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80results about How to "Simplify process complexity" patented technology

Process for making super-thin silicon nitride / silicon oxide grid electrode dielectric layer

The invention discloses a process for manufacturing ultra-thin silicon nitride / silicon oxide grid electrode dielectric layer, characterized by that, first forming a surface oxidation layer on a silicon substrate by silicon oxidation, then depositing silicon nitride layer on the surface oxidation layer, and nitrogenizing and oxidizing the silicon nitride using plasma body. The thermal oxidation silicon substrate is carried out by oxidizing the silicon substrate using oxygen or N#-[2]O, so as to form silicon oxide layer or silicon nitride layer. The deposition silicon nitride uses rapid heating chemical vapor deposition or remote plasma body to reinforce the chemical vapor deposition silicon nitride layer. Plasma body nitridation uses N#-[2] plasma body, and plasma body oxidation uses oxygen plasma body or N#-[2] plasma body to oxidizing the silicon nitride layer.
Owner:TAIWAN SEMICON MFG CO LTD

High temperature superconductor coil and winding technology thereof

The invention discloses a high temperature superconductor coil and a winding technology of the high temperature superconductor coil. The high temperature superconductor coil comprises an epoxy barrel and a plurality of layers of coil units, wherein each coil unit is composed of a low temperature glue layer, a polyimide film layer and a superconduction strip layer which are arranged in sequence. According to the winding technology, firstly, a framework of the superconductor coil is well fixed, winding positions are marked, the surface of the framework is evenly coated with low temperature glue and wound with polyimide films, then polyimide belts are laid at equal intervals, tensioned and fixed, after a strip winding disc is prepared, the wire inlet end is fixed to the surface of the framework and is evenly and densely wound with a layer of superconduction strips, then the surface of each strip is coated with the low temperature glue and wound with a layer of polyimide films, the polyimide belts are tensioned and laid backwards, and all the operations are repeated until the whole coil is wound. It is guaranteed that certain prestress is applied to the superconduction strips, layer insulation is achieved through the polyimide films and the low temperature glue, and the winding technology is simple and effective on the basis of ensuring the performance of the strips effectively.
Owner:HUAZHONG UNIV OF SCI & TECH +1

Method for preparing temperature-pressure sensor, temperature-pressure sensor structure and temperature-pressure measuring system and method

The invention provides a method for preparing a temperature-pressure sensor, a temperature-pressure sensor structure and a temperature-pressure measuring system and method. The method for preparing a temperature-pressure sensor comprises the following steps: fusion splicing the flat end face of a single-mode fiber and the flat end face of a quartz glass tube and cutting the quartz glass tube at a position a preset length close to a fusion splicing port, covering the cutting port of the quartz glass tube with the preset length with the spherical surface of a fiber bubble, fusion splicing the joint of the fiber bubble and the cutting port, cutting the spherical surface of the fiber bubble along a direction in parallel with the cutting port in order that the quartz glass tube with the preset length and the spherical surface of the fiber bubble form a Fabry-Perot interference cavity with the preset length, and making a fiber bragg grating for temperature detection in the single-mode fiber connected with the Fabry-Perot interference cavity by using laser. The method simplifies the process complexity and installation complexity of the temperature-pressure sensor, improves pressure detection accuracy, and enhances the reliability of a temperature and measurement system.
Owner:SHENZHEN UNIV

Traditional Chinese medicinal material washing and treating device

The invention discloses a traditional Chinese medicinal material washing and treating device which comprises a barrel. A barrel cover is arranged over the barrel, a motor is arranged in the center ofthe upper surface of the barrel cover, a heating control device is arranged on one side of the motor, a water inlet is formed in the position, located on the other side, of the barrel cover, a rotating shaft is connected to the lower end of the motor and is fixedly provided with blades, a screen drum is fixed into the barrel, and a liquid cavity is formed between the screen drum and the barrel; and an ultrasonic wave transmitting device is further arranged on the inner wall of the screen drum, discharging openings which are through are formed in the screen drum and the middle of the bottom ofthe barrel, a water discharging opening communicated with the liquid cavity is formed in the bottom end of the barrel, and a water inlet device and a water outlet device are arranged in the exterior of the barrel. By means of the washing and treating device, the effect of removing impurities in traditional Chinese medicinal materials can be remarkably improved, the washing efficiency is high, operation is easy, washing and drying treatment can be integrated together, a mechanical structure and the traditional Chinese medicinal material treating process complexity are simplified, and the use and popularization value is achieved.
Owner:许五妮

Method and device for continuous laminating of flexible thin film with multilayer structure

The invention discloses a method for continuous laminating of flexible thin films with a multilayer structure, comprising the steps of: (1) carrying out die cutting and waste stripping treatment on a first flexible thin film and a second flexible thin film to make a protective layer on one side of each thin film be stripped and to cut rectangular incisions arranged in an array on a useful layer in the middle of each thin film; (2) taking a third flexible thin film as an intermediate layer for laminating, stripping a protective layer on one side first, then laminating the surface stripped with the first flexible thin film in the preparation stage to obtain a flexible film with a four-layer structure; and (3) stripping a protective layer on the other side of the third flexible thin film and laminating the surface stripped with the second flexible thin film in the preparation stage to obtain a composite film with a five-layer structure. The invention further discloses a device for continuous laminating of flexible thin films with a multilayer structure. With the laminating device and the technological method thereof provided by the invention, half-cut die cutting and accurate counterpoint laminating of flexible thin films with a multilayer structure can be realized effectively.
Owner:HUAZHONG UNIV OF SCI & TECH

Flip LED chip and manufacturing method thereof

InactiveCN104868021ASurface roughening light extraction efficiencyImprove light extraction efficiencySemiconductor devicesGallium nitrideRough surface
The invention discloses a flip LED chip and a manufacturing method thereof. A front-end structure containing a sapphire substrate, an N type gallium nitride layer, a quantum well layer, and a P type gallium nitride layer is provided, wherein the N type gallium nitride layer, the quantum well layer, and the P type gallium nitride layer are formed on the front side of the sapphire substrate; an ohmic contact layer and a reflecting layer are formed on the front-end structure; a first electrode connecting the N type gallium nitride layer and a second electrode connecting the reflecting layer are formed; and reduction processing is carried out on the back side of the sapphire substrate and a rough aluminium oxide layer is formed. Compared with the prior art, because of the aluminium oxide layer with the rough surface and the material consistent with the substrate material, an effect of improvement of the luminous efficiency based on surface roughening is realized; and defects of great influence on the front side and high cost in the prior art can be overcome. Therefore, the preparation cost is low; the process complexity is low; and the large-scale mass production can be realized easily.
Owner:ENRAYTEK OPTOELECTRONICS

Single photon emitter and manufacturing method thereof based on high refractive index contrast grating structure

The invention discloses a single photon emitter and a manufacturing method thereof based on a high refractive index contrast grating structure. The single photon emitter comprises a GaAs substrate, wherein an epitaxial wafer is prepared on the GaAs substrate, and comprises a GaAs buffer layer (1), DBR (Distributed Bragg Reflector) layers (4) and (6), an InAs quantum dot active area (5) and a high refractive index contrast grating (a low refractive index material (7) and a high refractive index material (8)) sequentially from the bottom up. The GaAs buffer layer is etched and exposed on the epitaxial wafer by adopting a standard photetching technology and an ICP (Inductively Coupled Plasma) technology to serve as an N-type ohmic contact layer, and then alloys are evaporated on the high refractive index material and the GaAs buffer layer respectively to serve as a P-type electrode and an N-type electrode. The submicron grating is manufactured on the high refractive index material by utilizing electron beam exposure and the ICP etching technology; a material of the lower layer of the grating is selectively corroded by utilizing a corrosive liquid; and a low refractive index air layer is obtained.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Multi-chip package interconnection structure and multi-chip package interconnection method

The invention discloses a multi-chip package interconnection structure, which comprises a first substrate and a second substrate which are superposed, wherein a plurality of first cavities are arranged on the first substrate; a plurality of first chips are arranged in the first cavities; the first surface of the first substrate is provided with a first pad; the first pad is electrically connectedto the first chips; a plurality of second cavities are formed in the second substrate; a plurality of second chips are arranged in the second cavities; the upper surface of the second substrate is provided with a second pad; the second pad is electrically connected to the second chips; the first pad and the second pad are electrically connected by a conductive medium penetrating the second substrate. The multi-chip package interconnection structure disclosed by the invention adopts a direct soldering method to realize the vertical interconnection of the substrates, so that multi-chip package is high in integration degree, good in reliability, simple in process and low in cost; microwave radio frequency signal insertion loss does not exceed 0.5 dB, which can solve the problem of high-density vertical interconnection of the substrates; and the multi-chip package interconnection structure is widely used in a multi-chip package system of a radio frequency microwave circuit.
Owner:中国科学院苏州纳米技术与纳米仿生研究所南昌研究院

Intelligent pneumatic supercharging device with adjustable injection pressure

The invention relates to an intelligent pneumatic supercharging device with the adjustable injection pressure. The intelligent pneumatic supercharging device with the adjustable injection pressure comprises a compressed air tank (4), an electronic control unit (7), a nozzle (10) and a pneumatic supercharging valve (11), wherein the nozzle (10) is arranged on the pneumatic supercharging valve (11)and faces the engine inlet direction; an outlet of the compressed air tank (4) is connected with the nozzle (10); a pressure adjusting valve (6), or a proportional electromagnetic valve, or an electric ball valve is arranged on a pipeline for connecting the compressed air tank (4) and the nozzle (10); a pressure sensor I (5) is arranged at the outlet of the compressed air tank (4); the pressure sensor I (5) and the pneumatic supercharging valve (11) are electrically connected with the electronic control unit (7); and the pressure adjusting valve (6), or the proportional electromagnetic valve,or the electric ball valve is electrically connected with the electronic control unit (7). The more-refined air inlet pressure closed-loop adjustment is realized, the optimal air inflow under the current working condition is provided for an engine, and the control quality is improved.
Owner:DONGFENG COMML VEHICLE CO LTD

Magnetic switch circuit for outputting vector length of magnetic field

The present invention provides a magnetic switch circuit for outputting a vector length of a magnetic field, and relates to the field of magnetic field intensity detection circuit. The circuit comprises: an uniaxial magnetic sensor module comprising a plurality of uniaxial magnetic sensors, each uniaxial magnetic sensor being configured to output first preprocessing signals in a corresponding preset direction; an application specific integrated circuit connected with the uniaxial magnetic sensor module and configured to receive each first preprocessing signal and perform vector modulus processing and vector modulus solution and processing to obtain magnetic vector signals and a corresponding magnetic field vector length and output the magnetic vector signals and the corresponding magneticfield vector length. The magnetic switch circuit for outputting the vector length of the magnetic field measures one magnetic field intensity in each direction on the application specific integrated circuit and achieves vector modulus processing and vector modulus solution and processing on the application specific integrated circuit to obtain an accurate magnetic vector length, reduce the designdifficulty of the magnetic sensors in a traditional technology, simplify the process complexity of the magnetic sensors and effectively improve the yield rate.
Owner:QST CORP

Layout structure of capacitive touch panel

ActiveCN102760016ASimplify the number of masks and process complexityLow manufacturing costInput/output processes for data processingTouch panelProcess complexity
The invention discloses a layout structure of a capacitive touch panel, which comprises a plurality of electrical paths and a plurality of touch units, wherein the touch units respectively comprise at least one receiving electrode and at least one driving electrode; the receiving electrodes and the driving electrodes are allocated in the same conducting layer; the receiving electrodes and the driving electrodes are insulated with each other; the receiving electrodes are connected to a controller by different electrical paths, and the driving electrodes are electrically connected with each other. According to the invention, the light cover quantity and process complexity are simplified, and the manufacturing cost is further lowered.
Owner:NOVATEK MICROELECTRONICS CORP

A LED flip chip and a manufacturing method thereof

InactiveCN109103316AReduce absorption ratioIncrease the average reflectanceSemiconductor devicesMultiple quantumGallium nitride
The invention relates to the technical field of semiconductors and in particular provides an LED flip chip and a manufacturing method thereof. The method comprises the steps of: A) providing a substrate on which an N-type gallium nitride layer, multiple quantum well layers and a P-type gallium nitride layer are sequentially formed; B, forming an ohmic contact layer on the surface of the substrate;C, forming a mirror dielectric layer on the ohmic contact layer; D, forming a mirror metal layer; E, etching the exposed P-type gallium nitride layer and the quantum well layers to form an N-electrode contact hole; F, forming an isolation layer; G, forming an N electrode in thr N electrode contact hole and forming a P electrode on a mirror metal layer covering the exposed ohmic contact layer; H,thinning the back surface of the sapphire substrate and forming a coarse alumina lay on the back surface of the sapphire substrate. The manufacturing method of the invention can improve the light emitting efficiency of the LED flip chip, thereby improving the photoelectric conversion efficiency of the LED flip chip, avoiding the influence on the front side of the chip and reducing the manufacturing cost.
Owner:DONGGUAN SINOWIN OPTO ELECTRONICS

Multi-chip stacking structure and preparation thereof

ActiveCN101452861AIncrease the number of stacked layersAvoiding the problem of increasing structural heightSemiconductor/solid-state device detailsSolid-state devicesState of artChip stacking
The invention discloses a multichip stacking structure and a method for manufacturing the same. The multichip stacking structure comprises a first chip set which is provided with a plurality of first chips and is connected with a chip bearing piece in a stepped mode; the first chip of the topmost layer of the first chip set is connected with a second chip so that the first chip and the second chip are in electric connection with the chip bearing piece through a welding wire; adhesive film over wire technology (Film over Wire, FOW) is utilized to stack a third chip alternated with an insulating adhesive film on the first chip and the second chip so that the insulating adhesive film covers part of the welding wire end of the first chip of the topmost layer of the first chip set and at least one part of the second chip and is in electric connection with the third chip and the chip bearing piece through the welding wire, thereby solving the problem that when the second chip with planar dimension far less than that of the first chip is directly stacked on the first chip in the prior art, the height of the whole structure and the difficulty of wire welding operation are increased.
Owner:SILICONWARE PRECISION IND CO LTD

Method for introducing strain to channel and device manufactured by the same

The invention relates to a method for introducing strain to a channel of a MOS (Metal Oxide Semiconductor) device and a device manufactured by the method. The method comprises the following steps of: providing a semiconductor substrate; forming a channel on the semiconductor substrate; forming a first grid dielectric layer on the channel; forming a polycrystalline silicon grid electrode layer on the first grid dielectric layer; doping or injecting a first element in the polycrystalline silicon grid electrode layer; removing parts of the first grid dielectric layer and the polycrystalline silicon grid electrode layer so as to form a first grid electrode structure; forming a source drain extending zone in the channel; forming side walls on both sides of the first grid electrode structure; forming a source drain electrode in the channel; and annealing so that polycrystalline silicon doped or injected with the first element generates crystal lattice variation in a high-temperature crystallization process, thus generating first strain in the polycrystalline silicon grid electrode layer, and introducing the first stress to the channel through a grid medium layer. The method has stronger process flexibility, simpler process complication and no additional process cost.
Owner:INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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