389 results about "Afm atomic force microscopy" patented technology

Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.

Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e.g., atomic force microscope tips, etc.) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.

The invention discloses a manufacturing method of a piezoelectric micro-cantilever beam probe, belonging to the technical field of micro-mechanical sensors and actuators. The invention is characterized in that a partial piezoelectric layer is adopted to realize integration of the manufacturing technique of a nano silicon needle point and the manufacturing technique of a piezoelectric film. In the manufacturing process, the nano silicon needle point adopts anisotropic wet corrosion method with a mask; the piezoelectric film is manufactured by adopting a sol-gel method. The invention has the beneficial effects of having both functions of sensing and executing by adopting the piezoelectric film as a sensitive part, being capable of finishing the whole technological process by adopting a dry etching and wet etching technique, having lower requirements on the technological equipment, being capable of being produced in batches and reducing the cost of products. The piezoelectric micro-cantilever beam probe manufactured by the method can be used for atomic force microscopes, nano-imprint storage devices and field emission devices.

The invention discloses a single-cell / single-molecule imaging light / electricity comprehensive tester based on a multifunctional probe. The tester comprises the multifunctional nano-probe, a sample pool, an atomic force microscope system, a light source unit, an electricity testing unit, a cell sample locating system and a photon testing unit. The light source unit, the electricity testing unit, the cell sample locating system and the photon testing unit are respectively connected with a data collection and analyzing unit. The multifunctional nano-probe comprises an optical fiber layer, a nano electrode layer and an insulation layer. The nano electrode layer and the insulation layer are wrapped on the outer wall of the optical fiber layer in sequence. The synchronization comprehensive tester comprises a manufacturing method of the nano-probe which can carry out atomic force scanning imaging on single-cells / single-molecules and carry out light / electricity testing at the same time, a manufacturing method of the sample pool and relevant optics, electricity and mechanics testing and analyzing instruments. Temporal-spatial resolution and the range of target objects which can be tested are greatly improved, the tester can be widely used in biology and medicine and be used for fundamental research and disease testing under the level of sub-cells and molecules, and the tester has great development significance on tumor early diagnosis, medicine development and agricultural science.

A diffraction grating having a transparent supporting substrate; and a cured resin layer which is stacked on the transparent supporting substrate and which has concavities and convexities formed on a surface thereof, wherein when a Fourier-transformed image is obtained by performing two-dimensional fast Fourier transform processing on a concavity and convexity analysis image obtained by analyzing a shape of the concavities and convexities formed on the surface of the cured resin layer by use of an atomic force microscope, the Fourier-transformed image shows a circular or annular pattern substantially centered at an origin at which an absolute value of wavenumber is 0 μm−1, and the circular or annular pattern is present within a region where an absolute value of wavenumber is within a range of 10 μm−1 or less.

The present application discloses a method for detecting a presence of target ligand in a fluid medium which includes the steps of: (i) contacting the fluid medium with a solid substrate that includes an array of dendrons on its surface, wherein each of the dendron includes a central atom, a probe that is attached to the central atom optionally through a linker, and a base portion attached to the central atom and having a plurality of termini that are attached to the surface of the solid support; and (ii) determining the presence of a probe-target ligand complex by measuring binding force between the bound ligand and detection molecule tethered to the tip of an atomic force microscope (“AFM”), which detection molecule has affinity for the ligand, wherein measurement of an increase in force between the probe-target ligand complex and the detection molecule by AFM indicates the presence of the probe-target ligand complex.

The present invention provides an apparatus and method including hardware and software, which allows collecting and analyzing of data to obtain information about mechanical properties of soft materials. This allows surface mapping of viscoelastic properties in a high-resolution and fast manner. It also allows finding the degree of nonlinearity of the material response of the sample during the measurements. The apparatus can be used as a stand-alone device, or an add-on to either the existing atomic force microscope or nanoindenter device.

The invention provides polishing solution used on the surface of the high quality polished silicon carbide wafer, a preparation method of the polishing solution and a use method of the polishing solution. The polishing solution is prepared from deionized water, silica polishing solution, auxiliary oxidant and pH regulator. The polishing solution prepared by the method is odorless, has state and no precipitate and can be dispersed evenly and properly recycled; when the polishing solution is used to process the wafer, the removal rate is high; the processed silicon carbide wafer is brighter; the wafer has no unnoticeable scratches and is smooth and uniform when observed by a microscope with 50 fold magnification; and the surface roughness can reach nanometer level stably through the detection of an atomic force microscope. The cycle count of the polishing solution can be adjusted by changing the amounts of the added auxiliary oxidant and pH regulator or the ratio of the auxiliary oxidant and the pH regulator.

The problem addressed by this invention is to provide an aromatic polyamide porous film excellent in the capability of being thinned and capable of easily exhibiting stable porosity properties even if it is used for a long period of time at high temperature. This invention can be achieved by an aromatic polyamide porous film that contains an aromatic polyamide as a main component and is such that when an atomic force microscope is used to measure a range of S μm2 at least on one surface, the sectional area S(10) μm2 obtained at a depth of 10 nm from the surface and the sectional area S(20) μm2 obtained at a depth of 20 nm from the surface satisfy the following formulae simultaneously.0.01≦S(10) / S≦0.35≦S(20) / S(10)≦20