38results about How to "Simple polishing process" patented technology

The invention discloses a polishing method for a gallium antimonide single crystal wafer. For coarse polishing, a cerium oxide polishing pad is adopted, and polishing liquid contains aluminum oxide abrasives with the particle size of W1, at the pressure of 100 to 200 g / cm<2>, the rotating speed of 10 to 40 r / min and the flow of 10 to 50 mL / min; for medium polishing, a black polyurethane polishing pad is adopted, and the polishing liquid contains silicon dioxide nano abrasives with the particle size of 60 to 100 nm and an oxidant, i.e., sodium hypochlorite, at the pressure of 80 to 150 g / cm<2>, the rotating speed of 60 to 100 r / min and the flow of 10 to 30 mL / min; for fine polishing, a black synthesized leather polishing cloth is adopted, and the polishing liquid is abrasive-free polishing liquid, at the pressure of 30 to 100 g / cm<2>, the rotating speed of 20 to 60 r / min and the flow of 5 to 10 mL / min. The polishing process is simple and easy to operate; the gallium antimonide single crystal wafer is low in surface damage and easy to clean, and the surface roughness is 0.3 nm.

The invention relates to a manufacture method of a non-aqueous printing ink wet underglaze colour self-sharpening polishing ceramic glazed tile. The manufacture method is characterized by comprising the following steps of proportioning raw materials, ball milling, iron removal, spraying pulverizing, compacting for moulding, biscuiting, wet underglaze colour decoration, glaze firing, self-sharpening polishing and edging. The self-polishing is as below: in order to prevent passivation of a resin polishing grinding head on a smooth glaze, during normal polishing operation, a ceramic glazed tile product to be polished is added with a rough surface body to be polished; the rough surface body to be polished rubs the polishing grinding head to keep the grinding head sharp. The method has advantages that produced polishing ceramic glazed tile has high strength, brilliant color, rich pattern texture of a ceramic tile as well as high surface flatness and good glossiness of a polishing product. Meanwhile, a production technology has advantages of simple process, low production cost, short sintering period, low energy consumption and simple polishing technology, and is suitable for large-scale production and demand of common consumers.

The invention discloses a prism magnetorheological polishing device comprising a rotating shaft, a work bench which is installed on the rotating shaft, multiple lifting jigs which are used for clamping prisms and a magnetorheological polisher which is used for polishing prism; the top surface of the work bench is provided with an annular groove for containing magnetorheological polishing solution, wherein the annular groove, the work bench and the rotating shaft are coaxially matched; the annular groove is made of plastic material; the multiple lifting jigs are uniformly installed inside the annular groove; the magnetorheological polisher comprises a rack, a polishing tool which is matched with the lifting jigs, a lifting device which is used for driving the polishing tool to go up and down and a main shaft which is connected with the rack; the polishing tool is connected with the main shaft through the lifting device; the polishing tool is positioned in the place matched with the annular groove; the rotating shaft drives the work bench to rotate and drives the lifting jigs successively pass through under the polishing tool. By means of the above structure, the polishing efficiency is high and the polishing device is suitable for industrialization production and application. The processing cost is low, and the experience or technical ability requirements are low for detecting and precision controlling operation personnel.

The invention discloses a chemical mechanical polishing machine. The chemical mechanical polishing machine comprises: a plurality of polishing components arranged at intervals and each of the polishing components comprises: a support, a polishing head and a polishing disc, and the polishing The head is arranged on the support and is adapted to move between a polishing position and a transmission position. When the polishing head is in the polishing position, the polishing head is located above the polishing disc; a transmission assembly, the transmission assembly includes : a turntable and a plurality of loading and unloading platforms, a plurality of loading and unloading platforms are arranged on the turntable at intervals and rotate with the turntable, when the polishing head is in the transmission position, the polishing head and the plurality of loading and unloading platforms corresponding to one of the platforms. Therefore, the mounting stability of the bracket is good, the working reliability of the polishing component is high, and the process stability of the polishing machine is good.