75results about How to "Good alkali solubility" patented technology

The invention discloses an alkaline-solubility photosensitive organic silicon prepolymer and a preparation method thereof. The preparation method includes the following steps: (1) epoxide, a polymerization inhibitor 1, a catalyzer 1 and an olefinic monomer which can react with a epoxide group are added into a first reactor and react at 80 DEG C to 100 DEG C for 5 hours to 7 hours; (2) organic silicon, polybasic isocyanate, carboxylic acid or acid anhydride containing an active group, a polymerization inhibitor 2 and a catalyzer 2 are added into a second reactor at 50 DEG C to 80 DEG C for 5 hours to 8 hours, and then products obtained in the step (1) are added into the second reactor for reaction till termination; and (3) temperature is reduced to the room temperature and then materials are discharged and stored and reserved away from light. The organic silicon prepolymer of the invention has the advantages that: (1) the synthesized photosensitive organic silicon prepolymer has comparatively good resistance to high temperature as well as good light sensitivity and flexibility; (2) solder mask ink prepared by the prepolymer is developed by weak alkali liquor so as to avoid environmental pollution caused by mass use of organic solvents; and (3) the invention has simple synthetic method, easy operation and low-cost and easily available materials.

The invention discloses alkali-soluble hyperbranched photosensitive organic silicon prepolymer and a preparation method thereof. The preparation method comprises the following steps of: (1) adding organic silicon, polyisocyanate, carboxylic acid or anhydride containing an active group and a catalyst to a first reactor and reacting for 3-7 hours at the temperature of 50-60 DEG C; (2) adding a hydroxyl-ended hyperbranched polymer (HPB-OH) and a catalyst to a second reactor, then, adding a product in the first step, and reacting for 2-5 hours at the temperature of 30-70 DEG C; (3) adding the polyisocyanate, a gadoleic acid-hydroxyl ester compound, the catalyst and a polymerization inhibitor to a third reactor, and reacting for 5-8 hours at the temperature of 40-80 DEG C; (4) reacting the product in the second step, the product in the third step, the catalyst and the polymerization inhibitor for 2-6 hours at 30-80 DEG C; and (5) cooling to room temperature, discharging and keeping in a dark place for standby. The invention has the advantages that: (1) the synthesized alkali-soluble hyperbranched photosensitive organic silicon prepolymer has better high temperature resistance, better photosensitivity, better flexibility, higher light reaction activity and lower viscosity; (2) solder resist ink prepared by the prepolymer is developed by a diluted alkali solution, therefore, the environmental pollution caused by largely using an organic solvent is avoided; and (3) the synthetic method is simple and is easy to operate, and raw materials are cheap and are easy to obtain.

The invention provides a preparation method for isosorbide 5-mononitrate. The preparation method comprises the following steps: with isosorbide dinitrate as a raw materials and Pd / C as a catalyst in a special mixed solvent, carrying out selective hydrogenation reduction on 2-nitro, filtering after reaction, steaming to remove ethyl alcohol in filtrate, extracting residual concentrated liquid through ethyl acetate, washing extracting liquid through dilute acid, washing to be neutral through water, drying through anhydrous magnesium sulfate, filtering to remove a drying agent and steaming to remove ethyl acetate so as to obtain high-purity isosorbide 5-mononitrate. Compared with the prior art, the synthetic method provided by the invention is simple and easy to operate, impurities are easy to remove, the yield and purity are higher, the cost is reduced since the Pd / C and the solvent can be recycled and reused, isosorbide generated through over reduction can be recycled and the preparation method is suitable for industrial production.

A positive-working lithographic printing starting plate for an infrared laser is provided that includes a support having a hydrophilic surface and a heat-sensitive layer provided above the support. The heat-sensitive layer includes a water-insoluble and alkali-soluble resin, an infrared-absorbing dye, and a sulfonium salt represented by Formula below. The heat-sensitive layer increases its solubility in aqueous alkaline solution upon exposure to an infrared laser. (In the formula, R1 and R2 independently denote an optionally substituted alkyl group having 1 to 12 carbons, an optionally substituted cycloalkyl group having 3 to 8 carbons, an optionally substituted aralkyl group having 7 to 12 carbons, or an optionally substituted aryl group having 6 to 15 carbons, R1 and R2 may bond to each other to form a cyclic structure; Ar denotes an optionally substituted aromatic hydrocarbon group having 6 to 15 carbons and having at least one OH group at the ortho- and / or para-position; and X− denotes an anion of an organic acid.)

The present invention provides a reactive dyestuff with an alkylthio group and a β-sulfatoethylsulfone group, which is represented by formula (I),wherein D, R, R1, R2, R3, R4, Q, x, and y are defined the same as the specification. The reactive dyestuffs of the present invention not only have characteristics of high solubility, high alkali solubility, and easily being washed off for dyeing cellulose fiber, but also are suitably applied in cold-pad-batch dyeing, continuous-dyeing, printing, and digital printing.

The invention relates to protective printing ink for the process of acid-etching glass. The resin components of the protective printing ink comprise the follow components in parts by weight: 45 to 60parts of o-alkyl phenolic epoxy acrylic acid resin, 5 to 10 parts of photopolymerizable monomer, 3 to 8 parts of photopolymerization initiator and 3 to 5 parts of epoxy resin. The printing ink obtained by taking the o-alkyl phenolic epoxy acrylic acid resin as a main component has excellent hydrofluoric acid corrosion resistance after being solidified on the surface of glass to form a film; compared with the traditional glass protective printing ink, the printing ink has the advantages that the hydrofluoric acid corrosion resistance is increased by one time, the adhesive force is 0 level and the hardness is moderate; compared with the traditional protective printing ink, the printing ink is more suitable for preparing 3D glass with AG effect; furthermore, the protective printing ink has excellent alkali dissolving property after being solidified on the surface of the glass to form a film, can be completely demolded and avoid residue when being soaked into a sodium hydroxide solution within 60 seconds, is favorable for improving the working efficiency and saves the aftertreatment working hours.

The invention belongs to the technical field of high polymer materials, and particularly discloses anhydride modified epoxy acrylic resin, alkali development high-heat-resistance polyurethane resin and solder resist ink thereof. The anhydride modified epoxy acrylic resin provided by the invention is prepared by jointly modifying epoxy resin with dimethylolcarboxylic acid and monobasic acid. According to the invention, the anhydride modified epoxy acrylic resin has the advantages of excellent heat resistance, chemical resistance, developability and the like, and is introduced into a polyurethane chain segment in a graft copolymerization manner to modify polyurethane, so that the epoxy acrylic modified polyurethane resin with heat resistance, chemical resistance, flexibility and developability is prepared. The solder resist ink containing the epoxy acrylic acid modified polyurethane resin is heat-resistant and chemical-resistant, has excellent developability and flexibility, and shows obvious performance advantages in practical application. In addition, the anhydride modified epoxy acrylic resin and the epoxy acrylic modified polyurethane resin provided by the invention are simple inpreparation method and suitable for industrial application.

The invention relates to a preparation method of high-weatherability nanometer rutile titanium dioxide. The method has the following specific steps: respectively pumping metatitanic acid slurry and asodium hydroxide solution into a metering tank and preheating, mixing and stirring, heating and conducting an alkali dissolution reaction, cooling a mixture to room temperature, washing and discharging to obtain an alkali dissolution material; adding deionized water to the generated alkali dissolution material and stirring, adding concentrated hydrochloric acid and regulating pH of the slurry, heating the slurry, pressurizing the mixture and conducting a sol reaction, adding water to the mixture for dilution and stirring to obtain a nanometer rutile titanium dioxide crude product, pumping thecrude product into a centrifuge and centrifuging the slurry; neutralizing by adding a neutralizing agent and successively washing, coating, washing, drying and crushing so as to obtain the high-weatherability nanometer rutile titanium dioxide product. The method has the following advantages: synthesis temperature is low; the method is easy for industrial production; conditions are easy to control;and cost is low.

A planographic printing plate precursor comprises a support and two or more positive recording layers which are formed on the support, contain a resin and an infrared absorbing agent and exhibit an increase in solubility in an aqueous alkali solution by exposure to infrared laser light, wherein the positive recording layer closest to the support among these two or more positive recording layers contains at least two types of resins among which at least one type forms a dispersion phase. It is preferable that the dispersion phase be formed of (1) a high-polymer compound incompatible with a high-polymer matrix or (2) a granular polymer selected from a microcapsule and a latex, and contains an infrared absorbing agent and an acid generator.