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73 results about "Chlorine doping" patented technology

Method of manufacturing large capacity preforms by MCVD

The invention provides a low cost method of manufacturing high capacity preforms by chemical vapor deposition. More particularly, there is described a method of manufacturing an optical fiber preform, which method comprises the steps of providing a substrate tube of silica doped with sufficient chlorine to obtain an OH concentration of less than 100 ppb and doped with sufficient fluorine proportional to the chlorine doping to obtain a refractive index that is lower than that of a natural silica, depositing inner cladding and an optical core inside the substrate tube, collapsing the substrate tube to form a primary preform, and depositing outer cladding of said natural silica on the resulting primary preform. The invention is applicable to manufacturing optical fibers.
Owner:DRAKA COMTEQ BV

Preparation method of oxygen and chlorine co-doped graphene quantum dots

InactiveCN103359727AAverage distribution size narrowEasy to operateGrapheneDoped grapheneLuminescence
The invention discloses a preparation method of oxygen and chlorine co-doped graphene quantum dots, and relates to hydro-thermal preparation technology of the oxygen and chlorine co-doped graphene quantum dots. The hydro-thermal preparation technology of the oxygen and chlorine co-doped graphene quantum dots is characterized in that: under hydro-thermal conditions and hydrochloric acid catalysis conditions, a saccharide is used as a carbon source and an oxygen doping source, hydrochloric acid is used as a chlorine doping source, and water-soluble oxygen and chlorine co-doped graphene quantum dots are produced by water molecule-eliminating polymerization of saccharide molecules and the hydrochloric acid. The hydro-thermal preparation technology relates to simultaneous introduction of elements of oxygen and chlorine into the graphene quantum dots, so that electron transition effective energy levels in the graphene quantum dots can be increased, and furthermore the prepared oxygen and chlorine co-doped graphene quantum dots have more excellent luminescence and luminescence modulation performances.
Owner:YUNNAN NORMAL UNIV

Preparation and application of nitrogen, sulphur or chlorine-doped three-dimensional porous graphene catalyst

The invention provides a preparation and an application of a nitrogen, sulphur or chlorine-doped three-dimensional porous graphene catalyst. The preparation comprises the following steps: dissolving graphene oxide, an alkyl compound, a transition metal salt containing nitrogen, sulphur or chlorine and hydrochloric acid into a solvent, and carrying out ultrasonic treatment and drying to obtain a precursor; heating the precursor to 600-1,000 DEG C under inert gas protection and carrying out roasting reduction treatment for 1-3 hours to obtain primary carbide; carrying out pickling treatment on the obtained primary carbide with a mixed solution of hydrofluoric acid and hydrochloric acid at a room temperature for 12-24 hours, centrifuging the primary carbide, cleaning the primary carbide with deionized water and then drying the primary carbide to obtain the three-dimensional porous graphene material containing nitrogen, sulphur or chlorine; and heating the three-dimensional porous graphene material to 600-1,000 DEG C under inert gas protection, and carrying out roasting reduction treatment for 1-3 hours to obtain the nitrogen, sulphur or chlorine-doped three-dimensional porous graphene catalyst. The nitrogen, sulphur or chlorine-doped three-dimensional porous graphene catalyst has the characteristics of being high in stability, not easy to poison and the like, and has a good application prospect in the fields of wastewater treatment of a fuel cell, a metal-air cell, a super capacitor, an energy storage battery and a microbial fuel cell and the like.
Owner:DONGHUA UNIV

Low attenuation single-mode optical fiber and preparation method thereof

The present invention relates to a low attenuation single-mode optical fiber and a preparation method thereof. The low attenuation single-mode optical fiber comprises a core layer and a cladding layer. The low attenuation single-mode optical fiber is characterized in that the radius r1 of the core layer is 3.5 to 4.0 micrometers, the relative refractive index difference Delta1 of the core layer is 0.33%to 0.36%, an inner cladding layer and an outer cladding layer are orderly coated from inside to outside outside the core layer, the radius r2 of the inner cladding layer is 12 to 14 micrometers, the relative refractive index difference Delta2 of the inner cladding layer is 0.01%to 0.01%, the radius r3 of the outer cladding layer is 62 to 63 micrometers, and the outer cladding layer is a pure silica glass layer. A core rod is manufactured through VAD process, the glass core rod with a germanium and chlorine doped core layer and a fluorine and chlorine doped inner cladding layer is obtained, the core rod is sleeved in a pure silica outer sleeve tube, or the outer cladding layer is deposited outside the core rod through OVD process, a prefabricated rod for drawing can be obtained, and the prefabricated rod is drawn in a drawing speed of 1500 to 3300 m/min to form an optical fiber. According to the low attenuation single-mode optical fiber and the preparation method, through doping chlorine, a core layer germanium doping amount is reduced and core layer and cladding layer viscosity matching is improved to realize the low attenuation of the optical fiber, and optical fiber preparation process is simple, the production cost is low, the process is stable, and the qualified rate of output is high.
Owner:YANGTZE OPTICAL FIBRE & CABLE CO LTD

Process for surface diffusion treatment of silicon chip of solar cell

The invention relates to the technical field of solar cell manufacturing, in particular to a process for the surface diffusion treatment of a silicon chip of a solar cell. The process comprises the following steps: firstly, before diffusion source deposition, introducing gases containing chlorine and oxygen into a diffusion furnace to perform chlorine doped oxidization treatment on the silicon chip surface to form a layer of silicon dioxide layer containing chlorine on the surface of the silicon chip; and secondly, performing diffusion source deposition. The chlorine doped oxidization treatment performed before a normal diffusion process can effectively reduce the surface recombination of the silicon chip and realize an excellent surface state, so the performance of finished cells is improved. The novel process avoids increasing novel processing equipment and manpower, influence on productivity and environmental pollution, and is extremely suitable for the industrial application.
Owner:TRINA SOLAR CO LTD

Method of manufacturing large capacity preforms by MCVD

The invention provides a low cost method of manufacturing high capacity preforms by chemical vapor deposition. More particularly, there is described a method of manufacturing an optical fiber preform, which method comprises the steps of providing a substrate tube of silica doped with sufficient chlorine to obtain an OH concentration of less than 100 ppb and doped with sufficient fluorine proportional to the chlorine doping to obtain a refractive index that is lower than that of a natural silica, depositing inner cladding and an optical core inside the substrate tube, collapsing the substrate tube to form a primary preform, and depositing outer cladding of said natural silica on the resulting primary preform. The invention is applicable to manufacturing optical fibers.
Owner:DRAKA COMTEQ BV

Preparation method for chlorine-doped carbon quantum dot/g-C3N4 nano sheet composite material for high-effectively degrading antibiotics

The invention belongs to the technical field of photocatalysis and particularly relates to a preparation method for a chlorine-doped carbon quantum dot / g-C3N4 nano sheet composite material for high-effectively degrading antibiotics. G-C3N4 nano sheets are produced through two-time calcinations in air; then the g-C3N4 nano sheets are subjected to protonation in a hydrochloric acid solution; a chlorine-doped carbon quantum dot solution is then produced with ethylene glycol and thionyl chloride as raw materials; and finally, the composite material is prepared from the chlorine-doped carbon quantum dot solution and the protonated g-C3N4 nano sheets through an electrostatic self-assembly method. The composite material is enhanced in absorption to visible lights and effectively separates photon-generated carriers, and further can be effectively applied to photocatytic degradation of antibiotics.
Owner:黄山市开发投资集团有限公司

Preparation method for supermolecular pre-assembled carbon nitride nanotube photocatalyst

The invention relates to a photocatalyst, especially to a supermolecular pre-assembled carbon nitride nanotube photocatalyst and a preparation method thereof, belonging to the technical field of preparation methods for photocatalysis materials. The preparation method comprises the following steps: preparing a rod-like supermolecular intermediate with a structured morphology by using a low-temperature hydrothermal process; and carrying out calcining in a tubular furnace so as to obtain a chlorine-doped carbon nitride nanotube with a good morphology. The preparation method overcomes the problemsof low visible light utilization rate, low degradation efficiency of high-concentration organic dyes and the like of conventional photocatalysts in virtue of the characteristics of the tubular structure of the chlorine-doped carbon nitride nanotube and changes in an energy band structure caused by introduction of elemental chlorine.
Owner:JIANGSU UNIV

Single mode optical fiber with improved bend performance

Methods and apparatus relate to optical fibers suitable for use in sensing applications exposed to radiation environments. The fibers include a core of pure silica or chlorine doped silica surrounded by a fluorinated silica cladding. These glasses for the core and cladding utilize dopants that resist radiation-induced attenuation. A two step process for forming the cladding can achieve necessary concentrations of the fluorine by performing a soot deposition process in a different environment from a consolidation process where the soot is sintered into a glass. Concentration of fluorine doped into the cladding layer enables obtaining a numerical aperture that confines a mono-mode of the fiber to resist bend-induced attenuation. Dimensions of the fiber further facilitate bending ability of the fiber.
Owner:WEATHERFORD TECH HLDG LLC

Chlorine-doped modified lithium ion battery lithium-rich cathode material and preparation method thereof

The invention relates to a chlorine-doped modified lithium ion battery lithium-rich cathode material and a preparation method thereof and belongs to the field of lithium ion batteries. The cathode material is Li[Li0.2Ni(0.2-0.5b+0.5a)CobMn(0.6-0.5b-0.5a)]O(2-a)Cl(a), wherein a is more than 0 and not more than 0.1, and b is not less than 0 and not more than 0.13; and lithium salt, nickel salt, manganese salt, cobalt salt, lithium chloride and a combustion improver are ground into fine powder, a solvent is added and then uniformly mixed, and the lithium ion battery lithium-rich cathode material is obtained by firing. The lithium ion battery lithium-rich cathode material is high in discharge specific capacity, high in cycle stability, high in magnification performance and compatible in high-temperature performance and low-temperature performance, and can meet requirements of a power battery. The chloride salt for doping is rich in source, low in cost, environment-friendly, simple and practicable in synthesis process, low in manufacturing cost, convenient for large-scale industrial production and high in practicability.
Owner:JIANGNAN UNIV

Ultralow-attenuation and large-effective-area single-mode fiber

InactiveCN106997073AIncreased chlorine doping contentAccelerated structural relaxationOptical fibre with multilayer core/claddingOptical waveguide light guideUltrasound attenuationFiber strain
The invention relates to an ultralow-attenuation and large-effective-area single-mode fiber comprising a core layer and wrapping layers. The ultralow-attenuation and large-effective-area single-mode fiber is characterized in that the radius r1 of the core layer is 5-8 microns, the relative refractive index deltan1 of the core layer is 0-0.20%, and the core layer wraps an internal wrapping layer, a recessed internal wrapping layer and an external wrapping layer from inside to outside in turn. The radius r2 of the internal wrapping layer is 8.5-12 microns, and the relative refractive index deltan2 is -0.20--0.45%. The radius r3 of the recessed internal wrapping layer is 12.5-30 microns, and the relative refractive index deltan3 is -0.40--0.65%. The external wrapping layer is a fully fluoridated silicon dioxide glass layer, and the relative refractive index deltan4 is -0.22--0.53%. The ultralow-attenuation and large-effective-area single-mode fiber has the specific viscosity matching design: the core layer is not the pure silicon core and has the characteristics of co-doping of germanium and fluorine, and the chlorine doping technology is also performed so that the fiber viscosity can be reduced and the structural relaxation of glass can be accelerated; and the core layer viscosity matching is optimized by controlling the doping concentration, and the viscosity of each part of the fiber and the fiber strain are optimized so that ultralow-attenuation performance of the single-mode fiber can be realized.
Owner:YANGTZE OPTICAL FIBRE & CABLE CO LTD

Method for manufacturing semiconductor device

The invention discloses a method for manufacturing a semiconductor device. The method comprises the following steps of: firstly, forming a contact hole etching stop layer which is prepared from boron-doped amorphous carbon, fluorine-doped amorphous carbon, chlorine-doped amorphous carbon or amorphous carbon; secondly, depositing a medium layer on the contact hole etching stop layer, and etching the medium layer and stopping etching on the upper surface of the contact hole etching stop layer to form a groove; and finally, incinerating the contact hole etching stop layer in the groove to form a contact hole. By the method, the damage to the semiconductor device in the process of etching the contact hole can be avoided.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Light-emitting film based on chlorine-doped graphene quantum dots and preparation method thereof

The invention provides a preparation method of a light-emitting film based on chlorine-doped graphene quantum dots and belongs to the technical field of light-emitting materials. The preparation method of the light-emitting film based on the chlorine-doped graphene quantum dots is characterized in that the chlorine-doped graphene quantum dots prepared by adopting a hydrothermal method are bound with a silicon resin matrix together, on one hand, silicon resin serves as a dispersing medium of the chlorine-doped graphene quantum dots to prevent agglomeration and fluorescence quenching of the graphene quantum dots, and on the other hand, mechanical properties and chemical stability are provided for the light-emitting film. The prepared light-emitting film has better transparency, heat stability and high luminous intensity and is suitable for ultraviolet excited white-light LED.
Owner:HARBIN INST OF TECH SHENZHEN GRADUATE SCHOOL

Co-combustion preparation method of chlorine doped graphene quantum dots

ActiveCN105600780AModulation of optoelectronic propertiesSimple processGrapheneDoped grapheneMaterials science
The invention relates to a preparation method of graphene quantum dots, in particular to a co-combustion preparation method of chlorine doped graphene quantum dots. The chlorine doped graphene quantum dots are prepared from liquid paraffin and trichloromethane through a co-combustion method. According to the co-combustion preparation method of the chlorine doped graphene quantum dots, the energy level of the graphene quantum dots is effectively adjusted through doping of heterogeneous chlorine atoms, and the photoelectric property of the graphene quantum dots is optimized. The preparation method is characterized in that the chlorine doped graphene quantum dots are obtained in co-combustion, ultrasound and other modes. The co-combustion preparation method of the chlorine doped graphene quantum dots is implemented in co-combustion, ultrasound and centrifugal separation and other modes, the overall technical route is creative, reaction and doping are completed at a time, the doping concentration is adjustable, and the obtained chlorine doped graphene quantum dots have the more excellent photoelectric property and are suitable for batch production.
Owner:KUNMING INST OF PHYSICS

Method for testing diffusion coefficient of iodide ions in concrete

InactiveCN107300513ASolving the Diffusion Coefficient ConundrumSolving the Permeability ConundrumSurface/boundary effectDiffusionSodium iodide
The invention discloses a method for testing the iodide ion diffusion coefficient of concrete, which comprises the following steps: soaking the treated concrete test block in an aqueous solution of sodium iodide for not less than 30 days; The iodide ion deposition amount of each layer was obtained by chemical analysis of the powder sample; the iodide ion diffusion coefficient was calculated by nonlinear fitting of Fick's second diffusion equation with the obtained iodide ion deposition amount data of each layer. The present invention uses iodide ions instead of chloride ions as penetrating ions when measuring the diffusion coefficient of chlorine ions, studies the penetration process and combination mechanism of iodide ions in concrete structures, and compares them with the diffusion process and combination of chloride ions to establish iodine ions. The ion natural diffusion experiment method calculates the iodine ion diffusion coefficient and then converts it into the chloride ion diffusion coefficient, thereby solving the problem of the permeability coefficient of the internal chloride ion concrete structure.
Owner:SHENZHEN UNIV

Nano-structure polypyrrole/biotin composite material based on conductive base material, preparation method and application

The invention belongs to the technical field of medical biomaterials, and discloses a nano-structure polypyrrole / biotin composite material based on a conductive base material, a preparation method and application. The preparation method for the nano-structure polypyrrole / biotin composite material based on the conductive base material comprises the steps that firstly, the chlorine-doped polypyrrole is electro-deposited on the surface of the conductive base material by adopting chronoamperometry; then a three-electrode mode is selected, conductive metal is a counter electrode, the conductive base material with the polypyrrole deposited on the surface is a working electrode, an electrolyte is a buffer solution containing pyrrole and biotin, and chronopotentiometry is adopted so as to obtain the nano-structure polypyrrole / biotin composite material based on the conductive base material; when the buffer solution is neutral, a nano-cone-structure polypyrrole / biotin material is deposited on the surface of the working electrode; and when the buffer solution is acidic or alkaline, a nano-particle-structure polypyrrole / biotin material is deposited on the surface of the working electrode. The preparation method is simple, the cost is low, the nano structure of the prepared composite material is stable, and the preparation method can be used for preparing materials for efficiently capturing and releasing circulating tumor cancer cells.
Owner:SOUTH CHINA UNIV OF TECH +1

Preparation method of chlorine-doped multilayer graphene film

The invention discloses a preparation method of a chlorine-doped multilayer graphene film, relates to a preparation method of a semiconductor type chlorine-doped graphene film, and especially relates to a preparation method of a chlorine-doped multilayer graphene film with good photoelectric performance, obtained by preparing a solution by use of a simple-process liquid-phase chemical reaction, then performing spin coating and then performing high-temperature annealing processing by use of cheap glycol and sulfuric acid as raw materials. The preparation method of the chlorine-doped multilayer graphene film is characterized in that the chlorine-doped graphene film is generated at a time by performing spin coating and annealing on a solution generated through a reaction by use of glycol and hydrochloric acid according to a certain mol ratio and the method comprises three steps, i.e., the liquid-phase chemical reaction, the spin coating and the annealing. According to the preparation method of the semiconductor type chlorine-doped graphene film, through a chlorine doping mode, the energy grade of the graphene film is modulated, the performance of the graphene film is effectively changed, the chlorine-doped graphene film prepared by use of the method is enabled to have better photoelectric and luminescence modulation performance, and the method can be applied to the field of a photoelectric detector.
Owner:KUNMING INST OF PHYSICS

Oxidation treatment process of crystalline silicon solar cell

The invention discloses an oxidation treatment process of a crystalline silicon solar cell, comprising the following steps: (1) heating dry oxygen pre-oxidation: a silicon wafer is pushed into an oxidation tube, the temperature is increased to 850-900 DEG C, dry oxygen is introduced, oxidation is carried out, and a silicon dioxide layer is formed on the surface of the silicon wafer, wherein the reaction time is 100-600 seconds; (2) high temperature chlorine-doped oxidation: dry oxygen is continuously introduced, the temperature is increased to 900-950 DEG C, trichloroethane is introduced, and the condition is maintained for 1500-2500 seconds; (3) constant temperature propulsive oxidation: the temperature in step (2) is maintained, the introduction of trichloroethane is stopped, dry oxygen is continuously introduced, and the condition is maintained for 300-800 seconds; and (4) temperature reduction: the introduction of dry oxygen is stopped, and the silicon wafer is taken out from the oxidation tube. In the oxidation treatment process provided by the invention, the processing time of the whole process is greatly reduced, and the problems that resource waste is caused by long-time oxidation and the capacity is reduced are avoided, thus having positive realistic significance.
Owner:CSI CELLS CO LTD +1

Chlorine-doped graphene and preparation method and application thereof

The invention discloses a chlorine-doped graphene and a preparation method and an application thereof in preparation of an oxygen reduction electrode. The preparation method of the chlorine-doped graphene comprises the following steps of: refluxing methyl chloride at 65-160 DEG C for 10-30 minutes to obtain a methyl chloride reflux, combusting a magnesium rod in air and rapidly placing in the methyl chloride reflux, and filtering after reaction, so as to obtain a filter cake; flushing the filter cake with absolute ethyl alcohol, and carrying out centrifugal separation to obtain sediment a; adding the sediment a in hydrochloric acid, stirring completely for 10-30 minutes, and carrying out centrifugal separation to obtain sediment b, washing the sediment b successively with purified water and absolute ethyl alcohol, carrying out centrifugal separation on the washing liquid to obtain sediment c, and carrying out freeze drying on the sediment c to obtain the chlorine-doped graphene. The chlorine-doped graphene is high in catalytic activity, and the oxygen reduction catalytic activity and stability are obviously improved. The method is simple in process, convenient to operate, short in reaction time and low in equipment request, and is easy to implement.
Owner:永嘉跃龙密封件有限公司

A doped and coated modified lithium nickel cobalt aluminate cathode material and a preparation method thereof

The invention particularly relates to a doped coated modified lithium nickel cobalt aluminate cathode material and a preparation method thereof. A lithium nickel-cobalt aluminate cathode material doped with coating modification comprises a chlorine-doped lithium nickel-cobalt oxide core and a coating layer; The coating consists of polyaniline and Li4Ti5O_12. The chemical composition of Cl-doped lithium nickel cobalt oxide core is LiNi 1-X-YCoyAlxClzO2-0.5z, where 0.030 <= x <= 0. 050, 0.100 <= y <= 0. 150, 0.005 <= z <= 0. 0075. The invention uses doping and coating means to modify the lithiumnickel cobalt aluminate material at the same time, and starts from the inside and outside of the material, not only improves the internal crystal structure, but also improves the corrosion of the side reaction of the electrolyte, and on the premise of not significantly affecting the capacity of the lithium nickel cobalt aluminate cathode material, effectively improves the cycling stability of thematerial.
Owner:ENERGY RESOURCES INST HEBEI ACADEMY OF SCI

Chlorine-doped tin-oxide particles and manufacturing method therefor

A chlorine-doped tin oxide particle exhibits peaks at at least 108±5 cm−1, 122±5 cm−1, and 133±5 cm−1 in Raman spectroscopy. The chlorine-doped tin oxide particle preferably has an additional Raman spectral peak at 337±10 cm−1. The chlorine-doped tin oxide particle preferably has a specific surface area of 10 to 300 m2 / g. The chlorine-doped tin oxide particle preferably has an average primary particle size of 3 to 200 nm. The chlorine-doped tin oxide particle is preferably substantially free of oxygen deficiency.
Owner:MITSUI MINING & SMELTING CO LTD

Preparation method for chlorine doped titanium dioxide photocatalyst

The invention discloses a preparation method for a chlorine doped titanium dioxide photocatalyst. The method comprises the following steps: (1) mixing titanium dioxide powder, sodium chloride and absolute ethyl alcohol and ball-milling, thereby acquiring wet powder, wherein the mass ratio of titanium dioxide powder to sodium chloride is (2.6-3):1, and (2) drying the wet powder and calcining for 5-7 hours under the condition of 600-800 DEG C. The spherical titanium dioxide crystal particle acquired according to the invention is in uniform size. The degradation rate of the chlorine doped titanium dioxide to ciprofloxacin wastewater is above 87%.
Owner:张家港市金港镇宏业海绵复合厂

Application of chlorine-doped polymer matrix composite to chloride-ion battery cathode material

ActiveCN106299288ASolve the problem of desolvationResolve volume changesMaterial nanotechnologyCell electrodesMetal chloridePolymer science
The invention relates to an application of a chlorine-doped polymer matrix composite to a chloride-ion battery cathode material. The mass of a chlorine-doped polymer in the chlorine-doped polymer matrix composite is 50%-100% of that of the polymer matrix composite, and the mass of a carbon material is 0-50% of that of the polymer matrix composite. With the adoption of the chlorine-doped polymer matrix composite, the problem of desolvation of a chloride-ion battery metal chloride cathode material and the problem of larger volume change of the metal chloride cathode material in charging and discharging processes can be solved, the cyclic stability of the chloride-ion battery cathode material can be remarkably improved, and the chlorine-doped polymer matrix composite play an important role in promoting development of high-stability chloride-ion batteries.
Owner:NANJING UNIV OF TECH

Ultralow-attenuation large-effective-area single-mode optical fiber

The invention relates to an ultralow-attenuation large-effective-area single-mode optical fiber. The optical fiber comprises a core layer and a cladding layer, the cable is characterized in that the radius r1 of the core layer is 8-10 [mu] m; the relative refractive index delta n1 of the core layer is-0.10% to 0.20%; the core layer is sequentially coated with an inner cladding layer, a sunken inner cladding layer and an outer cladding layer from inside to outside; the radius r2 of the inner cladding is 11-15 [mu] m; wherein the radius r3 of the sunken inner cladding ranges from 16 microns to 50 microns, the relative refractive index delta n3 of the sunken inner cladding ranges from-0.30% to-0.70%, the outer cladding is a full fluorine-doped silicon dioxide glass layer, and the relative refractive index delta n4 of the sunken inner cladding ranges from-0.15% to-0.60%. According to the specific viscosity matching design, the core layer is a non-pure silicon core and has the characteristic of co-doping of germanium and fluorine, and meanwhile, a chlorine doping process is carried out, so that the viscosity of the optical fiber is reduced, the structural relaxation of glass is accelerated, the viscosity of each part of the optical fiber and the stress of the optical fiber are optimized, and the single-mode optical fiber performance with large effective area and ultralow attenuationis realized.
Owner:YANGTZE OPTICAL FIBRE & CABLE CO LTD

Process for preparing chlorine blended metal oxide catalyst

The preparation process of chlorine doped metal oxide catalyst includes the following steps: dissolving metal oxide precursor and chlorine dopant in certain ratio in water to obtain mixture solution; adding dispersant in 0-3 times the molar amount of metal oxide precursor and chlorine dopant into the solution to obtain gel precursor solution; soaking catalyst carrier in 1-100 times the weight of metal oxide precursor and chlorine dopant inside the gel precursor solution and drying to obtain catalyst precursor; and calcining in air atmosphere at 100-800 deg c to obtain the chlorine doped metal oxide catalyst. The chlorine doped metal oxide catalyst has very high mercury catalytically oxidizing capacity, and has simple preparation process and industrial application foreground.
Owner:SHANGHAI JIAO TONG UNIV

Preparation method of chlorine-doped bismuth ferrite photoelectric film

The invention relates to a preparation method of chlorine-doped bismuth ferrite photoelectric film. The method includes: mixing and dissolving bismuth nitrate, iron nitrate and ferric trichloride in ethylene glycol monomethyl ether, heating and stirring, cooling to room temperature, adding glacial acetic acid, continuing to stir, ageing and filtering to obtain sol-gel precursor solution, spinning to a substrate, and annealing at a set temperature to obtain the chlorine-doped bismuth ferrite photoelectric film. The chlorine-doped bismuth ferrite photoelectric film sample obtained through the method described herein has trigonal perovskite structure as well as good light-absorbing characteristic and is potentially applicable to the field of multifunctional photoelectric devices. The method described herein has simple steps and low equipment cost and facilitates large-scale production.
Owner:XINJIANG TECHN INST OF PHYSICS & CHEM CHINESE ACAD OF SCI

Nitrogen and chlorine co-doped graphene quantum dot with ultra-small size and dual-emission of blue light and green light, and preparation method of graphene quantum dot

The invention discloses a nitrogen and chlorine co-doped graphene quantum dot with an ultra-small size and dual-emission of blue light and green light, and a preparation method of the graphene quantumdot, and belongs to the technical field of nano-functional materials. According to the problems of single doped element, relatively large size, single fluorescence emission and the like in the priorgraphene quantum dots, citric acid is used as a carbon source according to the invention, 1,2,4-triaminobenzene dihydrochloride is used as a doping source, and a nitrogen source and a chlorine sourceare provided at the same time. Compared with the prior art in which hydrochloric acid is used as the chlorine doping source, the preparation method has reduced pollution of strong acids, and the preparation of the graphene quantum dot with an ultra-small size can be realized, wherein the minimum size reaches 0.8nm and the blue-green light dual-emission property is achieved. The preparation methodprovided by the invention is simple, and can be applied to large-scale industrial production.
Owner:JILIN NORMAL UNIV

Low bend loss optical fiber with a chlorine doped core and offset trench

An optical fiber includes (i) a chlorine doped silica based core having a core alpha (Core alpha) >=4, a radius r1, and a maximum refractive index delta 1max % and (ii) a cladding surrounding the core. The cladding surrounding the core includes a) a first inner cladding region adjacent to and in contact with the core and having a refractive index delta 2, a radius r2, and a minimum refractive index delta 2min such that delta 2min < delta 1max, b) a second inner cladding adjacent to and in contact with the first inner cladding having a refractive index delta 3, a radius r3, and a minimum refractive index delta 3min such that 3min < delta 2, and c) an outer cladding region surrounding the second inner cladding region and having a refractive index delta5, a radius rmax, and a minimum refractive index delta 3min such that delta 3min < delta 2.
Owner:CORNING INC
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