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171 results about "Outgassing" patented technology

Outgassing (sometimes called offgassing, particularly when in reference to indoor air quality) is the release of a gas that was dissolved, trapped, frozen, or absorbed in some material. Outgassing can include sublimation and evaporation (which are phase transitions of a substance into a gas), as well as desorption, seepage from cracks or internal volumes, and gaseous products of slow chemical reactions. Boiling is generally thought of as a separate phenomenon from outgassing because it consists of a phase transition of a liquid into a vapor of the same substance.

Method and system to reduce outgassing in a reaction chamber

Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and / or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Owner:ASM IP HLDG BV

Bonding method for through-silicon-via based 3D wafer stacking

There is described a hybrid bonding method for through-silicon-via based wafer stacking. Patterned adhesive layers are provided to join together adjacent wafers in the stack, while solder bondng is used to electrically connect the vias. The adhesive layers are patterned to enable outgassing and to provide stress relief.
Owner:HONG KONG APPLIED SCI & TECH RES INST

Robot Position Calibration Tool (RPCT)

A Robot Position Calibration Tool (RPCT) is used to accurately calibrate a robot position for a reticle hand-off to a transfer station in a lithography tool with minimized particle generation and outgassing. Method(s), system(s) and computer program product(s) are described to calibrate the robot with minimal sensor usage and minimal slippage of a payload leading to minimized particle generation and outgassing inside a vacuum chamber of a lithography tool.
Owner:ASML HLDG NV

Implantable medical device having flat electrolytic capacitor with porous gas vent within electrolyte fill tube

Implantable medical devices (IMDs) and their various components, including flat electrolytic capacitors for same, and methods of making and using same and providing for outgassing of gases released during capacitor charge and discharge cycles are disclosed. A gas vent and liquid electrolyte barrier into the electrolyte fill tube lumen that is used to fill the interior case chamber with electrolyte and then needs to be closed to prevent leakage of electrolyte. The fill port is shaped to comprise a fill port tube having interior and exterior tube ends and a fill port ferrule intermediate the ends of the fill port tube and comprising a fill port ferrule flange extending transversely to and away from the fill port tube. The fill port ferrule is mounted in an opening disposed in one of the case wall and the cover wall with the ferrule flange in sealing engagement therewith to locate the exterior tube end extending outwardly away from the fill port ferrule flange and the interior tube end within the interior case chamber. A microporous plug is injected into and fills the fill port lumen, the plug formed of a microporous material allowing the escape of gas released from the liquid electrolyte during capacitor charging while preventing escape of liquid or vaporized electrolyte.
Owner:MEDTRONIC INC

Variable speed primary pumping in a tracer gas leak detector

In a system in accordance with the invention for detecting leaks, a mass spectrometer is connected to the aspiration side of a secondary pump whose discharge side is connected to the aspiration side of a primary pump driven by a rotational drive system adapted to vary the rotation speed of the primary pump between at least two different rotation speeds. An aspiration inlet is selectively connected by control valves either to the aspiration side of the primary pump or to the aspiration side or an intermediate area of the secondary pump. Variation of the rotation speed of the primary pump is used to perform faster pre-evacuation before the test, to detect grosser leaks, to compensate for a high level of outgassing or to adapt the sensitivity of the device, and equally to eliminate helium background noise from the primary pump.
Owner:ALCATEL LUCENT SAS

Multi-stage curing of low K nano-porous films

Embodiments in accordance with the present invention relate to multi-stage curing processes for chemical vapor deposited low K materials. In certain embodiments, a combination of electron beam irradiation and thermal exposure steps may be employed to control selective outgassing of porogens incorporated into the film, resulting in the formation of nanopores. In accordance with one specific embodiment, a low K layer resulting from reaction between a silicon-containing component and a non-silicon containing component featuring labile groups, may be cured by the initial application of thermal energy, followed by the application of radiation in the form of an electron beam.
Owner:APPLIED MATERIALS INC

Component including two semiconductor elements between which at least two hermetically tightly sealed cavities having different internal pressures are formed and method for manufacturing such a component

For the targeted influencing of the internal pressure within a cavity between two elements of a component, a getter material or an outgassing material is situated in an additional cavity between the two elements. After the two elements are bonded to one another, the additional cavity is still to be joined via a connecting opening to the cavity. The getter material or the outgassing material is then activated so that gasses are bound in the additional cavity and in the connected cavity, or an outgassing takes place. Only when the sought internal pressure has established itself in the connected cavity is the connecting opening to the additional cavity closed. In this way, the getter material or the outgassing material is only used for establishing a defined internal pressure, but no longer has any influence on the internal pressure within the cavity during ongoing operation of the component.
Owner:ROBERT BOSCH GMBH
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