153 results about "Negative pattern" patented technology

A computer-implemented system and method for translating a SPARQL query. The system includes: a parser/lexer for parsing the SPARQL query; a hidden negative pattern detector for detecting a hidden negative pattern in the parsed SPARQL query; a hidden negative pattern translator for translating the detected hidden negative pattern into an explicit negative pattern; a separator for separating the explicit negative pattern from a positive pattern in the parsed SPARQL query; a negative pattern translator for translating the explicit negative pattern into a negative portion of an SQL statement; a positive pattern translator for translating the positive pattern into a positive portion of the SQL statement; and an SQL statement combiner for combining the negative portion of the SQL statement with the positive portion of the SQL statement.

A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved. In the process of image formation via positive/negative reversal by organic solvent development, the resist film has a high dissolution contrast and controlled acid diffusion. By subjecting the resist film to exposure through a mask having a lattice-like pattern and organic solvent development, a fine hole pattern can be formed at a high precision of dimensional control.

A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a polymer comprising recurring units having a tertiary amino group in a C₆-C₁₂ ether, C₄-C₁₀ alcohol, C₆-C₁₂ hydrocarbon, C₆-C₁₆ ester or C₇-C₁₆ ketone solvent, baking the coating, and removing the excessive shrink agent for thereby shrinking the size of spaces in the pattern.

The invention provides a patterning process, comprising at least a step of forming a silicon-containing film on a body to be processed by using a composition for the silicon-containing film, a step of forming, on the silicon-containing film, a photoresist film by using a resist composition, a step of exposing to the photoresist film after heat treatment thereof, and a step of forming a negative pattern by dissolving an unexposed area of the photoresist film by using a developer of an organic solvent; wherein a composition giving the silicon-containing film whose pure-water contact angle in the part corresponding to the exposed area of the photoresist film becomes in the range of 35° or more to lower than 70° after exposure is used as the composition. There can be optimum patterning process as a patterning process of a negative resist pattern to be formed by adopting organic solvent-based development.

The invention discloses a patterned transparent electrode fabrication method. The method comprises the steps of (1) depositing a conductive nanoparticle dispersion solution on a porous filter membrane with a negative pattern mask to obtain a patterned transparent conductive film adhered on the porous filter membrane; and (2) removing the mask, transferring the patterned transparent conductive film on the porous filter membrane onto a transparent substrate, and removing the porous filter membrane to obtain the patterned transparent electrode; wherein the dispersion solution contains conductive nanoparticles 0.015wt% to 5wt%, dispersing agent 0.15wt% to 20wt%, and water in balance; and the dispersing agent is selected from arbitrary one or the combination of a surfactant, organic acid, high-molecular polysaccharide and DNA macromolecules. The method has the advantages of simple process, low cost and large material selection range, and can accurately design and control the formed pattern according to requirement.

Disclosed herein is a method of forming a negative pattern of carbon nanotubes through: modifying the surfaces of carbon nanotubes to have double bond-containing functional group capable of participating in radical polymerization; coating a substrate with a liquid coating composition prepared by dispersing the surface-modified carbon nanotubes in an organic solvent along with a photoinitiator; exposing the film to UV light through a photomask to induce radical polymerization of the carbon nanotubes; and developing the film. By virtue of the present invention, desired patterns of carbon nanotubes can be easily made on the surfaces of various substrates according to the conventional photolithography procedure.

A pattern is formed by coating a chemically amplified resist composition comprising a resin having a dissolution rate in an organic solvent developer that lowers under the action of acid onto a processable substrate, prebaking, exposing the resist film, PEB, developing in an organic solvent developer to form a negative pattern, coating a solution comprising Si, Ti, Zr, Hf or Al, prebaking, and dry etching to effect image reversal for converting the negative pattern into a positive pattern.

Disclosed herein are methods of making a negative pattern of carbon nanotubes or a polymerized carbon nanotube composite having an interpenetrating polymer network (IPN) by modifying the surfaces of the carbon nanotubes with polymerizable functional groups such as oxirane and anhydride groups and subjecting the surface-modified carbon nanotubes either to a photolithography process or to a heatcuring process. By virtue of the present invention, desired patterns of carbon nanotubes can be easily made on the surfaces of various substrates, and polymerized carbon nanotube composites improved in hardening properties can be made without additional polymers.

A negative pattern is formed by applying a resist composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having an amino group, amide bond, carbamate bond or nitrogen-containing heterocycle, (B) a photoacid generator, and (C) an organic solvent onto a substrate, prebaking, exposing, baking, and selectively dissolving an unexposed region of the resist film in an organic solvent-based developer.

The invention provides a multistage phishing website detecting method and system. The core concept includes that rapid filtration is integrated with precision filtration. Suspected phishing websites are controlled within a narrow range by multistage rapid filtration. Further, an accurate judgment model is trained by analyzing statistical characteristics of positive and negative patterns within a narrow range. The method includes the steps: selecting websites to be detected within a range, rapidly filtering the websites and eliminating obvious non-phishing websites; accurately judging whether the rest websites after rapid filtration are phishing websites. The system comprises a rapid filtration module and an accurate judgment module, wherein the rapid filtration module is used for selecting the websites to be detected within the range, rapidly filtering the websites and eliminating the obvious non-phishing websites, and the accurate judgment module is used for accurately judging the rest websites to be detected after rapid filtration.

A resist composition comprising a polymer comprising recurring units having an acid labile group of cyclopentyl with tert-butyl or tert-amyl pendant is coated onto a substrate, baked, exposed to high-energy radiation, PEB and developed in an organic solvent to form a negative pattern. A fine hole pattern can be formed from the resist composition with advantages including high dissolution contrast, good size control and wide depth of focus.

Disclosed is a printed circuit board having a plating pattern buried in a via and a method of manufacturing the same. The method of manufacturing the printed circuit board includes forming a negative pattern for forming a plating pattern, thus remarkably reducing the generation of plating thickness deviation in a plating process for forming a circuit pattern, and the printed circuit board has improved electrical signal transmission properties.

A negative pattern is formed by coating a resist composition onto a substrate, the resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, an acid generator, an onium salt of perfluoroalkyl ether carboxylic acid, and an organic solvent, prebaking, exposing, baking, and developing in an organic solvent such that the unexposed region of film is dissolved away and the exposed region of film is not dissolved. In image formation via positive/negative reversal by organic solvent development, the resist film is characterized by a high dissolution contrast between the unexposed and exposed regions.

A content search system determines whether an input string matches a negative regular expression that includes a negative pattern and an optional positive pattern. If the input string matches the positive pattern and does not match the negative pattern, a match between the input string and the negative regular expression is indicated. The positive pattern and the negative pattern may be compared to the input string in a single pass of the input string. The content search system may be implemented in a content addressable memory (CAM) device. The negative regular expression may specify a particular portion of the input string, such as a range of characters or bytes of a data packet, in which the negative pattern should not match for a match between the negative regular expression and the input pattern to be indicated.

A negative pattern is formed by coating a resist composition comprising (A) a polymer having an acid labile group, adapted to change its polarity under the action of acid, (B) a photoacid generator, and (C) an organic solvent onto a substrate, baking, exposing the resist film to high-energy radiation, PEB, and developing in an organic solvent-based developer to selectively dissolve the unexposed region of resist film. The photoacid generator has the formula: R¹—COOC(CF₃)₂—CH₂SO₃⁻R²R³R⁴S⁺ wherein R¹ is a monovalent hydrocarbon group, R², R³ and R⁴ are an alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl group, or may bond together to form a ring with the sulfur atom.

The invention provides a bootstrapping weak learning method based on a random fern and a classifier thereof, which belong to the technical field of computer graphic identification. In graphic identification, positive and negative patterns are generally judged by adopting the mean value distances of weighting and Gaussian probability distribution of a weak classifier. Or classification trees are taken as weak learners, nodes are partitioned by using the partitioning rule of error metric reduction maximization, and the weak classifiers are improved into strong classifiers. However, the weak learning methods have the defects of low convergence rate, poor accuracy and low computing efficiency. Through steps for selecting image characteristics, constructing a random fern and a weak learning method based on a random fern, establishing a weak classifier and a result classifier and the like, the image mode identification problems of complexity of an imaging environment and strict requirement on the operand can be well solved, a rapidly-converging and efficient bootstrapping weak learning method is realized, and a high-accuracy classifier for real-time processing is obtained. The method and the classifier are mainly applied to identification occasions in various modes.