4210 results about "Liquid surfaces" patented technology

Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass conductance is provided to release excess pressure from the gas volume inside the container, or an enlarged bubbler tube is provided with a volume sufficient to accommodate all possible liquid backflow without having the liquid exit the container. Among the overflow designs, flow dividers provide a tortuous path for the gas to increase the time exposure of carrier gas packets to the evaporating liquid surface. The flow dividers can be microporous to encourage capillary action, thereby increasing the evaporating surface. The tortuous gas flow path can be separated from the liquid phase by a breathable semi-porous membrane that permits vapor phase reactant to pass through but prohibits liquid from passing in the other direction.

In parallel with a substrate heating step, a liquid surface sensor is used to monitor the raising of an IPA liquid film. An organic solvent removing step is started in response to the raising of the IPA liquid film over the upper surface of the substrate. At the end of the organic solvent removing step, a visual sensor is used to determine whether or not IPA droplets remain on the upper surface of the substrate.

A container for containing a liquid material for processing a wafer includes: a container body; a divider dividing the interior of the container body and defining compartments fluid-tightly sealed off from each other except for bottom portions of the compartments; gas inlet ports for introducing gas to the respective compartments and gas outlet ports for discharging gas from the respective compartments; and a liquid level sensor provided in one of the compartments for keeping a liquid surface of a liquid material above the bottom portions when the container is in use conditions.

Methods and apparatus for screening diverse arrays of materials are provided. In one aspect, systems and methods are provided for imaging a library of materials using ultrasonic imaging techniques. The system includes one or more devices for exciting an element of the library such that acoustic waves are propagated through, and from, the element. The acoustic waves propagated from the element are detected and processed to yield a visual image of the library element. The acoustic wave data can also be processed to obtain information about the elastic properties of the library element. In another aspect, systems and methods are provided for generating acoustic waves in a tank filled with a coupling liquid. The library of materials is then placed in the tank and the surface of the coupling liquid is scanned with a laser beam. The structure of the liquid surface disturbed by the acoustic wave is recorded, the recorded disturbance being representative of the physical structure of the library. In another aspect of the invention, a mechanical resonator is used to evaluate various properties (e.g., molecular weight, viscosity, specific weight, elasticity, dielectric constant, conductivity, etc.) of the individual liquid elements of a library of materials. The resonator is designed to ineffectively excite acoustic waves. The frequency response of the resonator is measured for the liquid element under test, preferably as a function of time. By calibrating the resonator to a set of standard liquids with known properties, the properties of the unknown liquid can be determined. An array of library elements can be characterized by a single scanning transducer or by using an array of transducers corresponding to the array of library elements. Alternatively, multiple resonators of differing design may be used to evaluate each element of a library of elements, thus providing improved dynamic range and sensitivity.

A liquid raw material is heated to its boiling point or higher at a vaporizer to mix the vaporized ingredient gas and a carrier gas at a mixer at predetermined concentrations. The flow of the mixed gas is adjusted while the mixed gas is heated to over its condensing point and the temperature thereof is kept. Subsequently, the mixed gas is fed to a reactor for epitaxial growth while the mixed gas is heated to over its condensing point and the temperature thereof is kept. When the temperature of a heating medium is kept constant at the vaporizer to vaporize the liquid raw material and the feeding amount of the liquid into the vaporizer is adjusted by the pressure of the gas inside the vaporizer, the liquid surface level can be controlled to be constant.

The invention relates to a palladium-silver bimetallic hydrogenation catalyst, a carrier of which mainly contains Al2O3 and which is characterized by comprising, based on 100% of the catalyst weight, 0.01-0.4% of Pd, 0.02-0.2% of Ag, and has a specific surface area of 1-100m<2>/g. The catalyst is obtained through three steps of: first, preparing a functionalized-high-molecular / Al2O3 precursor, then preparing a Pd-Ag-high-molecular / Al2O3 precursor, and lastly roasting the precursors at 380-550 DEG C for 2-6h. The preparation method overcomes the influences of dipping liquid surface tensionand solvation effect on palladium-silver disperseness, and the prepared catalyst has excellent selectivity. The catalyst of the invention can be applied to selective hydrogenation process of fractions such as C2 and C3, and has a good hydrogenation activity, excellent selectivity and good hydrogenation stability.

An ink supplying mechanism includes a circulating system that connects an ink jet head having a nozzle, a pressure chamber opposed to the nozzle, and an upstream port and a downstream port that communicate with the pressure chamber, an upstream side tank that communicates with the ink jet head via the upstream port and is capable of storing an ink, a downstream side tank that communicates with the ink jet head via the downstream port and is capable of storing the ink, and a circulating pump that feeds the ink from the downstream side tank back to the upstream side tank. The ink supplying mechanism has a relief valve that is capable of opening and closing at least a liquid surface of the downstream side tank with respect to the atmospheric pressure, closes the relief valve to drive the circulating pump, sets the liquid surface of the downstream side tank to a negative pressure, and feeds the ink from the downstream side tank back to the upstream side tank via a feedback channel to circulate the ink.

An ink cartridge has an ink tank in which the ink is stored, and a shutter mechanism which is arranged in the ink tank. The shutter mechanism includes a lever which is supported swingably and which has one end provided with a shutter and the other end provided with a float. The mass and the volume of the float are set so that the first direction, in which the lever moves by the buoyancy and the gravity generated when the entire shutter mechanism is positioned in the ink, is opposite to the second direction in which the lever moves by the buoyancy and the gravity when a part of the float protrudes from the ink liquid surface. A residual amount of an ink is indicated without being excessively affected by any disturbance such as the surface tension of the ink.

The invention discloses a production technique of copper strips for solar modules, which belongs to the technical field of nonferrous metal processing and comprises the following steps: drawing-up of continuous-casting oxygen-free copper bar: using high-quality electrolytic copper as the raw material, melting at 1150+/-10 DEG C, keeping the temperature, covering the copper liquid surface with charcoal and graphite scales to ensure the vacuum state during melting, degassing on line, deoxidizing, stirring, and drawing up the copper bar with a tractor set in an on-off vacuum way; continuous extrusion of copper strip blanks: using oxygen-free copper rods as the raw material, producing copper strip blanks by using a continuous extruder set, cooling the extruded copper strip blanks through a vacuum oxidation-resisting pipe and a water tank, drying and coiling; and rough-rolling the copper strip blanks, medium-rolling, interstage annealing, finish rolling, degreasing, washing, annealing the finished product, washing, grinding the surface to passivate, and longitudinally cutting to obtain the finished product. The product of the invention has the advantages of high purity, low oxygen content and high electrical conductivity.

The present invention provides a novel method for culturing cells as well as a novel method for producing a recombinant protein by culturing cells at large scale (up to 1,500 L nominal volume and 750 L working volume), whereby an inflated bag provides a sterile, disposable cultivation chamber. The inflated bag is partially filled with liquid cultivation media and cells, and placed into a containment vessel. The containment vessel is positioned onto an orbitally shaken platform. The orbital shaking moves the containment vessel and thus the bag and induces thereby motion to the liquid contained therein (“shake mixing”). This motion (caused by orbital shaking) induces a dynamic force field that ensures cell suspension, bulk mixing, and oxygen transfer from the liquid surface to the respiring cells without damaging shear or foam generation.

A bioreactor assembly of the present invention for holding a media and supporting growth of a plurality of plants. The assembly includes a light source and a container having a light transmissive wall structure and defining a reservoir. A major axis of the reservoir is substantially horizontal allowing the reservoir to be filled with media to a partial level and to define a relatively large surface area for support of the plants. The assembly may also include clamps to secure and seal separate wall structure portions of the container together, and end caps to the wall portions, to define an aseptic environment. As another option, the clamps may define openings therethrough that allow passage of various devices for measuring and controlling bioreactor function such as a gas supply nozzle, a gas exit nozzle, an air temperature probe, a pH probe, a sampling drain, a gas composition probe and a media temperature probe.

In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the invention, the mold is disposed in an evacuable chamber, cleaned to remove surface organic contamination and coated with the surface release layer in a chamber, all without relocation or undesired time delay. The chamber encloses a support chuck for the mold or substrate, a surface cleaner unit adjacent the support, a heating source adjacent the support, and advantageously, sensors of measuring chamber pressure, vapor partial pressure and moisture concentration. A vapor source connected to the chamber supplies release surfactant vapor. The mold is cleaned, and the cleaning is followed by vapor phase deposition of the surfactant. The mold is advantageously heated. Typical ways of cleaning include exposure to ozone or plasma ion etch. Surfactant vapor may be generated by liquid surface vaporization, liquid injection or spray vaporization. A surface adhesion promoter can be coated on the substrate by a similar method with the same apparatus.

An information handling system includes: an immersion server drawer (ISD) having: an impervious enclosure which holds a volume of dielectric cooling liquid within/at the enclosure bottom. The ISD is configured with dimensions that enable insertion of liquid-cooled servers within the enclosure bottom. A plurality of liquid-cooled servers can be placed in a side-by-side configuration along one dimension of the ISD, with one or more heat dissipating components of the servers being placed below a surface layer of the cooling liquid. Submerged components of the immersion server are liquid-cooled, while the other heat generating components above the liquid surface are air cooled by rising vapor generated by boiling and vaporization of the cooling liquid. The ISD is placed in an ISD cabinet, which is configured with an upper condenser that allows for multi-phase cooling of the electronic devices placed within the immersion server drawer. The ISD cabinet can be rack-mountable.

An immersion server includes: a first surface that is exposed when the server is submerged within a cooling liquid; and at least one vapor bubble deflector physically abutting the first surface and extending away from the first surface at an angle. The deflector divides the first surface into an upper segment and a lower segment when the server is upright. When the server is submerged, the cooling liquid surrounding the lower segment absorbs sufficient heat to evaporate and generate vapor bubbles rising to the liquid surface. The vapor bubble deflector deflects the rising vapor bubbles away from the surface of the upper segment. This enables superior liquid contact with heat dissipating components at the upper segment and better cooling of those components. The deflector can be a device-level deflector separating two or more components or a component-level deflector separating a lower segment from an upper segment of a single component.

A thermal management system for a vehicle includes a first pump and a second pump, temperature adjustment target devices, heat exchangers, numerous flow paths including a first pump arrangement flow path, a second pump arrangement flow path, and device arrangement flow paths, a first switching portion for allowing the numerous flow paths to selectively communicate with each other, a second switching portion for allowing the numerous flow paths to selectively communicate with each other, and a reserve tank for storing therein heat medium. The reserve tank is configured to set the pressure of the liquid surface of the stored heat medium to a predetermined pressure (e.g., atmospheric pressure), and is connected to one flow path of the numerous flow paths.

An electroplating solution contains a wetting agent in addition to a suppressor and an accelerator. In some embodiments, the solution has a cloud point temperature greater than 35° C. to avoid precipitation of wetting agent or other solute out of the plating solution. In some embodiments, the wetting agent decreases the air-liquid surface tension of the electroplating solution to 60 dyne/cm² or less to increase the wetting ability of the solution with a substrate surface. In some embodiments of a method for plating metal onto substrate surface, the electroplating solution has a measured contact angle with the substrate surface less than 60 degrees.