3327 results about "Standing wave" patented technology

We have discovered methods of controlling a combination of PECVD deposition process parameters during deposition of thin films which provides improved control over surface standing wave effects which affect deposited film thickness uniformity and physical property uniformity. By minimizing surface standing wave effects, the uniformity of film properties across a substrate surface onto which the films have been deposited is improved. In addition, we have developed a gas diffusion plate design which assists in the control of plasma density to be symmetrical or asymmetrical over a substrate surface during film deposition, which also provides improved control over uniformity of deposited film thickness.

A low-EMI circuit which realizes a high mounting density by converting the potential fluctuation off a power supply layer with respect to a ground layer which occurs on switching an IC device etc., into Joule's heat in the substrate without using any parts as a countermeasure against the EMI. Its structure, a circuit board using it, and a method of manufacturing the circuit board are also disclosed. Parallel plate lines in which the Q-value of the stray capacitance between solid layers viewed from the power supply layer and ground layer is equivalently reduced and which are matchedly terminated by forming a structure in which a resistor (resistor layer) and another ground layer are provided in addition to the power supply layer and the ground layer on a multilayered circuit board. A closed shield structure is also disclosed. This invention can remarkably suppress unwanted radiation by absorbing the potential fluctuation (resonance) which occurs in a power supply loop by equivalently reducing the Q-value of the stray capacitance, absorbing the standing wave by the parallel plate lines matchedly terminated and, closing and shielding the parallel plate lines.

Embodiments disclosed herein generally relate to obtaining a substantially uniform plasma distribution within a large area processing chamber. For large area processing chambers that utilize RF voltages, standing waves can lead to deposition and / or etching non-uniformities. By applying RF voltage in at least two separate locations at two separate, but close frequencies with or without phase modulation, the wave interference pattern moves across the electrode. By moving the standing wave across the electrode, the plasma generated in the chamber can, over time, be substantially uniform.

Fluid-handling methods and devices for ultrasonic manipulation of fluid-borne particles comprise a fluid-handling manifold and an ultrasonic particle manipulator defining an ultrasonic cavity within the manifold. Fluid-borne particles introduced into the manifold are manipulated by controlling ultrasonic standing waves at the ultrasonic cavity. Cavities having non-uniform configurations, asymmetric standing waves and / or multiple ultrasonic cavities within the manifold are operative to control the movement of the fluid-borne particles, optionally including collecting and holding such particles, transferring particles through an intersection from one channel to another, etc. Solid phase extraction (SPE) particles, biological particles and other fluid-borne particles can be manipulated within the fluid-handling manifold.

The present application is directed to the separation of—a solid fraction from a fluid sample particularly a therapeutic cellular fraction from a biological sample such as a bone marrow sample by a porous filter (2) which separates a filtration unit (1) into an upper pre-filtration chamber (3) into which a fluid sample (4) requiring cell separation is introduced and a lower post-filtration chamber (5) into which a fluid (6) capable of transmitting an acoustic standing wave is introduced. An acoustic element (8) is coupled to a substrate (7) which is located within and at the bottom of the lower chamber (5) and which resonates in response to the acoustic generating element (8) and generates a standing wave through the two fluid phases and the filter to agitate the sample (4). Simultaneously, a cyclic process of vacuum draw (9). causes movement of the sample (4) downwards through the filter (2). Vacuum pressure, fluid flow rate and frequency of vibration are controlled from a remote unit housing appropriate pumps and valves.

A noise suppression method of a wave filter used to eliminate standing wave signal interferences in the acoustic wave filter consisted by a plurality of film bulk acoustic resonators (FBARs). The method is to provide a plurality of scatterers in the structured consisted by the FBARs, thereby creating an band-gap structure due to the material characteristics difference, which consequently generates a destructive interfering effect to the transverse higher harmonics vibration within a specific operating frequency range, and ultimately decreases or even eliminates any parasitic effects. Therefore, within the operation frequency range of this band-gap structure, abnormal signals created by any transverse wave modes cannot exist. In addition, an acoustic shield can be provided by phononic crystal structures between different FBARs, thus acoustic shielding any mutual interference within the operation frequency range.

A sample substrate adapted for use with fluorescence excitation light with a first wavelength. A reflector is disposed on a base. The reflector includes a reflecting multilayer interference coating with at least two layers. Not all of the layers L fulfill a quarterwave condition: dL·nL=(2N+1)·¼ wherein dL is a physical thickness of layer L, nL is an index of refraction of layer L at the first wavelength, N is an integer equal to or greater than zero and 1 is the first wavelength. Thicknesses of the layers ensure that any fluorescent sample material disposed on top of said multilayer interference coating would be located near an antinode of a standing wave formed by the excitation light with the first wavelength incident on said substrate.