The invention discloses a flexible
graphene /
silicon solar cell preparation method. The method comprises the following steps: to begin with, preparing a flexible
silicon wafer; then, carrying out sealing treatment on the flexible
silicon wafer; introducing an
inverted pyramid structure onto the surface of the flexible silicon
wafer; carrying out
passivation on the surface of the silicon wafer through a chemical
passivation or / and field
passivation method; realizing modification of
graphene quantum dots on the surface of the silicon wafer through a spin-
coating method; introducing a conductivelayer and transferring sheet
graphene; and finally, carrying out
electrode access, and thus finishing preparation of the flexible graphene /
silicon solar cell. The method prepares ultra-thin flexible silicon, and allows the silicon to bend and reduces consumption of silicon amount; a large-scaleinverted
pyramid array is introduced onto the surface of the ultrathin silicon substrate through low-costchemical
etching and
metal copper catalytic chemical
etching techniques, thereby increasing silicon substrate spectrum
absorption rate and reducing the surface area of the silicon; and the graphene and the
quantum dot layer are introduced to the graphene and ultrathin silicon interface, so that a
coating antireflection and
electron blocking layer function is achieved, the
cell is allowed to be more efficient, and the method is wider in application prospect.