Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

986 results about "Planar substrate" patented technology

Planar Substrate, Window Board. A substrate for polishing and processing of optical glass with high precision, with increased surface accuracy and parallelism.

Pressure sensing or force generating device

In one aspect, the present invention relates to a pressure sensing / force generating device comprising a non-planar substrate, a printed pressure sensitive element comprising (a) a piezoelectric material containing ink composition capable of producing a piezoelectric effect / piezoresistive effect and / or (b) a dielectric material containing ink composition capable of producing a capacitive effect. It also includes a first printed electrode comprising a conductive ink composition, and a second printed electrode comprising a conductive ink composition. The first and second electrodes are in electrical contact with the printed pressure sensitive element. The first and second printed electrodes and the printed pressure sensitive element collectively form a pressure sensitive junction, which is coupled to the non-planar substrate. The present invention further relates to medical devices comprising the pressure sensing / force generating device and methods of making such devices.
Owner:MICROPEN TECH CORP

Three-dimensional memory array stacking structure

A memory device includes a planar substrate, a plurality of horizontal conductive planes above the planar substrate, and a plurality of horizontal insulating layers interleaved with the plurality of horizontal conductive planes. An array of vertical conductive columns, perpendicular to the pluralities of conductive planes and insulating layers, passes through apertures in the pluralities of conductive planes and insulating layers. The memory device includes a plurality of programmable memory elements, each of which couples one of the horizontal conductive planes to a respective vertical conductive column.
Owner:RAMBUS INC

Microfluidic reactor system

A compact device for operatively coupling a solid planar substrate, for example a glass slide, to a microfluidic circuit and performing a reaction or reactions on organic matter bound to the face of the planar substrate. Typical reactions include binding, staining and / or labeling reactions. In use, a sealed reaction chamber is formed, the chamber enclosing the organic matter and at least a part of the solid substrate. Headspace in the sealed chamber between the solid substrate is generally of microfluidic dimensions, and diaphragm pump members are used to inject, exchange and / or mix the fluids in the chamber.
Owner:PERKINELMER HEALTH SCIENCES INC

Planar substrate devices integrated with finfets and method of manufacture

A planar substrate device integrated with fin field effect transistors (FinFETs) and a method of manufacture comprises a silicon-on-insulator (SOI) wafer comprising a substrate; a buried insulator layer over the substrate; and a semiconductor layer over the buried insulator layer. The structure further comprises a FinFET over the buried insulator layer and a field effect transistor (FET) integrated in the substrate, wherein the FET gate is planar to the FinFET gate. The structure further comprises retrograde well regions configured in the substrate. In one embodiment, the structure further comprises a shallow trench isolation region configured in the substrate.
Owner:GLOBALFOUNDRIES US INC

Method and apparatus for surface conditioning

PCT No. PCT/US95/16649 Sec. 371 Date Sep. 2, 1997 Sec. 102(e) Date Sep. 2, 1997 PCT Filed Dec. 21, 1995 PCT Pub. No. WO96/19825 PCT Pub. Date Jun. 27, 1996Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes a reactive gas. The apparatus includes a support for supporting the substrate in the chamber, the substrate being in a lower pressure reaction region of the chamber. A gas inlet is provided for feeding conditioning gas into a gas inlet region of the chamber which is at a higher pressure than the lower pressure reaction region so that the pressure differential causes the conditioning gas to flow toward the surface of the substrate wherein the conditioning gas component will chemically react with and condition the substrate surface, both said higher and lower pressure regions operating in a viscous flow regime. The substrate is supported such that a pressure bias is created across the surface of the substrate so that the gas, after it has chemically reacted with the substrate surface, flows outward from where it has reacted, off the substrate toward the periphery of the chamber and out a peripheral or central underside exhaust outlet. Gas feed may be provided to one or both sides of the substrate and light activation of the substrate or conditioning gas may be provided on one or both sides.
Owner:FSI INTERNATIONAL INC

Multiple degree of freedom substrate manipulator

A system for manipulating a planar substrate such as a semiconductor wafer is provided. The manipulator is typically used in conjunction with an XY stage to focus and planarize a wafer with respect to a tool. The manipulator employs redundant actuators of different types and a control system that uses low-bandwidth, high efficiency actuators to provide low frequency forces and high-bandwidth, but less efficient, actuators to provide all other forces. The manipulator provides support and manipulation of a substrate while minimizing errors due to thermal distortion.
Owner:ACTIVE PRECISION
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products