11301 results about "Sulfonic acid ester" patented technology

A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

A composition of matter comprising an amine acylated with a hydrocarbyl group substituted carboxylic acylating agent containing an average of from 1.3 to 1.6 groups derived from α,β-unsaturated carboxylic compounds per Mn of the hydrocarbyl group, wherein the hydrocarbyl group has Mn determined by GPC ranging from 1500 to 3000, the amine comprises polyamine bottoms and said acylated amine has total base number (TBN) ranging from 17 to 35. A method for preparing the composition, lubricating oils containing the composition and, in another embodiment, lubricating oil compositions of this invention further comprising a metal overbased sulfonate detergent.

A photoacid compound having the following general structure:<paragraph lvl="0"><in-line-formula>R-O(CF2)nSO3X< / in-line-formula>wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q- wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.

A pharmaceutical composition comprising a co-crystal of an API and a co-crystal former; wherein the API has at least one functional group selected from ether, thioether, alcohol, thiol, aldehyde, ketone, thioketone, nitrate ester, phosphate ester, thiophosphate ester, ester, thioester, sulfate ester, carboxylic acid, phosphonic acid, phosphinic acid, sulfonic acid, amide, primary amine, secondary amine, ammonia, tertiary amine, sp2 amine, thiocyanate, cyanamide, oxime, nitrile diazo, organohalide, nitro, s-heterocyclic ring, thiophene, n-heterocyclic ring, pyrrole, o-heterocyclic ring, furan, epoxide, peroxide, hydroxamic acid, imidazole, pyridine and the co-crystal former has at least one functional group selected from amine, amide, pyridine, imidazole, indole, pyrrolidine, carbonyl, carboxyl, hydroxyl, phenol, sulfone, sulfonyl, mercapto and methyl thio, such that the API and co-crystal former are capable of co-crystallizing from a solution phase under crystallization conditions.

A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.

There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).

A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.

Panchromatic photosensitizers having a Formula of ML1L2X were synthesized, wherein M comprises ruthenium atom; X is a monodentate anion; L1 is heterocyclic bidentate ligand having one of formulae listed below:wherein G2 has one of formulae listed below:and L2 is a tridentate ligand having a formula listed below:The substituents R1, R2, R3, R4, R5, R6, R7 of L1 and L2 are the same or different, and represent alkyl, alkoxy, alkylthio, alkylamino, halogenated alkyl, phenyl or substituted phenyl group, carboxylic acid or counter anion thereof, sulfonic acid or counter anion thereof, phosphoric acid or counter anion thereof, amino-group, halogens, or hydrogen. The above-mentioned photosensitizers are suitable to use as sensitizers for fabrication of high efficiency dye-sensitized solar cell.

A fluoropolymer coated film comprising polymeric substrate film and fluoropolymer coating on the polymeric substrate film. The fluoropolymer coating comprises fluoropolymer selected from homopolymers and copolymers of vinyl fluoride and homopolymers and copolymers of vinylidene fluoride polymer blended with compatible adhesive polymer comprising functional groups selected from carboxylic acid, sulfonic acid, aziridine, anhydride, amine, isocyanate, melamine, epoxy, hydroxy, anhydride and mixtures thereof. The polymeric substrate film comprises functional groups on its surface that interact with the compatible adhesive polymer to promote bonding of the fluoropolymer coating to the substrate film.

A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8 is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.

The present invention relates to a silicone polymer comprising a sulfonic acid component formed from reactive components comprising (i) at least one silicone component and (ii) at least one sulfonic acid-containing component, wherein the sulfonic acid-containing component is comprised of a non-polymerizable, hydrophobic cation and a polymerizable sulfonic acid.

A pharmaceutical composition comprising a co-crystal of an API and a co-crystal former; wherein the API has at least one functional group selected from ether, thioether, alcohol, thiol, aldehyde, ketone, thioketone, nitrate ester, phosphate ester, thiophosphate ester, ester, thioester, sulfate ester, carboxylic acid, phosphonic acid, phosphinic acid, sulfonic acid, amide, primary amine, secondary amine, ammonia, tertiary amine, sp2 amine, thiocyanate, cyanamide, oxime, nitrile diazo, organohalide, nitro, s-heterocyclic ring, thiophene, n-heterocyclic ring, pyrrole, o-heterocyclic ring, furan, epoxide, peroxide, hydroxamic acid, imidazole, pyridine and the co-crystal former has at least one functional group selected from amine, amide, pyridine, imidazole, indole, pyrrolidine, carbonyl, carboxyl, hydroxyl, phenol, sulfone, sulfonyl, mercapto and methyl thio, such that the API and co-crystal former are capable of co-crystallizing from a solution phase under crystallization conditions.

One aspect of the present invention relates to ionic liquids comprising a pendant Bronsted-acidic group, e.g., a sulfonic acid group. Another aspect of the present invention relates to the use of an ionic liquid comprising a pendant Bronsted-acidic group to catalyze a Bronsted-acid-catalyzed chemical reaction. A third aspect of the present invention relates to ionic liquids comprising a pendant nucleophilic group, e.g., an amine. Still another aspect of the present invention relates to the use of an ionic liquid comprising a pendant nucleophilic group to catalyze a nucleophile-assisted chemical reaction. A fifth aspect of the present invention relates to the use of an ionic liquid comprising a pendant nucleophilic group to remove a gaseous impurity, e.g., carbon dioxide, from a gas, e.g., sour natural gas.

A lubricant including: an ionic liquid, which includes a conjugate acid (B+) and a conjugate base (X−), and is protic, wherein the ionic liquid is represented by the following general formula (1), and wherein the conjugate base is a conjugate base of sulfonic acid, a conjugate base of sulfonimide, or a conjugate base of trisulfonylmethide:where R1 and R2 each represent a hydrogen atom or R1 and R2 form a benzene ring together with carbon atoms to which R1 and R2 are bonded, R3 represents a to straight-chain hydrocarbon group having 10 or more carbon atoms, and R4 represents a hydrogen atom or a hydrocarbon group in the general formula (1).

A biosensor that is highly responsive and capable of rapid and highly sensitive quantification of a specific component contained in a sample is provided. The biosensor of this invention comprises: an electrically insulating base plate; an electrode system comprising a working electrode and a counter electrode disposed on the base plate; and a reagent system comprising an oxidoreductase which catalyzes the oxidation reaction of glucose, gluconolactonase and a buffer. The buffer is selected from the group consisting of phthalic acid and its salts, maleic acid and its salts, succinic acid and its salts, phospholic acid and its salts, acetic acid and its salts, boric acid and its salts, citric acid and its salts, glycine, tris(hydroxymethyl)aminomethane, piperazine-N,N′-bis(2-ethane sulfonic acid) and the like.

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C10 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

A gas sensing device (nanosensor) includes a substrate with at least a pair of conductive electrodes spaced apart by a gap, and an electrochemically functionalized semiconductive nanomaterial bridging the gap between the electrodes to form a nanostructure network. The nanomaterial may be single-walled carbon nanotubes (SWNTs) functionalized by the deposition of nanoparticles selected from the group consisting of an elemental metal (e.g., gold or palladium), a doped polymer (e.g., camphor-sulfonic acid doped polyaniline), and a metal oxide (e.g. tin oxide). Depending on the nanoparticles employed in the functionalization, the nanosensor may be used to detect a selected gas, such as hydrogen, mercury vapor, hydrogen sulfide, nitrogen dioxide, methane, water vapor, and / or ammonia, in a gaseous environment.

The present invention relates to an aqueous suspension comprising (i) a compound of the formula:or a salt thereof, (ii) a condensate of formaldehyde with an aromatic sulfonic acid or a salt thereof or a polyoxyalkylene allyl phenyl ether sulfate, and (iii) an absorptive water-soluble polymer. The aqueous suspension of the invention can be used with advantage as a stable aqueous suspension of low viscosity providing for excellent delivery from a container, with excellent dispersibility in diluent water and excellent long-term fluidity free from caking due to precipitation of the suspended particles.

Photoacid generators generate sulfonic acids of formula (1a) or (1b) upon exposure to high-energy radiation.R1—COOCH2CF2SO3−H+  (1a)R1—O—COOCH2CF2SO3−H+  (1b)R1 is a monovalent C20-C50 hydrocarbon group of steroid structure which may contain a heteroatom. The bulky steroid structure ensures adequate control of acid diffusion. The photoacid generators are compatible with resins and suited for use in chemically amplified resist compositions.

A hydratable, highly absorbent keratin solid fiber or powder capable of absorbing a large weight excess of water may be produced by partially oxidizing hair keratin disulfide bonds to sulfonic acid residues and reacting the sulfonic acid residues with a cation. The neutralized suspension can be filtered, washed, and dried, leaving keratin solid which can be shredded into fibers and further ground into powder. Addition of water to the solid produces a hydrogel. The powder or hydrogel may be useful as an absorbent material, as a therapeutic for skin, or as an excipient. The keratin materials can be incorporated into nonwoven films. The hydrogel may be used as biocompatible viscoelastic filler for implant applications. Both the hydrogel and nonwoven materials are also suitable for use as tissue engineering scaffolds.

The invention relates to a modified copolyester slice or fiber and a relative preparation, wherein the slice is copolymerized from terephthalic acid, ethandiol, isophthalate esters of sulfonic acid sodium (or potassium), and fatty group dibasic alcohol (or relative alkylate) with side chain. And the preparation comprises that (1), mixing the ethandiol and the fatty group dibasic alcohol (or relative alkylate) into a mixed alcohol, adding catalyzer and stabilizer to esterify the terephthalic acid under 220-260Deg. C, (2), adding 1-9%mol isophthalate esters of sulfonic acid sodium (or potassium) relative to the terephthalic acid for polycondensation at 250-300Deg. C, (3), drying, fusing, spinning, and drawing to obtain the modified copolyester filament. The inventive product can dye anion paint and disperse paint into deep color at normal pressure, with better feeling, high contraction, hidden micro coiled property, simple preparation, low cost and batch production support.

The invention relates to a high-performance water reducer of polycarboxylic acid, and a preparation method thereof, belonging to the technical field of concrete admixtures in construction industry. The water reducer is prepared by 55-90% of polyoxyethylene ether or ester containing unsaturated double bonds, 8-30% of unsaturated carboxylic acid and derivative thereof, 0-25% of unsaturated sulfonic acid and salt thereof, 0-15% of unsaturated carboxylic esters, and 0.5-5% of redox initiator. The high-performance water reducer of polycarboxylic acid prepared by the invention has the advantages of high water-reducing rate and collapse protectiveness, and has good adaptability for base materials. The water reducer provided by the invention is featured with simple technology, easy material getting, no pollution and low cost, and is industrially produced easily.

The invention provides a novel class of cyanine dyes that are functionalized with sulfonic acid groups and a linker moiety that facilitates their conjugation to other species and substituent groups which increase the water-solubility, and optimize the optical properties of the dyes. Also provided are conjugates of the dyes, methods of using the dyes and their conjugates and kits including the dyes and their conjugates.

A barrier polishing liquid is provided that includes (a) a nonionic surfactant represented by Formula (I) below, (b) at least one type of organic acid selected from the group consisting of an aromatic sulfonic acid, an aromatic carboxylic acid, and a derivative thereof, (c) colloidal silica, and (d) benzotriazole or a derivative thereof.(In Formula (I), R1 to R6 independently denote a hydrogen atom or an alkyl group having 1 to 10 carbons, X and Y independently denote an ethyleneoxy group or a propyleneoxy group, and m and n independently denote an integer of 0 to 20.) There is also provided a chemical mechanical polishing method that includes supplying the barrier polishing liquid to a polishing pad on a polishing platen at a flow rate per unit area of a semiconductor substrate per unit time of 0.035 to 0.25 mL / (min·cm2), and polishing by making the polishing pad and a surface to be polished move relative to each other while they are in a contacted state.

A core unit for an energy recovery system for exchanging heat and vapor between two independent intake and exhaust airstreams without intermixing thereof, the core unit having a fibrous microporous support substrate and a sulfonated block copolymer having at least one end block A and at least one interior block B wherein each A block contains essentially no sulfonic acid or sulfonate ester functional groups and each B block is a polymer block containing from about 10 to about 100 mol percent sulfonic acid or sulfonate ester functional groups based on the number of monomer units, and wherein the sulfonated block copolymer is laminated on the microporous support substrate

New anionic surfactants and methods of preparation which are derived from aromatic or substituted aromatic molecules and alkenesulfonic acid. Wherein the aryl compound is alkylated and sulfonated in one-step with an alkene sulfonic acid prior to sulfonic acid neutralization. The methods allow the functional sulfonate group to be attached to the end of the alkyl chain rather than to the aromatic ring thus allowing for selective substituted groups, either branched, linear or alkoxylated or combinations thereof to be placed on the aryl compound prior to sulfonation and alkylation. The invention uses the alkene sulfonic acid produced from thin-film sulfonation of an alpha-olefin to alkylate benzene, mono-substituted aromatic, poly-substituted aromatic, alkylbenzene, alkoxylated benzene, polycyclic aromatic, mono-substituted polycyclic aromatic, poly-substituted polycyclic aromatic, naphthalene, alkylnaphthalene, phenol, alkylphenol, alkoxylated phenol, and alkoxylated alkylphenolalkyl substituted or polysubstituted cyclic or polycyclic compounds to produce the corresponding sulfonic acid having an additional alkyl group derived from the alpha-olefin used during the thin-film sulfonation which is either linear or branched.

A battery comprises an acid electrolyte in which a compound provides acidity to the electrolyte and further increases solubility of at least one metal in the redox pair. Especially preferred compounds include alkyl sulfonic acids, amine sulfonic acids, and alkyl phosphonic acids, and particularly preferred redox coupled include Co3+ / Zn0, Mn3+ / Zn0, Ce4+ / V2+, Ce4+ / Ti3+, Ce4+ / Zn0, and Pb4+ / Pb0.

A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt.In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.

A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.