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982 results about "Planar substrate" patented technology

Planar Substrate, Window Board. A substrate for polishing and processing of optical glass with high precision, with increased surface accuracy and parallelism.

Planar substrate devices integrated with finfets and method of manufacture

A planar substrate device integrated with fin field effect transistors (FinFETs) and a method of manufacture comprises a silicon-on-insulator (SOI) wafer comprising a substrate; a buried insulator layer over the substrate; and a semiconductor layer over the buried insulator layer. The structure further comprises a FinFET over the buried insulator layer and a field effect transistor (FET) integrated in the substrate, wherein the FET gate is planar to the FinFET gate. The structure further comprises retrograde well regions configured in the substrate. In one embodiment, the structure further comprises a shallow trench isolation region configured in the substrate.
Owner:GLOBALFOUNDRIES US INC

Method and apparatus for surface conditioning

PCT No. PCT/US95/16649 Sec. 371 Date Sep. 2, 1997 Sec. 102(e) Date Sep. 2, 1997 PCT Filed Dec. 21, 1995 PCT Pub. No. WO96/19825 PCT Pub. Date Jun. 27, 1996Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes a reactive gas. The apparatus includes a support for supporting the substrate in the chamber, the substrate being in a lower pressure reaction region of the chamber. A gas inlet is provided for feeding conditioning gas into a gas inlet region of the chamber which is at a higher pressure than the lower pressure reaction region so that the pressure differential causes the conditioning gas to flow toward the surface of the substrate wherein the conditioning gas component will chemically react with and condition the substrate surface, both said higher and lower pressure regions operating in a viscous flow regime. The substrate is supported such that a pressure bias is created across the surface of the substrate so that the gas, after it has chemically reacted with the substrate surface, flows outward from where it has reacted, off the substrate toward the periphery of the chamber and out a peripheral or central underside exhaust outlet. Gas feed may be provided to one or both sides of the substrate and light activation of the substrate or conditioning gas may be provided on one or both sides.
Owner:FSI INTERNATIONAL INC
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