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42results about How to "Fast developing speed" patented technology

Colored photosensitive resin composition color filter and image display device produced using the same

The present invention relates to a colored photosensitive resin composition, and a color filter and an image display device manufactured using the colored photosensitive resin composition. The colored photosensitive resin composition comprises the alkali-soluble resin, a photopolymerization compound, and a photopolymerization initiator, the alkali-soluble resin comprises a structural unit represented by the general formula 1 and a structural unit represented by the general formula 2, and the photopolymerization initiator contains a compound represented by the general formula 3.
Owner:DONGWOO FINE CHEM CO LTD

Developer for positive thermosensitive CTP (Computer to Plate)

The invention discloses a developer for positive thermosensitive CTP (Computer to Plate), belonging to the technical field of preparation of developers for CTP. The developer comprises the following compositions in parts by weight: 75-85 parts of water, 10-15 parts of alkali metal metasilicate, 1-5 parts of surfactant, 1-5 parts of alkali resistant penetrating agent and 3-5 parts of auxiliary additive. The developer has the characteristics of high developing speed, good screen dot reduction, no damage to an aluminum substrate, difficulty in scaling, environmental protection, fatigue resistance, excellent developing latitude and the like.
Owner:TAIXING CITY ORIENT IND

Color photoresist for color filter

The invention discloses a color photoresist for a color filter, which comprises paint, a polyfunctional monomer, photoinitiator, dissolvent, alkali soluble resin, as well as an alkali soluble monomer. The polyfunctional monomer comprises at least two unsaturated bonds; and the alkali soluble monomer contains lots of carboxyl groups to increase the alkali solubility of photosensitive resin, greatly improve the unexposed part on a substrate and residual situation on a black matrix and boost the development speed. In addition, the compound contains lots of ethylene unsaturated groups, and the photosensitivity is excellent during exposing, thereby not only enhancing the dying power of the color photoresist, but also improving the performance of films.
Owner:SUZHOU TIANLILAN ENVIRONMENTAL PROTECTION TECH

Photo-cured printing ink for gold-plating resistant potion and application of photo-cured printing ink

The invention discloses photo-cured printing ink for a gold-plating resistant potion and application of the photo-cured printing ink, belonging to the technical field of a printed circuit board. The photo-cured printing ink is prepared from the following components in parts by weight: 5 to 25 parts of (methyl) acrylic copolymer resin, 5 to 25 parts of esterified styrene-maleic anhydride copolymer resin, 5 to 25 parts of polymeric monomers, 0.5 to 8 parts of photoinitiator, 5 to 40 parts of fillers and 30 to 70 parts of solvent, wherein the (methyl) acrylic copolymer resin is obtained by means of copolymerizing ethylene-series unsaturated monomers and / or propylene-series unsaturated monomers with methyl acrylic acid. The photo-cured printing ink disclosed by the invention has the advantages that the effects of excellent resolution, excellent adhesive force, excellent hardness, excellent gold-plating potion resistance and excellent film stripping performance are achieved, and the photo-cured printing ink is suitably used for selectively covering a PCB (printed circuit board) in a PCB gold-plating technology, especially suitable for producing a high-precision PCB with a smaller welding spot pitch.
Owner:SHANGHAI PHICHEM MATERIAL CO LTD

PCB circuitous pattern development exposure method

The invention discloses a PCB circuitous pattern development exposure method which comprises the following steps: (1) preparing a film, (2) conducting counterpoint exposure, (3) conducting development and (4) conducting cleaning and drying. The PCB circuitous pattern development exposure method has the advantages that in the exposure process, an exposure energy test is firstly carried out, the exposure time is determined, the exposure level is ensured, the exposure is carried out in vacuum, the film is completely attached to a PCB, and the exposure effect is ensured; in the development process, development parameters are strictly controlled, the development effect is ensured, meanwhile, the spraying development is adopted, the development speed is accelerated, then, the pressure washing and hot-blast air drying are carried out, the PCB cleaning speed and drying speed are ensured, and the PCB circuitous pattern development exposure method is quite suitable for flow line production.
Owner:SICHUAN HAIYING ELECTRONICS TECH

Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition

The invention discloses a light sensitization composition using a sulfonyl hydrazone compound. The composition comprises a dissolving resistant / dissolving promotion agent, an alkali soluble line type phenolic resin, an infrared absorption dye, a background dye and a solvent, wherein the dissolving resistant / dissolving promotion agent is a cyclohexanone sulfonyl hydrazone compound. The sulfonyl hydrazone compound provided by the invention is added into the light sensitization composition and can be quickly subjected to chemolysis to generate N2 for foaming only when the temperature of a scanning area is higher than 170 DEG C. In the decomposition foaming process, the membranous layer of the scanning area is loosened and is easy to develop, and most of small segments remained on the membranous layer after the decomposition are acidic materials of different types, so that an obvious dissolving promotion effect is generated during alkali development, and the composition has high thermal stability and long service life. Therefore, the cyclohexanone sulfonyl hydrazone compound is used as the dissolving resistant / dissolving promotion agent of the light sensitization composition, so that a thermosensitive computer to plate (CTP) board with high sensitivity and high development speed can be obtained.
Owner:LUCKY HUAGUANG GRAPHICS

Silver halide color photosensitive material and method of processing the same

InactiveCN101044431AEasy to handleFast developing speedSubtractive colour processesSubtractive cinematographic processesWavelengthMagenta
The present invention provides a silver halide color photosensitive material, having, on a transparent support, at least one each of yellow-, cyan-, and magenta-color-forming photosensitive silver halide emulsion layers, and photosensitive silver halide emulsion layer containing a coupler that forms a dye having its absorption maximum at a wavelength longer than 730 nm upon reaction with an oxidized product of a developing agent, wherein the yellow-color-forming photosensitive silver halide emulsion layer contains photosensitive silver halide grains having an average grain size of 0.4 m or below and a silver chloride content of 95 mole% or above based on total silver in the grains, and wherein the photosensitive silver halide grains include photosensitive silver halide grains whose iodide ion concentrations have their maxima at grain surfaces and decrease gradually toward the interior of the grains; and a method of processing a silver halide color photosensitive material for use in film screening.
Owner:FUJIFILM CORP

Positive photoresist composition and resist pattern formation

Provided is a means of improving the development speed of a positive photoresist composition containing a photosensitive novolak resin obtained by substituting 1,2-naphthoquinonediazidesulfonyl for all of the alkali-soluble novolak resin. formed from some of those hydrogen atoms of the phenolic hydroxyl group. The means is a positive photoresist composition and a method for forming a photoresist pattern using the composition, the composition comprising (A) a photosensitive novolak resin dissolved in (B) propylene glycol alkyl ether acetate, wherein some of those hydrogen atoms of all the phenolic hydroxyl groups of the alkali-soluble novolak resin are substituted with 1,2-naphthoquinonediazidesulfonyl groups.
Owner:TOKYO OHKA KOGYO CO LTD

Photosensitive resin composition, colored filter, liquid crystal display device and imaging element

The invention provides a photosensitive resin composition, a colored filter which is produced by using the photosensitive resin composition, and a liquid crystal display device or an imaging element having the colored filter. The invention is characterized in that a coloring agent (A), an alkali-soluble resin (B), a photopolymerizable compound (C), a photopolymerizable initiator (D) and a solvent (E) are provided; the alkali-soluble resin (B) includes a repetitive unit expressed by a chemical formula I with the acid value being 30-150mgKOH / g.
Owner:DONGWOO FINE CHEM CO LTD

Quantum dots and application thereof

Quantum dots and application thereof are provided. The quantum dots of the present invention have a ligand layer on the surface, and the ligand layer contains one or more of the compounds representedby Chemical Formulas 1 to 4. The quantum dots of the present invention are excellent in oxidation stability, and thus can be effectively applied to quantum dot dispersions, quantum dot light conversion compositions, and the like. In chemical formula 1, L is a C1-C22 alkylene group, R is hydrogen or methyl, and n is an integer from 1 to 3; in chemical formula 2, R1 is hydrogen, etc., and R2 is a C1-30 alkylene group; in the chemical formula 3, R3 is hydrogen or methyl, R4 is a C1-C30 linear or branched alkylene group, and m is an integer from 1 to 100; in the chemical formula 4, R5 is hydrogenor methyl, R6 is a C1-C30 linear alkylene group, A is -O-, -NH-, etc., R7 is a C1-C7 alkyl group, and l is an integer of 1 to 250.
Owner:DONGWOO FINE CHEM CO LTD

Colored photosensitive resin composition for color filter, color filter and liquid crystal display device having the same

The invention relates to a colored photosensitive resin composition for a color filter, a color filter and a liquid crystal display device having the same, concretely a colored photosensitive resin composition for a red filter used in manufacturing a red filter used for a color LCD display unit.
Owner:DONGWOO FINE CHEM CO LTD

LED (Light Emitting Diode) chip photoetching developing method

The invention discloses an LED (Light Emitting Diode) chip photoetching developing method which comprises the following steps: cleaning the surface of an LED chip; by using a plasma enhanced chemical vapor deposition method, preparing a layer of a silicon dioxide membrane on the LED chip; uniformly coating the prepared silicon dioxide membrane with a layer of a photoresist of 3mu m in thickness; performing graphic exposure treatment on the LED chip through an exposure machine and a light cover; performing development treatment on the photoresist by using a developing liquid, wherein the developing time is 60 seconds, the developing temperature is 20-40 DEG C, the developing liquid comprises strong base, weak base and pure water, the strong base accounts for 0.5-5% by mass, the weak base accounts for 1-10% by mass, the pure water accounts for 85-98.5% by mass, the strong base is any one of lithium hydroxide, sodium hydroxide, potassium hydroxide, rubidium hydroxide and cesium hydroxide, and the weak base is ammonia water or aluminum hydroxide; and etching the exposed silicon dioxide membrane, and transferring patterns on the light cover to the surface of the LED chip.
Owner:XIANGNENG HUALEI OPTOELECTRONICS

Thick film photoresist composition containing carboxyl phenolic resin with high heat resistance

The invention discloses a thick film photoresist composition containing carboxyl phenolic resin with high heat resistance. The structural general formula of the carboxyl phenolic resin with high heatresistance is shown in the specification, wherein x is 0-4, the ratio of m to n is 0.05-0.75: 1, R is H, phenyl or C1-C9 alkyl, and the weight-average molecular weight of the resin is 8000-35000g / mol.The film-forming resin is mixed with commercial phenolic resin, a photosensitive compound, an additive, a solvent and other components to obtain the thick film photoresist composition. Tests show that the thick film photoresist composition is high in resolution ratio, high in sensitivity, good in heat resistance and excellent in etching resistance, and is suitable for MEMS processing and packaging processes with high heat resistance requirements.
Owner:SUZHOU RUIHONG ELECTRONIC CHEM CO LTD

Dry film resist with high adhesive power and high developing speed

The invention discloses a dry film resist with high adhesive power and high developing speed. The dry film resist comprises a solvent, and anti-etching core components with the concentration of 30-50wt% and dissolved in the solvent, wherein the anti-etching core components comprise alkali soluble resin, an olefinic photopolymerization unsaturated monomer, a photopolymerization initator, a coloringagent and an additive; and the olefinic photopolymerization unsaturated monomer comprises a cyclodextrin-group-comprising olefinic unsaturated double-bond compound, a bisphenol A structure-comprisingacrylic compound, polyethylene glycol chain section-comprising dimethacrylate, trimethylolpropane triacrylate and a phosphate group-comprising hydroxyethyl acrylate compound. The light-sensitive dryfilm resist prepared in the invention has the characteristics of high adhesive power and high developing speed; and by virtue of the dry film resist, the phenomena of diffusion plating and short circuit in the electroplating process are effectively reduced, and efficiency and yield of the production process of a circuit board are greatly improved.
Owner:ZHEJIANG FORST NEW MATERIAL RES INST CO LTD

A colored photosensitive resin composition, color filter and liquid crystal display device having the same

The invention relates to a colored photosensitive resin composition,a color filter and a liquid crystal display device having the same. The colored photosensitive resin composition comprises colorant (A), alkali-soluble resin (B), photopolymerizable polymer (C), photopolymerizable initiator (D), cross-linking agent (E), and solvent (F). The hydroxyl value of the alkali-soluble resin (B) is in a range from 30-180mgKOH / g, and the cross-linking agent (E) can be expressed by the formula 1.
Owner:DONGWOO FINE CHEM CO LTD

Axial split-phase hybrid excitation type magnetic suspension motor control system

The invention discloses an axial split-phase hybrid excitation type magnetic suspension motor control system, which directly controls the electromagnetic torque and suspension force of a motor, saves control delay caused by controlling intermediate quantity, effectively improves the response speed and operation performance of the motor, and meanwhile, in a rotating speed control ring and a radial displacement control ring, the axial split-phase hybrid excitation type magnetic suspension motor control system has the advantages that the control delay is reduced; according to the method, traditional proportional-integral-differential control is replaced by second-order sliding mode control with higher robustness and higher response speed, a reference electromagnetic torque is output after a rotating speed error is adjusted by a second-order sliding mode controller, and further, the electromagnetic torque of the motor is directly controlled; and after the radial displacement error is adjusted by the second-order sliding mode controller, reference suspension force is output, and the suspension force of the motor is further directly controlled, so that second-order sliding mode direct torque and direct suspension force are formed, and the response speed, the anti-interference capability and the suspension performance of the magnetic suspension motor can be effectively improved.
Owner:NANJING INST OF TECH

Developing agent for radiology department

The invention provides a developing agent for the radiology department. The developing agent is prepared from 1,4-dihydroxy-benzene, 1-phenyl-3-pyrazolidinone, sodium sulfite, potassium bromide, anhydrous sodium carbonate and 1H-Benzotriazole according to a certain proportion, and the application temperature is 18-24 DEG C. The developing agent for the radiology department can be used for effectively solving the problem that a developing agent on the present market is extremely small in application temperature range and is poor in developing effect, has the advantages of simple preparation method, high definition, low dropping probability of drug membranes and high developing speed and is suitable for X-ray plate cleaning in the radiology department of a hospital.
Owner:李泉

Colored photo sensitive resin composition, colored filter and display devide

The present invention provides a colored photosensitive resin composition, a colored filter, and a display device. The colored photosensitive resin composition is characterized by containing a coloring agent, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent. The alkali-soluble resin is a resin containing a structural unit represented by Chemical Formulas 1 and 2, a weight average molecular weight of 25,000 to 35,000, and an acid value of 50 to 100 mgKOH / g, and the photopolymerization initiator contains 60 to 95 % by weight of the compound represented by Chemical Formula 3 with respect to the total weight of the photopolymerization initiator. In the Chemical Formula 1, each of R1 is independently hydrogen or an alkyl group having 1 to 5carbon atoms; in the Chemical Formula 2, R1 is independently hydrogen or an alkyl group having 1 to 5 carbon atoms, and each of R2 is independently hydrogen or an alkyl group having 1 to 5 carbon atoms; and in the Chemical Formula 3, R3 is an alkyl group, an aryl group or an aralkyl group of C1-C12, and R4 is an alkyl group or an aryl group of C1-C12.
Owner:DONGWOO FINE CHEM CO LTD

Flat-screen developing machine

The invention discloses a flat-screen developing machine which comprises a screen frame seat arranged on a machine frame, a lighting device arranged behind the screen frame seat, and a developing vehicle sleeved on the screen frame seat and driven by a power device to go up and down repeatedly; the developing vehicle comprises a cylindrical vehicle body arranged transversely; a spray device is arranged in the cylindrical vehicle body and comprises a group of spray pipes or a plurality of groups of spray pipes arranged up and down; each group of spray pipes comprises a spray pipe positioned behind the screen frame seat and another spray pipe correspondingly arranged in front of the screen frame seat; a plurality of spray nozzles which are the same are arranged on two spray pipes in the same group; and the spray nozzles of different groups of spray pipes are different. When the flat-screen developing machine is used for develop a screen printing plate automatically, the influences of human factors can be eliminated, the aperture ratio of screen patterns is improved, the developing effect is uniform, and the developing speed is improved.
Owner:郝强

The Method of Improving the Developing Rate of High-speed Printing Paper

The invention provides a method for improving the developing rate of high-speed blueprint paper. According to the method for improving the developing rate of the high-speed blueprint paper, a nitrogen-containing heterocyclic one derivative as a display promoting agent is added into a light sensitive liquid of the high-speed blueprint paper, and the nitrogen-containing heterocyclic one derivative is mainly a five member ring one derivative. The light sensitive liquid of the blueprint paper provided by the invention is a novel display developing agent which has a relatively high display promoting effect for the blueprint paper but without influencing the quality guarantee period of the blueprint paper.
Owner:长沙慧达实业有限公司

Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition

The invention discloses a light sensitization composition using a sulfonyl hydrazone compound. The composition comprises a dissolving resistant / dissolving promotion agent, an alkali soluble line type phenolic resin, an infrared absorption dye, a background dye and a solvent, wherein the dissolving resistant / dissolving promotion agent is a cyclohexanone sulfonyl hydrazone compound. The sulfonyl hydrazone compound provided by the invention is added into the light sensitization composition and can be quickly subjected to chemolysis to generate N2 for foaming only when the temperature of a scanning area is higher than 170 DEG C. In the decomposition foaming process, the membranous layer of the scanning area is loosened and is easy to develop, and most of small segments remained on the membranous layer after the decomposition are acidic materials of different types, so that an obvious dissolving promotion effect is generated during alkali development, and the composition has high thermal stability and long service life. Therefore, the cyclohexanone sulfonyl hydrazone compound is used as the dissolving resistant / dissolving promotion agent of the light sensitization composition, so that a thermosensitive computer to plate (CTP) board with high sensitivity and high development speed can be obtained.
Owner:LUCKY HUAGUANG GRAPHICS

Developing solution for positive-type PS plate and preparation method thereof

The invention discloses a developing solution for a positive-type PS plate and a preparation method thereof. The developing solution comprises the following raw materials by weight: 60-65% of distilled water, 15-20% of a developer, 8-15% of a protectant, and 2-5% of a wetting agent. The developer is a mixed solvent of sodium hydroxide, potassium hydroxide and sodium silicate, the protectant is oneor more of sodium phosphate, potassium chloride and sodium chloride, and the wetting agent is a mixed solvent of a silanol nonionic surfactant and an anionic surfactant. The developing solution provided by the invention adopts the mixed solvent of potassium hydroxide and sodium silicate as the developer, is a weak base developing solution, lowers the corrosion performance, reduces waste liquid discharge, and has the characteristics of fast developing speed, stable performance and long service life. The wetting agent involved in the invention adopts the mixed solution of a silanol nonionic surfactant and an anionic surfactant, has good wettability and dispersion uniformity, and improves the developing uniformity.
Owner:JIANGSU LECAI PRINTING MATERIAL
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