32results about How to "Photosensitive" patented technology

The present invention provides a photosensitive resin composition, which has photosensitivity, excellent insulation reliability, and physical properties suitable for stacked layers (interlayer insulating layers) of a multilayer printed wiring board, the photosensitive resin composition containing: ( A) an epoxy resin, (B) one or more curing agents selected from active ester curing agents, cyanate ester curing agents, and benzoxazine curing agents, and (C) a (meth)acrylate structure compound.

The invention belongs to the technical field of textiles, and discloses a reversible color-reversible cotton fabric functionalized with polytungsten oxide clusters and a preparation method thereof. By organically combining polytungstate with the carboxylic acid groups on the cotton cloth, the polytungstate oxycluster-rare earth carboxylic acid derivatives are directly grown on the fiber in situ while preparing, which simplifies the process, and the polytungstate Directly synthesized on the fiber, the polytungstate and the fiber are combined more tightly, and the prepared reversible discoloration cotton fabric has photochromic and thermochromic properties, which can be applied to the development of functional fabrics.

The invention discloses a method for preparing nanocrystal-doped tungsten oxide electrochromic thin film pattern. The specific process is: preparing photosensitive FTO-doped tungsten oxide sol; coating the sol on an FTO conductive glass substrate to prepare a FTO-doped tungsten oxide gel film with UV-sensitive properties; then expose and develop the gel film to obtain a patterned FTO-doped tungsten oxide gel film; finally put the patterned gel film into the atmosphere Heat treatment in the furnace to obtain nanocrystalline doped tungsten oxide thin film pattern. The preparation process of the present invention is simple, does not require a special vacuum environment and a reaction chamber, and can produce large-area FTO nanocrystal-doped tungsten oxide thin film patterns; there is no need to add resists and corrosive media during the preparation process, and there is no damage to the substrate ; An electrochromic thin film with visible-near-infrared dual-frequency modulation is prepared, which has better electrochromic performance than ordinary amorphous tungsten oxide thin films.

Provided is a photosensitive resin composition which is efficiently activated by light having a wavelength of from 350 nm to 500 nm and has excellent thick-film curability and deep curability.  The photosensitive resin composition contains: (A) a photobase generator which is a compound represented by formula (1) or (2) and generates a base by irradiation of an active light ray; (B) a thermal radical polymerization initiator; and (C) a radical polymerizable substance.  In formulae (1) and (2), Ar represents an aromatic hydrocarbon group or a heterocyclic group, which has at least one benzene skeleton and may be substituted by a halogen atom or the like; R1 and R2 each independently represent an alkyl group having 1 to 20 carbon atoms or the like; m represents an integer of 2 to 4; R3 to R5 each independently represent an alkyl group having 1 to 20 carbon atoms, a phenyl group, or a naphthyl group, which may be substituted by a halogen atom or the like; and X- represents an anion.

The invention relates to a silane coupling agent intermediate and application thereof in a light-cured silica sol. The silane coupling agent intermediate is generated by an acetylacetate functionalized silane coupling agent and an acrylate monomer containing at least two degrees of functionality through Michael addition reaction; the acetylacetate functionalized silane coupling agent is prepared from a trialkoxy silane coupling agent and acetylacetate containing carbon-carbon double bonds through mercapto-olefin addition reaction; when the silane coupling agent intermediate is used for preparing the silica sol, a photoinitiator needs not to be added or a small amount of the photoinitiator needs to be added, so that the coating is fully cured; the polymerizing crosslinking efficiency of acrylate double bonds is improved as a result of a self-photosensitive characteristic of the silica sol molecules, and the crosslinking density of the coating is improved, so that the wear resistance, the scratch resistance, the scoring resistance and the like of the coating are further improved.

Disclosed is a material which enables pattern formation in an alkaline developer, and shows high solvent resistance, liquid crystal orientation, heat resistance, high transparency, and high planarity after being formed into a cured film, and can be dissolved in a glycol solvent which can be applied to the production line of a planarized film of a color filter while being formed into a cured film. Specifically disclosed is a photosensitive polyester composition for use in forming thermally cured film, containing component (A), component (B), component (C), and component (D): component (A): a modified polyester obtained by reacting a compound having a functional group selected from a glycidyl group and an isocyanate group with a polyester containing a structural unit represented by formula (1); component (B): an epoxy compound having two or more epoxy groups; component (C): an amino group-containing carboxylic acid compound obtained by reacting a diamine compound with dicarboxylic acid dianhydride; and component (D): 1,2-quinone diazide compound. In formula (1), A and B each independently represent an organic group containing a cyclic structure.

Provided is a method of preparing a photoinitiated selfrepairing microcapsule, comprising: (1) obtaining a capsule core material emulsion by stirring a coumarin compound and sodium lauryl sulfate at 40-55 ℃ (water bath), dropwisely adding water, and emulsifying 20-40min; (2) obtaining a capsule wall prepolymer material solution by mixing urea and aqueous formaldehyde solution, adjusting pH to 8-9 and reacting at 60-70 ℃ for 1-2 hours; (3) obtaining a solution containing microcapsules by slowly dripping the capsule wall prepolymer material solution of step (2) into the capsule core material emulsion of step (1) under stirring, adjusting the pH value to be neutral and curing. The coating process of the method is simple and safe with no need for for a catalyst,and has a low cost. The coumarin-based capsule core material can be cross-linked under photoinitiation to repair micro-cracks, and the capsulate wall material is an environmentally friendly co-condensed resin of urea-formaldehyde.

Provided are a photosensitive resin, process for preparing same and use thereof. The photosensitive resin comprises the compound represented by formula (I), wherein R is represented by formula (II) or (III); and R2 and R3 are independently H, halogen, C1-C4 alkyl, N,N-dimethylamino, N,N-diethylamino, cyclohexyl, methoxyl or ethoxy; x+y=100, x is an integer of 0-99, and y is an integer of 0-100. The photosensitive resin has photosensitivity as well as good film-forming property.

The invention discloses a degradable environmental protection garbage bag, which is characterized in that it is made of the following raw materials in parts by weight: 40-50 parts of polycarboxy-terminated polylactic acid hydrogenated benzoin ester, 35-45 parts of polyurethane-based polyester urea resin, 1-3 parts of filler, 0.2-0.5 parts of coupling agent, 0.5-1.5 parts of compatibilizer, 0.3-1 part of heat stabilizer, 3-5 parts of hydroxyl-terminated hyperbranched polyester. The invention also provides a manufacturing method of the degradable environmental protection garbage bag. The degradable environmental protection garbage bag disclosed by the invention has good mechanical properties, good performance stability, strong durability, good degradable performance after being discarded, high degradation efficiency, and excellent toughness and waterproof performance.