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Deep treatment method for thallium-containing wastewater of electronic product manufacturing and metallurgical process

A technology for advanced treatment and electronic products, which is applied in metallurgical wastewater treatment, neutralization water/sewage treatment, filtration treatment, etc. It can solve the problems of many chemical reagents, troublesome treatment process, cumbersome preparation process of biological thallium removal agent, etc., and achieve the goal of treatment The effect of low cost, stable effluent quality and standard discharge

Inactive Publication Date: 2016-08-24
SHANGHAI SECOND POLYTECHNIC UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this method is that the preparation process of the biological thallium-removing agent is cumbersome, and more chemical reagents are used, which brings troubles to the subsequent treatment process.

Method used

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  • Deep treatment method for thallium-containing wastewater of electronic product manufacturing and metallurgical process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] 1. Preparation of biological agents

[0035] 1) Prepare 150ml of 9K liquid medium, inoculate with Thiobacillus ferrooxidans at an inoculum of 5Vol%, and cultivate for 5 days in a shaker at 30°C and 125 r / min;

[0036] 2) Take 100ml of the cultured bacterial solution and add FeSO according to the solid-liquid mass volume ratio of 1:5g / ml 4 ·7H 2 O, let stand after stirring for 30 minutes;

[0037] 3) Directly store the biological agent solution prepared in 2) in a refrigerator at 4°C for later use.

[0038] 2. Take 98ml of thallium-containing wastewater with an initial thallium content of 0.5mg / L, add 2ml of self-made biological preparations, react for 15-30 minutes, and then stand still, then add 0.5g polyaluminum chloride and 0.5g ferrous sulfide to it. Use sodium hydroxide to adjust the pH of the solution to 10, react for 15 minutes, and filter. Finally, add 0.3 g of polyaluminum chloride, 0.3 g of polyacrylamide, and 0.3 g of activated carbon to the filtrate, and filter afte...

Embodiment 2

[0040] 1. Preparation of biological agents

[0041] 1) Prepare 150ml of 9K liquid medium, insert 10Vol% of the inoculum into Thiobacillus ferrooxidans, and culture it in a shaker at 30°C and 130r / min for 4 days;

[0042] 2) Take 100ml of the cultured bacterial solution and add Fe according to the solid-liquid mass volume ratio of 1:6 g / ml 2 (SO 4 ) 3 , After stirring for 30min, let it stand;

[0043] 3) Directly store the biological agent solution prepared in 2) in a refrigerator at 4°C for later use.

[0044] 2. Take 98ml of thallium-containing wastewater with an initial thallium content of 1.6mg / L, add 2ml of self-made biological preparations, react for 15-30 minutes, and then stand still, then add 0.5g polyaluminum chloride and 0.5g ferrous sulfide to it. Use sodium hydroxide to adjust the pH of the solution to 11, react for 15 minutes, and filter. Finally, add 0.3g polyaluminum chloride, 0.3g polyacrylamide, and 0.3g activated carbon to the filtrate. After reacting for 15 minutes,...

Embodiment 3

[0046] 1. The preparation of the biological agent is the same as in Example 1.

[0047] 2. Take 98ml of thallium-containing wastewater from the manufacturing and metallurgical process of analog electronic products with an initial thallium content of 0.8mg / L, which also contains heavy metal ions such as Cu, Fe, Cd, and add 2ml of homemade biological preparations, and react for 15-30 minutes. After standing, add 0.5g of polyaluminum chloride and 0.5g of ferrous sulfide to it, adjust the pH of the solution to 12 with sodium hydroxide, react for 15 minutes and then filter, and finally add 0.3g of polyaluminum chloride, 0.3g polyacrylamide and 0.4g activated carbon were reacted for 15 minutes and then filtered. The final thallium concentration of the filtrate obtained by ICP-MS was 0.0026mg / L, and the removal rate reached 99.68%.

[0048] The removal rates of Cu, Fe and Cd are all above 99.99%.

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Abstract

The invention discloses a deep treatment method for thallium-containing wastewater of an electronic product manufacturing and metallurgical process. The method disclosed by the invention is used for treating the wastewater, of which the initial thallium content is lower than 1.6mg / L, and comprises the following specific steps: (1) dosing a biological preparation to the thallium-containing wastewater generated from the electronic product manufacturing and metallurgical process, carrying out a reaction for 15 to 30 minutes, and then, carrying out standing; (2) dosing a chemical coagulation precipitant into the wastewater, adjusting the pH of the wastewater to 10 to 12 during coagulative precipitation, carrying out a reaction for 15 to 30 minutes, and then, carrying out filtration; (3) adding a coagulation adsorbent into the filtrate obtained in the step (2), carrying out a stirred reaction for 15 to 30 minutes, and then, carrying out filtration, thereby obtaining the thallium-containing wastewater which can be discharged after reaching standard. The method disclosed by the invention can also be used for synchronously treating other heavy-metal ions contained in the thallium-containing wastewater. According to the method, the method can be implemented through carrying out reforming on the existing facilities, the cost of investment can be reduced greatly, the process is simple, the operation is stable, and the application prospect of industrialization is broad.

Description

Technical field [0001] The invention belongs to the technical field of heavy metal ion wastewater treatment, and specifically relates to an advanced treatment method for thallium-containing wastewater in the manufacturing and metallurgical processes of electronic products. Background technique [0002] Due to the excellent chemical properties of thallium element, people’s demand for thallium element and its compounds is increasing, and it is widely used in the manufacture of high-end electronic products. Therefore, thallium-containing elements will be produced in the manufacturing of electronic products and metallurgical processes of thallium-containing ore. Wastewater. [0003] Thallium (Tl) is a highly toxic and high-risk element with accumulation, of which Tl 3+ Is more toxic than Tl + It is 50,000 times stronger, and the lethal dose to humans is 10-15 mg / L. At present, the annual amount of thallium discharged from industrial production in the world is about 2,000 to 5,000 tons...

Claims

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Application Information

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IPC IPC(8): C02F9/14
CPCC02F9/00C02F1/001C02F1/281C02F1/285C02F1/5236C02F1/56C02F1/66C02F3/34C02F2101/20C02F2103/16C02F2301/08
Inventor 顾卫华白建峰王景伟毛文雄张承龙费彦肖徐丹丹
Owner SHANGHAI SECOND POLYTECHNIC UNIVERSITY
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