 carbon atoms and one or more species selected from the group consisting of hydrogen, oxygen and nitrogen atoms as a constituent atom) or the general formula (2):on a side chain or at a terminus with (b) a reactive silicon group-containing compound in the presence of (c) a group VIII transition metal catalyst to introduce the reactive silicon group into said polyether oligomer (a),wherein the reaction is carried out in the presence of (d) a sulfur compound.

The invention provides a method for extracting lithium salts in lithium-containing brine through an extraction method. Lithium is extracted through a co-extraction agent, an extraction agent and a diluent, wherein the extract is a mixture of an amide compound and a neutral phosphorus oxide compound, the structural formula of the amide compound is shown in the specification, and the structural formula of the neutral phosphorus oxide compound is shown in the specification. The method provided by the invention further optimizes the properties of extracted lithium, so that the method is more applicable to industrial application.

The relative intensity of fluorescent light of a melt-polycondensed aromatic polycarbonate produced by the transesterification process (melt polymerization process) of an aromatic dihydroxy compound and a carbonic acid diester in the presence of a catalyst comprising a basic nitrogen compound and / or a basic phosphorus compound in combination with an alkali metal compound is suppressed to 4.0x10-3 or below at a wavelength of 465 nm based on a standard substance in a fluorescent light spectrum obtained by the excitation wavelength of 320 nm. An aromatic polycarbonate having good color stability, especially good stability to the deterioration of the chip color during storage of the chip in air at room temperature can be produced by the present invention.

The present invention discloses the preparation process of CdSe / CdS, CdSe / ZnS and other II-VI type core-shell quantum dot. The CdSe / CdS and CdSe / ZnS core-shell quantum dot are prepared with cadmium acetate, zinc acetate or other inorganic compound, instead of Cd(CH3)2, Zn(CH3)2 or other inflammable, detonable and expensive organic metal compound, as material. The prdouct has excellent single dispersivity, improved fluorescent property, high quantum yield, high stability, and may be used widely as the fluorescent mark for biological detection and analysis.

A process for producing a finely cellular polyurethane foam by mixing a first ingredient comprisi an isocyanate compound and a second ingredient comprising a compound containing an active hydrogen group, characterized by comprising adding a nonionic silicone surfactant containing no hydroxyl group to at least one of the first ingredient and the second ingredient in an amount of 0.1 to 5 wt %, excluding 5 wt %, based on the total amount of the first ingredient and the second ingredient, subsequently agitating the surfactant containing ingredient together with an unreactive gas to disperse the unreactive gas as fine bubbles to prepare a bubble dispersion and then mixing the bubble dispersion with the remaining ingredient to cure the resultant mixture. Thus, a polyurethane foam having uniform fine cells and a higher hardness than ones having the same density can be produced without using a chemically reactive blowing agent such as water, vaporizable expandable blowing agent such as fluorocarbon, or other substance such as a finely particulate hollow foam or solvent soluble substance.

The invention relates to a method for modulating Ca2+-release-activated Ca2+ channels (CRAC) in a cell by administering to the cell a compound of formula (I): or a pharmaceutically acceptable salt, solvate, clathrate, or prodrug thereof wherein X, Y, A, Z, L and n are defined herein.

Provided are a carbon fiber reinforced composite material which exhibits excellent flame retardance, fast curing properties, heat resistance, and mechanical characteristics. Also provided are an epoxy resin composition suitable for use in producing said carbon fiber reinforced composite material as well as a prepreg and housing for electronic / electrical components. The epoxy resin composition is characterized by comprising: [A] an epoxy resin containing at least 50 mass % of a compound as represented by general formula (I), [B] an organic nitrogen compound based curing agent, [C] a phosphoric acid ester, and [D] a phosphazene compound. In general formula (I), R1, R2, and R3 are either a hydrogen atom or a methyl group, and n is an integer of 1 or higher.

The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and equipment for the sustained, high-volume production of Group III-V compound semiconductor material suitable for fabrication of optic and electronic components, for use as substrates for epitaxial deposition, for wafers and so forth. In preferred embodiments, these methods are optimized for producing Group III-N (nitrogen) compound semiconductor wafers and specifically for producing GaN wafers. Specifically, the method includes reacting an amount of a gaseous Group III precursor as one reactant with an amount of a gaseous Group V component as another reactant in a reaction chamber under conditions sufficient to provide sustained high volume manufacture of the semiconductor material on one or more substrates, with the gaseous Group III precursor continuously provided at a mass flow of 50 g Group III element / hour for at least 48 hours. A system for conducting the method is also provided.

This invention relates to a method of preparing poly(alkylene carbonate) that has a molecular weight and polymer chain structure precisely controlled by adding a chain transfer agent composed of a compound having an alcohol or carboxylic acid functional group upon alternating copolymerization of an epoxide compound and carbon dioxide using a catalyst composed of a trivalent metal complex compound synthesized from a quaternary ammonium salt-containing Salen type ligand, and to a polymer compound prepared thereby. According to this invention, the polymer compound having a star-shaped chain as well as the polymer having a linear chain can be prepared. The low-molecular-weight poly(alkylene carbonate) has an —OH terminal group and can be used alone as a coating agent, etc., and also in mixtures with an isocyanate compound and thus can be easily utilized to prepare polyurethane.

The invention provides a method for extracting lithium salt from lithium-contained brine by using an extraction process. The method comprises the step of extracting lithium by using a co-extraction agent, an extraction agent and a diluent, wherein the extraction agent is a mixture of an amide compound and a neutral phosphorus oxide compound, the amide compound has the structural formula shown in the specification, and the neutral phosphorus oxide compound has the structural formula shown in the specification. The method provided by the invention is used for further optimizing the performance of the extracted lithium and is more suitable for industrial application.

The present invention relates to a sheath (7) for a cable (1), where the sheath contains, at least in part, a halogen-free intumescent composition. The composition of the sheath contains a mixture of a polymer matrix chosen from a polyethylene, a polypropylene, an ethylene copolymer, a propylene copolymer, a silicone, a polyamide, and a mixture thereof and at least one flame-retardant additive. The flame retardant additive has a first inorganic compound having a lamellar crystal structure, and a second inorganic compound inserted between the lamellae of the first compound, where the second compound causes the lamellae to move apart under the application of heat.

The invention relates to cracking catalyst, containing rare earth ultrastable Y-type zeolite and stroma, wherein the stroma contains alumina with additive; the alumina with additive contains the following composition in percentage by weight: 60 to 99.5 percent of alumina and 0.5 to 40 percent of additive; the additive is selected from one or a plurality of compounds containing alkaline earth, lanthanide metal, silicon, gallium, boron or phosphorus elements; the rare earth ultrastable Y-type zeolite is obtained through a method comprising the following steps that: ultrastable Y-type zeolite and an acid solution with the equivalent concentration between 0.01 and 2 N are mixed with the liquid / solid weight ratio of 4 to 20 in the temperature range between 20 and 100 DEG C, stirred for 10 to 300 minutes, washed and filtered; rare earth salt solution is added in to exchange rare earth ions; the solution is washed and filtered after exchange. The catalyst is strong in heavy oil cracking capability, high in light oil yield and low in coke yield.

The present invention relates to a composition for a thermosetting silicone resin, the composition including: (A) an organohydrogenpolysiloxane; (B) an alkenyl group-containing epoxy compound; (C) an alkenyl group-containing cyclic siloxane; and (D) a hydrosilylation catalyst, a thermosetting silicone resin composition obtained by reacting the composition and a production method thereof, a photosemiconductor element-encapsulating material including the thermosetting silicone resin composition, and a photosemiconductor device including a photosemiconductor element encapsulated with the resin composition or the photosemiconductor element-encapsulating material.

A composite composition includes at least one organic polymer compound having biodegradability, vegetable fibers, and a hydrolysis inhibitor for the organic polymer compound having biodegradability.

A compound that includes at least Si, N and C in any combination, such as compounds of formula (R—NH)4-nSiXn wherein R is an alkyl group (which may be the same or different), n is 1, 2 or 3, and X is H or halogen (such as, e.g., bis-tertiary butyl amino silane (BTBAS)), may be mixed with silane or a silane derivative to produce a film. A polysilicon silicon film may be grown by mixing silane (SiH4) or a silane derviative and a compound including Si, N and C, such as BTBAS. Films controllably doped with carbon and / or nitrogen (such as layered films) may be grown by varying the reagents and conditions.

The invention discloses constitutional repeating units of an organic polysiloxane containing multiple functional groups, which is shown as right formula: in the formula, a, b and c are respectively the molar fractions of corresponding constitutional repeating units, wherein, 0<a<1, 0<b<1, 0<c<1 and p=1 to 200. The invention further discloses the preparation of the organic polysiloxane containing multiple functional groups. The organic polysiloxane containing multiple functional groups provided by the invention not only adds a new variety for organic polysiloxane compounds, but also provides anew choice for the occasion that organic polysiloxane additive-type flame retardant is utilized. In the invention, when the new structural organic polysiloxane containing multiple functional groups isprepared by the method, the selected raw material monomers are all environment-friendly and non-toxic, corrosive gas and toxic wastewater are not produced in the reaction process, thereby not only avoiding adverse impacts on the environment, but also avoiding a series of problems resulting in cost increasing, which are brought by later-stage wastewater treatment.

The present invention relates to an aliphatic polyester resin composition having excellent hydrolysis resistance, added to an aliphatic polyester resin (A), a reactive monomer (B) (e.g. a monocarbodiimide compound) and a reactive polymer (C) (e.g. a polycarbodiimide compound).

An anaerobic adhesive composition includes a monomer curable upon exclusion of oxygen. A peroxy polymerization initiator is present within the composition. The composition has a thixotrope imparting a thixotropic viscosity ratio in an uncured state of 8.2:1 to 11:1 as measured at rotation rates of 0.5 and 10 revolutions per minute. The thixotrope is composed of 3 to 50 total weight percent of inorganic particulate or 3 to 36 total weight percent of an organic compound. A process for forming an adhesive bond includes applying to a fastener an anaerobic adhesive composition that includes a polymerizable acrylate ester or vinyl ether, a peroxy polymerization initiator, and a thixotrope. The composition has a thixotropic viscosity ratio of between 8.2:1 and 11:1 for spindle rotation rates of 0.5 and 10.0 revolutions per minute. Tightening the fastener against a substrate induces viscosity breakdown and under the force to cure.

A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and / or between molecules with a crosslinking group having a C-O-C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group 3BOND C-COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

A method for forming a p-type semiconductor film comprises the steps of: providing on a substrate a group II-VI compound semiconductor film which is doped with a p-type impurity and comprises either MgXZn1-XO (0<=X<=1) or CdXZn1-XO (0<=X<=1) and activating the p-type impurity by annealing the doped semiconductor film.

An ink-jet recording ink including water, a water-soluble organic solvent, a pigment as a colorant (B), and at least one fluorochemical surfactant selected from compounds represented by Structural Formula (1) below, Structural Formula (1) where R1 denotes any one of a hydrogen atom, an alkyl group and a perfluoroalkyl group, R2 denotes any one of a hydrogen atom, an alkyl group and a fluorine-containing group, Rf denotes a fluorine-containing group, and m and n each denote an integer of 1 or greater.

The invention discloses a phenyl organic silicon modified polyurethane resin, a preparation method and application thereof, and belongs to the field of polyurethane resin. The structural formula of the phenyl organic silicon modified polyurethane resin is as shown in the description; the preparation method of the phenyl organic silicon modified polyurethane resin comprises the following steps: dissolving phenylsilanediol into an organic solvent, taking a reaction with chlorosilane (R<2>SiCH3Cl2) to prepare hydroxyl-terminated methyphenyl polysiloxane, under the action of a catalyst, mixing the hydroxyl-terminated methyphenyl polysiloxane with a silane compound to obtain amino or imino terminated methyphenyl polysiloxane, then in the atmosphere of argon, mixing diisocyanate, amino or imino terminated methyphenyl polysiloxane, polyethylene glycol or polyol with a mixed solvent, and taking a reaction to obtain the phenyl organic silicon modified polyurethane resin. The phenyl organic silicon modified polyurethane resin has the advantages of being capable of reducing the water absorption, improving the hydrophobicity, and improving the compatibility of organic silicon and polyurethane, and can be prepared to thin film with good properties; the preparation method is simple and feasible.

The present invention relates to a composition for optical materials, comprising (a) a compound having in one molecule at least one structure represented by the following Formula 1: wherein R<1 >is a C0-10 hydrocarbon group, each of R<2>, R<3 >and R<4 >is a C1-10 hydrocarbon group or hydrogen, Y is O, S, Se or Te, m is 1 to 5, and n is 0 to 5; (b) a compound having in one molecule at least one isocyanate group and / or at least one isothiocyanate group; (c) a compound having in one molecule at least one mercapto group; and (d) an inorganic compound having sulfur atom and / or selenium atom, and also relates to an optical material produced by polymerization curing the composition, a production method thereof, and an optical lens comprising the optical material. The present invention provides a high refractive, high Abbe's number optical material having an improved impact resistance.

A moulding material for the production of highly flame resistant articles with a matrix of a thermoplastic and a particulate pigment dispersed therein is characterized in that the pigment is light-sensitive and changes colour under the influence of laser light and in that the pigment is a reaction product of at least one halogen-free flame retardant organic nitrogen base with(i) at least one mixed salt with at least two different cations and / or with(ii) a mixture of salt type compounds which on heating can be transformed into at least one salt type compound with at least two different cations, as in (i);wherein in variations (i) and (ii), at least one of the cations is selected from a group (A) of elements Ti, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Ag, Sn, Sb, La, Pr, Ta, W and Ce and at least one further cation is selected from a group (B) of elements from periods 3 and 6 of groups II and III, periods 5 and 6 of group IV and periods 4 and 5 of groups III to VIII and the lanthanides of the periodic table of the elements.

The invention provides a composition for forming a silicon-containing resist underlayer film comprising: (A) a silicon-containing compound obtained by a hydrolysis-condensation reaction of a mixture containing, at least, one or more hydrolysable silicon compound shown by the following general formula (1) and one or more hydrolysable compound shown by the following general formula (2), and (B) a silicon-containing compound obtained by a hydrolysis-condensation reaction of a mixture containing, at least, one or more hydrolysable silicon compound shown by the following general formula (3) and one or more hydrolysable silicon compound shown by the following general formula (4). There can be provided a composition for forming a resist underlayer film applicable not only to a resist pattern obtained in a negative development but also to a resist pattern obtained in a conventional positive development, and a patterning process using this composition.R1m1R2m2R3m3Si(OR)(4-m1-m2-m3)  (1)U(OR4)m4(OR5)m5  (2)R6m6R7m7R8m8Si(OR9)(4-m6-m7-m8)  (3)Si(OR10)4  (4)

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use.Specifically, the invention pertains to a compounds having the following structure (I):wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety.The invention also relates to spin-coatable composition of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.