1027results about How to "Increase photosensitivity" patented technology

The present invention relates to a cross-linker for photoresist compositions which is suitable for a photolithography process using KrF (248 mn), ArF (193 mn), E-beam, ion beam or EUV light sources. Preferred cross-linkers, according to the present invention, comprise a copolymer of (i) a compound represented by following Chemical Formula 1 and/or (ii) one or more compound(s) selected from the group consisting of acrylic acid, methacrylic acid and maleic anhydride. ##STR1## wherein, R.sub.1 and R.sub.2 individually represent straight or branched C.sub.1-10 alkyl, straight or branched C.sub.1-10 ester, straight or branched C.sub.1-10 ketone, straight or branched C.sub.1-10 carboxylic acid, straight or branched C.sub.1-10 acetal, straight or branched C.sub.1-10 alkyl including at least one hydroxyl group, straight or branched C.sub.1-10 ester including at least one hydroxyl group, straight or branched C.sub.1-10 ketone including at least one hydroxyl group, straight or branched C.sub.1-10 carboxylic acid including at least one hydroxyl group, and straight or branched C.sub.1-10 acetal including at least one hydroxyl group; and R.sub.3 represents hydrogen or methyl.

This invention provides a photographing optical lens assembly including, in order from an object side toward an image side: a first lens element with positive refractive power having a convex object-side surface, a second lens element with negative refractive power having a concave object-side surface and a concave image-side surface, a third lens element with positive refractive power, a fourth lens element with negative refractive power having a convex object-side surface and a concave image-side surface, and at least one of surfaces thereof being aspheric, a plastic fifth lens element having a convex object-side surface and a concave image-side surface with at least one inflection point. An aperture stop is positioned between an imaged object and the third lens element. The photographing optical lens assembly further comprises an electronic sensor on which the object is imaged.

The invention relates to a display device. The display device comprises a cover plate and a display panel which are arranged oppositely; the display panel comprises a through hole, a first non-displayarea, a display area and a second non-display area; the through hole runs through the display panel along the thickness direction; the first non-display area surrounds the through hole; the display area surrounds the first non-display area; the second non-display area surrounds the display area; the positive projection of the cover plate on the plane on which the display area is covers the through hole; the display panel also comprises an upper polaroid; the upper polaroid is positioned on one side, near the cover plate, of the display panel; and a shading material is arranged on the surfaceof one side, near the through hole, of the upper polaroid. The display device provided by the invention can effectively improve the light leakage problem of the display panel and improve the shootingeffect of photosensitive devices such as a camera while increasing the screen-to-body ratio of the display panel.

The present invention provides an optical lens system comprising, in order from an object side to an image side: a first lens element with positive refractive power having a convex object-side surface; a second lens element with negative refractive power; a third lens element with positive refractive power having a convex object-side surface and a convex image-side surface; a fourth lens element; and a fifth lens element having a convex object-side surface and a concave image-side surface, the object-side and image-side surfaces thereof being aspheric and at least one inflection point being formed on the image-side surface. Such arrangement of optical elements can effectively minimize the size of the optical lens system, lower the sensitivity of the optical system, and obtain higher image resolution.

A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light. The composition comprises: (a) at least one reactive species that is capable of undergoing such reaction; and (b) at least one multi-component, multiphoton photoinitiator system.

An optical moulding process is disclosed comprising the sequential steps of: (a)(y) forming a layer of a photocurable composition; and (bXz) irradiating selected areas of the composition in the layer with radiation from a radiation source, thereby curing the composition in said selected areas and repeating the steps a) and b) on top of an earlier cured layer to form a three dimensional structure, wherein the radiation source used in step b) is a non-coherent source of radiation and wherein the photocurable composition comprises at least two curable components: (i) 45%-95% (and preferably at least 50%, more preferably at least 60%, e.g. at least 70%) by weight of the total curable components in the composition is a first component that is photocurable and that is such that, when cured in the presence of a photocuring initiator by exposure to UV radiation having an energy of 30 mJ/cm², at least 90% of the component is cured within 50 milliseconds; and (ii) 5% to 55% (and preferably 10-40%, more preferably 15 to 30%, e.g. about 20%) by weight of the total curable components in the composition is a second component that results in the composition, on curing, shrinking, in a linear direction, by less than 3% and preferably that results in the composition having, after cure, a T_g of greater than 50° C., preferably at least 100° C. and more preferably at least 120° C.

The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.

The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5,

• • where, R₁ and R₂ R₅, R₆, R₇, R₈, and R₉ are defined herein; m=1–5; X⁻ is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3,
  • where R₃₀, R₃₁, R₃₂, R₃₃, and R₃₄ are defined herein.

This invention provides an imaging lens assembly comprising, in order from an object side to an image side: a first lens element with negative refractive power having a convex object-side surface and a concave image-side surface; a second lens element with positive refractive power having a convex image-side surface; a third lens element with negative refractive power having a concave object-side surface and a convex image-side surface, both being aspheric; a fourth lens element with positive refractive power having a convex object-side surface, both its two surfaces being aspheric; and a stop disposed between the first and second lenses.

A scanning range sensor includes an outer cover having a transparent window that is horizontally annular, a vertical type cylindrical rotary member inside the outer cover, a light receiving window with an optical lens of the cylindrical rotary member, a light projector between the outer cover and the cylindrical rotary member, an optical system for leading light from the light projector along the direction of the rotational axis of the cylindrical rotary member by the mirrors on the inner surface of the cylindrical rotary member, a photodetector that within the interior of the cylindrical rotary member is fixed and arranged separately from the cylindrical rotary member so as to coincide with the rotational axis of the cylindrical rotary member and is connected to a distance computation circuit, and a reflecting mirror and scanning mirror along the rotational axis of the cylindrical rotary member.

A method of producing an active optical waveguide having asymmetric polarization, said method comprising the steps of (a) providing an active optical waveguide (10) comprising: (i) a transverse refractive index profile (21) comprising a guiding region (11), an intermediate region (13), and a non-guiding region (12); (ii) a transverse photorefractive dopant profile (31) comprising a constant or graded photorefractive dopant concentration within at least one of the guiding, non-guiding and intermediate regions, except that the photorefractive dopant is not located solely in the guiding region; and (iii) exhibiting in said guiding region, intermediate region, or both, light guiding modes having different polarizations; and (b) exposing at least a part (10a, 10b) of the active optical waveguide to an effective transverse illumination of light (20) reacting with the photorefractive dopant and modifying said transverse refractive index profile; said part of the active optical waveguide being exposed to a fluence selectively suppressing the propagation of the light guiding modes having different polarizations so that the propagation of one mode is less suppressed than the propagation of the other mode(s). Such an active optical waveguide, single polarization mode optical waveguide lasers and multi-wavelength single polarization mode optical waveguide lasers comprising such an active optical waveguide, methods of their production, and their uses in telecommunications, in spectroscopy, in sensors and in absolute calibrated laser light sources.

The invention relates to coated optical fibers comprising soft primary coatings and to such primary coatings for protecting glass optical fibers having a sufficient high resistance against cavitation. In particular, the primary coatings have a cavitation strength at which a tenth cavitation appears (sigma10cav) of at least about 1.0 MPa as measured at a deformation rate of 0.20% min-1 and of at least about 1.4 times their storage modulus at 23° C. The coating preferably shows strain hardening in a relative Mooney plot, preferably has a strain energy release rate Go of about 20 J/m2 or more, and preferably has a low volumetric thermal expansion coefficient. The invention furthermore provides a method and apparatus for measuring the cavitation strength of a primary coating.

Provided are a CMOS image sensor and a method for fabricating the same. A nanopillar is plurally formed at an upper end of a light receiving element.