The invention discloses a method for measuring trace elements such as
arsenic and
selenium in industrial electro-deposit
copper according to the
atomic fluorescence spectrometry. The method comprises the following steps: A, preparing a solution of an industrial electro-deposit
copper fine sample; B, preparing a standard
arsenic solution and a standard
selenium solution; C, preparing a working curve solution with the standard
arsenic solution and the standard
selenium solution; D, measuring the
atomic fluorescence strengths of arsenic and selenium in the working curve solution with an
atomic fluorescence photometer, and drawing working curves by taking the
mass concentrations of arsenic and selenium as X axes, and taking the
fluorescence strengths of arsenic and selenium are Y axes; E, measuring the atomic
fluorescence strengths of arsenic and selenium in the sample solution with the atomic
fluorescence photometer, and finding out corresponding
mass concentrations of arsenic and selenium on corresponding working curves with the atomic fluorescence strengths. As a
nitric acid,
hydrochloric acid,
potassium iodide and thiocarbamide-
ascorbic acid treating sample is adopted, not only can the
impact of interfering ions such as Cu, Fe, Ag, Bi and Se and the combination of the interfering ions be effectively screened, but also the
impact of the
copper base body on arsenic and selenium measure can be eliminated.