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Fixed abrasive polishing pad and dry type polishing method for deliquescent KDP crystals

A fixed abrasive, dry polishing technology, applied in grinding/polishing equipment, abrasives, machine tools for surface polishing, etc., can solve the problems of complex polishing process, low material removal rate, environmental pollution, etc., to simplify the polishing process, The effect of high material removal rate and high abrasive utilization rate

Active Publication Date: 2021-06-15
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a dry-type bonded abrasive polishing method for deliquescent KDP crystals to realize the precision of deliquescent KDP crystals in view of the problems of low material removal rate, complicated polishing process, and environmental pollution in the existing KDP crystal polishing process. polishing

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Use cerium oxide fixed abrasive polishing pad to carry out dry polishing on KDP crystal. The polishing pad contains 30g of cerium oxide abrasive grains with a particle size of 1.0µm; 10g of potassium hydroxide; fatty amide sulfosuccinic acid monoester (N-lauroyl Sodium sarcosinate or fatty alcohol polyoxyethylene ether sodium sulfate) 2.2g, and the remaining components are curing agent and binder; the set polishing pressure is 20kPa; the speed of the polishing pad is 40r / min, and the speed of the workpiece is 45r / min; The time is 20 minutes.

[0034] During the polishing process, the polishing pad is in contact with the KDP crystal surface, and the temperature of the contact surface rises under pressure, and the potassium hydroxide in the polishing pad and the KDP crystal undergo a solid-phase chemical reaction under the catalysis of fatty amide sulfosuccinic acid monoester to form a transition layer, the resulting transition layer is mechanically removed by the cerium ...

Embodiment 2

[0037] The KDP crystal was dry-polished using an alumina-bonded abrasive polishing pad, which contained 25 g of alumina abrasive grains with a particle size of 3.0 µm; 15 g of potassium carbonate; sodium N-lauroyl sarcosinate (fatty amide sulfosuccinate Acid monoester or fatty alcohol polyoxyethylene ether sodium sulfate) 3g, the remaining components are curing agent and binder; the set polishing pressure is 20kPa; the polishing pad speed is 50r / min, the workpiece speed is 55r / min; the polishing time is 25min.

[0038] During the polishing process, the polishing pad is in contact with the KDP crystal surface, and the temperature of the contact surface increases under the action of pressure. The potassium carbonate in the polishing pad and the KDP crystal undergo a solid-phase chemical reaction under the catalysis of N-lauroyl sarcosinate to form a transition layer. , the resulting transition layer is mechanically removed by the alumina abrasive grains in the polishing pad.

...

Embodiment 3

[0041] Use cerium oxide fixed abrasive polishing pad to carry out dry polishing on KDP crystal. The polishing pad contains 35g of cerium oxide abrasive grains with a particle size of 5.0µm; 10g of potassium bicarbonate; fatty amide sulfosuccinic acid monoester (N-lauroyl Sodium sarcosinate or fatty alcohol polyoxyethylene ether sodium sulfate) 4g, the remaining components are curing agent and binder; the set polishing pressure is 25kPa; the polishing pad speed is 40r / min, the workpiece speed is 42r / min; polishing time for 30min.

[0042]During the polishing process, the polishing pad is in contact with the KDP crystal surface, and the temperature of the contact surface rises under pressure, and the potassium bicarbonate in the polishing pad and the KDP crystal undergo a solid-phase chemical reaction under the catalysis of fatty amide sulfosuccinic acid monoester to form a transition layer, the resulting transition layer is mechanically removed by the cerium oxide abrasive grai...

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PUM

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Abstract

The invention discloses a fixed abrasive polishing pad and a dry type polishing method for deliquescent KDP crystals. The polishing method comprises the steps of polishing the KDP crystals by using the fixed abrasive polishing pad, and performing dry type fixed abrasive polishing without using a liquid polishing medium, wherein the fixed abrasive polishing pad comprises abrasive particles, reactants, a catalyst, a curing agent and a binding agent, the reactants in the polishing pad and the KDP crystals are subjected to a solid-phase chemical reaction, a generated transition layer is removed under the mechanical action of the abrasive particles, and a smooth surface is obtained. The method solves the problem that the KDP crystals are easy to deliquesce, improves the processing efficiency of the KDP crystals, simplifies the polishing process of the KDP crystals, and has the advantages of environmental friendliness, low cost and the like.

Description

technical field [0001] The invention relates to the technical field of precision machining, in particular to a polishing method for optical performance material KDP crystals, in particular to a method for polishing KDP dry-type fixed abrasives for deliquescent functional crystals. Background technique [0002] KDP crystal has performance advantages such as frequency doubling effect, photoelectric effect, piezoelectric effect, large nonlinear optical coefficient, high laser damage threshold, wide light transmission band, excellent optical uniformity and easy phase matching. It is used in inertial confinement nuclear fusion and communication. Fields, controllable thermonuclear reactions, nuclear reaction explosions and other fields have important applications. However, KDP crystal has the characteristics of low hardness, high brittleness, temperature sensitivity, deliquescence and anisotropy, and is recognized by the international optical community as one of the most difficult...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24D13/00B24D3/00B24B29/00
CPCB24D13/00B24D3/00B24B29/00
Inventor 李军熊光辉李凯旋朱永伟左敦稳吴成于宁斌
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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