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Photosensitive polyester composition for use in forming thermally cured film

A heat-curing and photosensitive technology, which is applied in the application field of the cured film, can solve the problem of no photosensitive flattening film reported, and achieve the effects of high heat resistance, high transparency, and high solvent resistance

Active Publication Date: 2012-03-28
NISSAN CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In addition, no photosensitive planarization film showing orientation has been reported so far.

Method used

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  • Photosensitive polyester composition for use in forming thermally cured film
  • Photosensitive polyester composition for use in forming thermally cured film
  • Photosensitive polyester composition for use in forming thermally cured film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0188] The following examples are given to illustrate the present invention in more detail, but the present invention is not limited to these examples.

[0189] [Abbreviated symbols used in Examples]

[0190] The meanings of the abbreviated symbols used in the following examples are as follows.

[0191]

[0192] BPDA: biphenyltetracarboxylic dianhydride

[0193] HBPDA: 3,3'-4,4'-Dicyclohexyltetracarboxylic dianhydride

[0194] HBPA: hydrogenated bisphenol A

[0195] THPA: 1,2,5,6-tetrahydrophthalic anhydride

[0196] BTEAC: Benzyltriethylammonium Chloride

[0197] TPPB: tetraphenyl bromide

[0198] GMA: glycidyl methacrylate

[0199] GME: glycidyl methyl ether

[0200] DTBC: di-tert-butylcresol

[0201]

[0202] CBDA: Cyclohexanetetracarboxylic dianhydride

[0203] DA-4P: 1,3-bis(4-aminophenyl)benzene

[0204] DA-1M: 4,4'-bis(4-aminophenoxy)diphenylsulfone

[0205] TA: 1,2,4-trimesic anhydride

[0206] DDS: 4,4'-Diaminodiphenylsulfone

[0207] pDA: p-phenyle...

Synthetic example 1

[0228] HBPDA 40.0g, BPDA 8.23g, HBPA 49.3g, THPA 5.96g, BTEAC 0.18g, TPPB 0.33g were reacted in PGMEA 241.96g at 120°C for 17 hours to obtain a solution of the specific polymer (solid content Concentration: 30.0% by mass) (P1). The obtained specific polymer had Mn of 1,500 and Mw of 3,430.

Synthetic example 2

[0230] 18.42 g of GMA, 0.057 g of DTBC, and 42.99 g of PGME were added to 252.00 g of the solution (P1) of the specific polymer obtained in Synthesis Example 1, and reacted at 110° C. for 9 hours to obtain a polyester solution (solid content Concentration: 30.0% by mass) (P2). Mn of the obtained polyester was 1,260, and Mw was 6,880.

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PUM

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Abstract

Disclosed is a material which enables pattern formation in an alkaline developer, and shows high solvent resistance, liquid crystal orientation, heat resistance, high transparency, and high planarity after being formed into a cured film, and can be dissolved in a glycol solvent which can be applied to the production line of a planarized film of a color filter while being formed into a cured film. Specifically disclosed is a photosensitive polyester composition for use in forming thermally cured film, containing component (A), component (B), component (C), and component (D): component (A): a modified polyester obtained by reacting a compound having a functional group selected from a glycidyl group and an isocyanate group with a polyester containing a structural unit represented by formula (1); component (B): an epoxy compound having two or more epoxy groups; component (C): an amino group-containing carboxylic acid compound obtained by reacting a diamine compound with dicarboxylic acid dianhydride; and component (D): 1,2-quinone diazide compound. In formula (1), A and B each independently represent an organic group containing a cyclic structure.

Description

technical field [0001] This invention relates to the photosensitive polyester composition for thermosetting film formation, and the cured film formed from this composition. More specifically, the present invention relates to a photosensitive polyester composition for forming a thermosetting film and a cured film thereof capable of forming a cured film having high transparency, flattening property, liquid crystal orientation ability, and high solvent resistance, and Applications involving the cured film. This photosensitive polyester composition for thermosetting film formation is especially preferable as a color filter overcoat agent which has a liquid-crystal orientation function in a liquid crystal display. Background technique [0002] In general, optical devices such as liquid crystal display elements, organic EL (electroluminescent) elements, and solid-state imaging elements are provided with a protective film to prevent the element surface from being exposed to solven...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G59/56C08G63/91C08K5/20C08K5/3415C08L63/00C08L67/02
CPCC08L63/00C08L77/06C08G63/914C08K5/20C08L67/02C08K5/3415C08L2666/22C08L2666/14
Inventor 畑中真安达勲
Owner NISSAN CHEM IND LTD
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