The invention discloses a deep treatment method for
thallium-containing
wastewater of an electronic product manufacturing and metallurgical process. The method disclosed by the invention is used for treating the
wastewater, of which the initial
thallium content is lower than 1.6mg / L, and comprises the following specific steps: (1) dosing a biological preparation to the
thallium-containing
wastewater generated from the electronic product manufacturing and metallurgical process, carrying out a reaction for 15 to 30 minutes, and then, carrying out standing; (2) dosing a chemical coagulation precipitant into the wastewater, adjusting the pH of the wastewater to 10 to 12 during coagulative
precipitation, carrying out a reaction for 15 to 30 minutes, and then, carrying out
filtration; (3) adding a coagulation adsorbent into the filtrate obtained in the step (2), carrying out a stirred reaction for 15 to 30 minutes, and then, carrying out
filtration, thereby obtaining the thallium-containing wastewater which can be discharged after reaching standard. The method disclosed by the invention can also be used for synchronously treating other heavy-
metal ions contained in the thallium-containing wastewater. According to the method, the method can be implemented through carrying out reforming on the existing facilities, the cost of investment can be reduced greatly, the process is simple, the operation is stable, and the application prospect of industrialization is broad.