This invention disclose a method of availing of micro
millimeter ball template prepares micro
millimeter lattice array of controlled
cell size, the method belongs to micro
millimeter photo
etching technique field. It makes use of
plasma ion etching to control size of
sedimentation access of micro millimeter ball template, combines with filming step and cleaning step in micro millimeter photo
etching technique, thereby acquires micro millimeter lattice array of controlled
cell size. The density of micro millimeter lattice array in the lecture experiment is 42G / in2, and it controls
cell size in 26-100nm. This method builds directly upon the control of
sedimentation access of template, it applies to lattice array of all kinds of stuff. By means of conjoining thin film technique of disparity stuff, micro millimeter ball photo etching technique which is modified by this method could prepare
high density micro millimeter lattice array of disparity stuff and controlled
cell size. It could use for device based on micro millimeter lattice array, for instance, magnetic store, preparation of
transducer and performance optimization of device based on controlled
cell size.